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Light emitting device, electronic equipment, and organic polarizing film 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-035/24
출원번호 UP-0203406 (2005-08-15)
등록번호 US-7800099 (2010-10-11)
우선권정보 JP-2001-305862(2001-10-01)
발명자 / 주소
  • Yamazaki, Shunepi
  • Takayama, Toru
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
    Nixon Peabody LLP
인용정보 피인용 횟수 : 82  인용 특허 : 67

초록

A light emitting device capable of reducing degradation caused by dispersion of impurities such as moisture, oxygen, an alkaline metal, and an alkaline earth metal is provided. Specifically, a flexible light emitting device with an OLED formed on a plastic substrate is provided. In a light emitting

대표청구항

What is claimed is: 1. An electronic apparatus comprising: a first adhesive layer over a substrate; a thin film transistor over the adhesive layer; a first electrode over the thin film transistor; a layer containing an organic compound over the first electrode; a second electrode over the layer con

이 특허에 인용된 특허 (67)

  1. Aida Hiroshi (Kokubu JPX) Mikami Kazuhiko (Kokubu JPX) Kitazawa Kenji (Kokubu JPX), Ceramic resistor and electrostatic chuck having an aluminum nitride crystal phase.
  2. Aida Hiroshi,JPX ; Mikami Kazuhiko,JPX ; Kitazawa Kenji,JPX, Ceramic resistor and electrostatic chuck having an aluminum nitride crystal phase.
  3. Koike Yoshio,JPX ; Sawasaki Manabu,JPX, Color display device having filterless areas.
  4. Nelson Douglas, Color suppressed anti-reflective glass.
  5. Yamada, Jiro; Sasaoka, Tasuya; Sekiya, Mitsunobu; Sano, Naoki; Chiba, Yasuhiro; Hirano, Takashi; Iwase, Yuichi, Display apparatus with ribs having conductive material.
  6. Bijlsma, Sipke Jacob, Display device with color filter covering portion of reflecting part.
  7. Nakamura Osamu,JPX ; Suzuki Shigemi,JPX, Display device with specific electrode structure and composition.
  8. Hajime Kimura JP, Electro-optical device.
  9. Friedrich Jonas DE; Andreas Elschner DE; Rolf Wehrmann DE; Dirk Quintens BE, Electroluminescent arrangements.
  10. Graff, Gordon Lee; Martin, Peter Maclyn; Gross, Mark Edward; Shi, Ming Kun; Hall, Michael Gene; Mast, Eric Sidney, Encapsulated display devices.
  11. Haskal Eliav,CHX ; Karg Siegfried,DEX ; Salem Jesse Richard ; Scott John Campbell, Encapsulated organic light emitting device.
  12. Zyung Tae Hyoung,KRX ; Hwang Do Hoon,KRX ; Jung Sang Don,KRX, Encapsulation method of a polymer or organic light emitting device.
  13. Affinito John D., Environmental barrier material for organic light emitting device and method of making.
  14. Graff, Gordon L.; Gross, Mark E.; Affinito, John D.; Shi, Ming-Kun; Hall, Michael G.; Mast, Eric S.; Walty, Robert; Rutherford, Nicole; Burrows, Paul E.; Martin, Peter M., Environmental barrier material for organic light emitting device and method of making.
  15. Graff, Gordon L.; Gross, Mark E.; Affinito, John D.; Shi, Ming-Kun; Hall, Michael; Mast, Eric, Environmental barrier material for organic light emitting device and method of making.
  16. John D. Affinito, Environmental barrier material for organic light emitting device and method of making.
  17. Carcia, Peter Francis; McLean, Robert Scott, Flexible organic electronic device with improved resistance to oxygen and moisture degradation.
  18. Carcia,Peter Francis; McLean,Robert Scott, Flexible organic electronic device with improved resistance to oxygen and moisture degradation.
  19. Fukada Takeshi,JPX ; Sakama Mitsunori,JPX ; Teramoto Satoshi,JPX, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.
  20. Trapani, Giorgio; Pawlak, Richard; Carlson, Gene R.; Gordon, James N., High durability circular polarizer for use with emissive displays.
  21. Roberts, John K.; Reese, Spencer D., High power radiation emitter device and heat dissipating package for electronic components.
  22. Yializis Angelo, Hybrid polymer film.
  23. Jones Gary W. (Sugarland TX), Insulator and metallization method for VLSI devices with anisotropically-etched contact holes.
  24. Wang Shi-Qing ; Chung Henry ; Lin James,TWX, Integrated circuits with multiple low dielectric-constant inter-metal dielectrics.
  25. Shi Song Q. (Phoenix AZ) Lee Hsing-Chung (Calabasas CA) Wei Cheng-Ping (Gilbert AZ), Inverted oleds on hard plastic substrate.
  26. Codama Mitsufumi (Kanagawa JPX) Arai Michio (Tokyo JPX), Linear array image sensor with thin-film light emission element light source.
  27. Inoue Satoshi,JPX ; Shimoda Tatsuya,JPX, Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device.
  28. McMahon Patrick J. (87 Interlaken Ave. New Rochelle NY 10801), Metal coated articles.
  29. Zhang Hongyong (Kanagawa JPX), Method of fabricating semiconductor device.
  30. Fukada Takeshi (Kanagawa JPX) Sakama Mitsunori (Kanagawa JPX) Teramoto Satoshi (Kanagawa JPX), Method of heat-treating a glass substrate.
  31. Graff, Gordon Lee; Martin, Peter Maclyn; Gross, Mark Edward; Shi, Ming Kun; Hall, Michael Gene; Mast, Eric Sidney, Method of making encapsulated display devices.
