IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
UP-0037977
(2008-02-27)
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등록번호 |
US-7803635
(2010-10-21)
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발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
5 인용 특허 :
10 |
초록
▼
A purge and trap concentrator system that includes a sparge vessel, and includes a variable gas flow valve for controlling the gas pressure in an analytic trap or the sparge vessel; a sensor that detects both a foaming sample state and a high liquid level in the sparge vessel, using one optical sens
A purge and trap concentrator system that includes a sparge vessel, and includes a variable gas flow valve for controlling the gas pressure in an analytic trap or the sparge vessel; a sensor that detects both a foaming sample state and a high liquid level in the sparge vessel, using one optical sensor; a control scheme that re-directs the purge gases to a second inlet of the sparge vessel during a foaming condition; a control scheme that uses a split flow to enhance the quantity of sample gases passed from an analytic trap; an electrically powered thermal energy source with a fan raising the sparge vessel temperature via thermal convection.
대표청구항
▼
The invention claimed is: 1. A purge and trap concentrator system, comprising: (a) a system controller; (b) a first source of gas, which provides a first gas; (c) a plurality of fluidic control devices and a plurality of fluidic passages which fluidically connect said plurality of fluidic control d
The invention claimed is: 1. A purge and trap concentrator system, comprising: (a) a system controller; (b) a first source of gas, which provides a first gas; (c) a plurality of fluidic control devices and a plurality of fluidic passages which fluidically connect said plurality of fluidic control devices; (d) a variable flow rate gas flow control valve that is controlled by a first signal from said system controller, said gas flow control valve having a first fluidic inlet and a first fluidic outlet which, under control of said first signal, acts to pass a gas flow therethrough, said first fluidic inlet being in fluidic communication with said source of gas and receiving said first gas, said first fluidic outlet dispensing a second gas when required by said first signal; (e) an external instrument, which includes second source of gas that supplies a third gas, said external instrument having a second fluidic outlet that supplies said third gas, and a second fluidic inlet; and (f) an analytic trap, having: (i) a first trap port, a second trap port, and a third trap port; wherein: (A) said first trap port is selectively in fluidic communication with said first fluidic outlet of the gas flow control valve, (B) said second trap port is selectively in fluidic communication with a vent, through said plurality of fluidic control devices and plurality of fluidic passages, and is selectively in fluidic communication with said second fluidic output of the external instrument, through said plurality of fluidic control devices and plurality of fluidic passages, and (C) said third trap port is selectively in fluidic communication with said second inlet of said external instrument; (ii) a first chamber that is coupled to said second trap port, said first chamber being designed to receive a concentrated chemical sample, said first chamber acting to remove at least one predetermined substance from said concentrated chemical sample, and thereby create an “extracted sample gas flow”; (iii) a second chamber that is coupled to said first chamber, to said first trap port, and to said third trap port; and (g) wherein, before a desorbtion procedure begins: (i) said plurality of fluidic control devices are in a first state; (ii) said second gas is received at said first trap port of the analytic trap, and flows into said first chamber; (iii) a fourth gas exits said first chamber at said second trap port, and flows toward a vent, through said plurality of fluidic control devices and plurality of fluidic passages, including a vent valve that is open at this time; (iv) then said vent valve is closed by a second signal from said system controller, and said fourth gas begins to build a desorbtion pressure control (“DPC”) pressure at said second trap port, wherein said DPC pressure is controlled by said gas flow control valve, which is controlled by said first signal from said system controller; and (v) said DPC pressure reaches a predetermined magnitude; and (h) wherein, a desorbtion procedure begins, such that: (i) said plurality of fluidic control devices are activated into a second state, under the control of a third signal from said system controller; (ii) said third gas from the second outlet of the external instrument now flows to said second trap port and into said first chamber; (iii) said extracted sample gas flow travels from said first chamber into said second chamber; and (iv) a fifth gas flow, which includes said extracted sample gas flow, exits said second chamber at said third trap port and flows toward said second inlet of said external instrument, through said plurality of fluidic control devices and plurality of fluidic passages. 