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특허 상세정보

Hot substrate deposition of fused silica

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C03B-019/14   
미국특허분류(USC) 065/416; 065/417; 065/421
출원번호 UP-0880943 (2001-06-15)
등록번호 US-7797966 (2010-10-11)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Kenealy Vaidya LLP
인용정보 피인용 횟수 : 1  인용 특허 : 94

Fused silica injected or created by pyrolysis of SiCl4 are introduced in a powder state into a vacuum chamber. Pluralities of jet streams of fused silica are directed towards a plurality of heated substrates. The particles attach on the substrates and form shaped bodies of fused silica called preforms. For uniformity the substrates are rotated. Dopant is be added in order to alter the index of refraction of the fused silica. Prepared soot preforms are vitrified in situ. Particles are heated, surface softened and agglomerated in mass and are collected in ...


I claim: 1. Method for making fused silica products, comprising providing a chamber, providing plural parallel substrates positioned in the chamber, providing a support, providing first movers on the support, connecting the first movers to the substrates, moving the substrates with respect to each other, providing a second mover connected to a support for the first movers for moving the first movers with respect to the chamber, disposing silica particle providers in the chamber providing silica particles which deposit on the substrates, providing heater...

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