  32. Yamazaki Shunpei,JPX ; Arai Yasuyuki,JPX ; Teramoto Satoshi,JPX, Method of manufacturing a semiconductor device using a metal which promotes crystallization of silicon and substrate bo.
  33. Shunpei Yamazaki JP; Yasuyuki Arai JP; Satoshi Teramoto JP, Method of manufacturing flexible display with transfer from auxiliary substrate.
  34. Hirano Hisakazu (Takatsuki JPX) Mori Kiju (Machida JPX) Watanabe Junichi (Yokohama JPX) Kondo Fumio (Yokohama JPX), Moisture trapping film for EL lamps of the organic dispersion type.
  35. Martin, Peter M.; Graff, Gordon L.; Gross, Mark E.; Hall, Michael G.; Mast, Eric S., Multilayer plastic substrates.
  36. Martin, Peter M.; Graff, Gordon L.; Gross, Mark E.; Hall, Michael G.; Mast, Eric S., Multilayer plastic substrates.
  37. Iida Yasunobu (Matsusaka JPX) Nakamura Masato (Mie Prefecture JPX) Takeuchi Nobuyuki (Ise JPX) Onishi Keiji (Matsusaka JPX), Neat reflecting glass with multilayer coating.
  38. Furukawa, Yukio; Ouchi, Toshihiko, Optical device structure and fabrication method thereof.
  39. Mayumi Uno JP; Noboru Yamada JP; Ken'ichi Nagata JP; Hideo Kusada JP, Optical information recording medium with thermal diffusion layer.
  40. Suzuki Mutsumi,JPX ; Fukuyama Masao,JPX ; Hori Yoshikazu,JPX, Organic electroluminescent device having a protective covering comprising organic and inorganic layers.
  41. Heeks, Stephen Karl; Burroughes, Jeremy Henley; Carter, Julian Charles; Devine, Peter, Organic light-emitting devices including specific barrier layers.
  42. Harvey ; III Thomas B. ; Shi Song Q. ; So Franky, Passivated organic device having alternating layers of polymer and dielectric.
  43. Shi Song Q. ; So Franky ; Harvey ; III Thomas B., Passivation of electroluminescent organic devices.
  44. Harvey ; III Thomas B. (Scottsdale AZ) Shi Song Q. (Phoenix AZ) So Franky (Tempe AZ), Passivation of organic devices.
  45. Harvey ; III Thomas B. ; So Franky, Passivation of organic devices.
  46. Johnson Donald D. (Pearl City IL) Puri Surrinder S. (Schaumberg IL) Yee Jim (Rockford IL), Photoelectric sensor with a circular polarizing lens attached to its housing.
  47. Burke Douglas, Polarizing resonant spherical scattering apparent three dimensional photographic film.
  48. Zhang Hongyong (Kanagawa JPX), Process for fabricating a TFT by selectively oxidizing or nitriding a light shielding layer.
  49. Yang Ying Bao,JPX, Reflective display having a laminated structure of a polarizer and quarter wave plate being attached to a light guide plate.
  50. Jones Gary W. ; Howard Webster E. ; Zimmerman Steven M., Sealing structure for organic light emitting devices.
  51. Graff, Gordon Lee; Martin, Peter Maclyn; Gross, Mark Edward; Shi, Ming Kun; Hall, Michael Gene; Mast, Eric Sidney, Semicoductor passivation using barrier coatings.
  52. Ogura Atsushi (Tokyo JPX) Egami Koji (Tokyo JPX), Semiconductor device.
  53. Yamazaki Shunpei (Tokyo JPX), Semiconductor device.
  54. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.
  55. Yamazaki Shunpei (Tokyo JPX) Zhang Hongyong (Kanagawa JPX) Takemura Yasuhiko (Kanagawa JPX), Semiconductor device and method for forming the same.
  56. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for forming the same.
  57. Ohizumi Shinichi,JPX ; Hotta Yuji,JPX ; Kondo Seiji,JPX, Semiconductor device and method of fabricating the same.
  58. Tatsuya Shimoda JP; Satoshi Inoue JP; Wakao Miyazawa JP, Separating method, method for transferring thin film device, thin film device, thin film integrated circuit device, and liquid crystal display device manufactured by using the transferring method.
  59. Hayashi, Hisao, Substrate for integrating and forming a thin film semiconductor device thereon.
  60. Katayama, Yoshihito; Kimura, Yukio; Maekawa, Mikako; Shidoji, Eiji; Noda, Kazuyoshi, Substrate provided with antireflection films and its production method.
  61. Yamashita Takuo (Tenri JPX) Yoshida Masaru (Nara JPX) Nakajima Shigeo (Nara JPX) Uno Keiichi (Otsu JPX) Murakami Yoshiki (Otsu JPX), Thin film electroluminescent (EL) panel.
  62. Yamashita Takuo (Nara JPX) Ogura Takashi (Nara JPX) Nakaya Hiroaki (Nara JPX) Yoshida Masaru (Nara JPX), Thin film electroluminescent panel.
  63. Matsuoka Morito (Katsuta JPX) Ono Kenichi (Mito JPX), Thin film forming apparatus and ion source utilizing sputtering with microwave plasma.
  64. Sheats James R. ; Hueschen Mark R. ; Seaward Karen L. ; Roitman Daniel B. ; Briggs George Andrew Davidson,GBX, Transparent, flexible permeability barrier for organic electroluminescent devices.
  65. Gordon Lee Graff ; Mark Edward Gross ; Ming Kun Shi ; Michael Gene Hall ; Peter Maclyn Martin ; Eric Sidney Mast, Ultrabarrier substrates.
  66. Englander Benjamin (Jamaica NY), Video camera unit, protective enclosure and power circuit for same, particularly for use in vehicles.
  67. Okamoto Naoyuki,JPX, Wafer for magnetic head and magnetic head.

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