2. The purge and trap concentrator system of claim 1, further comprising a trap heater that is turned on after said DPC pressure reaches the predetermined magnitude. 3. The purge and trap concentrator system of claim 1, wherein said external instrument comprises a gas chromatograph analyzer. 4. The purge and trap concentrator system of claim 1, wherein said extracted sample gas flow removed from said concentrated chemical sample comprises volatile organic compositions (VOCs). 5. The purge and trap concentrator system of claim 1, wherein said plurality of fluidic control devices include a multi-port two-position valve, which: (a) before said desorbtion procedure begins, said multi-port two-position valve is at its first position; and (b) as said desorbtion procedure begins, said multi-port two-position valve is indexed to its second position, under the control of said third signal. 6. The purge and trap concentrator system of claim 5, further comprising a pressure sensor that outputs a fourth signal to said system controller, which measures a magnitude of said DPC pressure in real time; and wherein, said predetermined magnitude of the DPC pressure is controlled by a user-entered setpoint to the system controller, which allows said purge and trap concentrator system to undergo a smooth transition of pressure variation at said second trap port when said multi-port two-position valve indexes from its first position to its second position, and said third gas pressure is introduced to said second trap port. 7. The purge and trap concentrator system of claim 1, wherein said desorbtion procedure of part (h) operates in one of: (i) a split mode of operation; and (ii) a no-split mode of operation. 8. The purge and trap concentrator system of claim 7, wherein during said split mode of operation, said second gas flow is directed from said first outlet of the gas control flow valve to said first trap port of the analytic trap, and said second gas flow is combined at said second chamber with said extracted sample gas flow, thereby creating a larger overall said fifth gas flow that now becomes available for analysis by said external instrument. 9. The purge and trap concentrator system of claim 1, wherein said gas flow control valve said gas flow valve comprises a variable position valve that exhibits a “low flow” mode in which its output gas flow is at a minimum amount, a “full flow” mode in which its output gas flow is at a maximum amount, and a “proportional flow” mode in which its output gas flow is at a value between said minimum amount and said maximum amount, under control of said first signal. 10. The purge and trap concentrator system of claim 9, wherein said variable position valve receives said first gas through said first fluidic inlet from said source of gas and, under control of said system controller, said variable position valve outputs through said first fluidic outlet a percentage of said first gas that is determined by a present position of said variable position valve. 11. The purge and trap concentrator system of claim 9, wherein: (a) said low flow mode is a percentage of fluid flow that is substantially 0% of said maximum amount of fluid flow, (b) said full flow mode is a percentage of fluid flow that is substantially 100% of said maximum amount of fluid flow, and (c) said proportional flow mode is a percentage of fluid flow that varies between 0% and 100% of said maximum amount of fluid flow, through said variable position valve. 12. The purge and trap concentrator system of claim 9, wherein said variable position valve is controlled by an analog signal. 13. The purge and trap concentrator system of claim 9, wherein said system controller receives a closed loop feedback signal from a pressure sensor, and uses a P-I-D control routine to control said variable position valve. 14. The purge and trap concentrator system of claim 9, further comprising a driver module that receives a low power signal from said system controller, and generates a relatively high power signal that directly drives said variable position valve. 15. The purge and trap concentrator system of claim 9, wherein said variable position valve is controlled by a binary signal of multiple digits, thereby providing a large number of discrete possible positions. 16. The purge and trap concentrator system of claim 15, wherein said binary signal is one of: (a) 8-bit precision, providing 256 different possible positions between 0% flow and 100% flow, inclusive; (b) 10-bit precision, providing 1024 different possible positions between 0% flow and 100% flow, inclusive; and (c) 12-bit precision, providing 4096 different possible positions between 0% flow and 100% flow, inclusive.
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