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Method and system for operating a mass flow controller

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01F-001/00
출원번호 UP-0238879 (2008-09-26)
등록번호 US-7826986 (2010-11-22)
발명자 / 주소
  • McDonald, R. Mike
출원인 / 주소
  • Advanced Energy Industries, Inc.
대리인 / 주소
    Neugeboren O'Dowd PC
인용정보 피인용 횟수 : 12  인용 특허 : 32

초록

A system and method for operating a mass flow controller is described. One embodiment validates the operation of a mass flow controller thermal sensor, including detecting zero drift and span drift in the sensor by comparing the thermal sensor output to a pressure sensor output. In one embodiment, e

대표청구항

What is claimed is: 1. A method of operating a mass flow controller comprising, directing a portion of gas flow from a main flow line through a first tube, the first tube having a center portion, the center portion coupled to a first sensor; coupling a second tube comprising a second-tube-proximal-

이 특허에 인용된 특허 (32)

  1. Shajii,Ali; Kottenstette,Nicholas; Ambrosina,Jesse, Apparatus and method for calibration of mass flow controller.
  2. Shajii, Ali; Kottenstette, Nicholas; Ambrosina, Jesse, Apparatus and method for pressure fluctuation insensitive mass flow control.
  3. Shajii, Ali; Kottenstette, Nicholas; Ambrosina, Jesse; Smith, Donald K.; Clark, William R., Apparatus and method for pressure fluctuation insensitive mass flow control.
  4. Shajii,Ali; Kottenstette,Nicholas; Ambrosina,Jesse, Apparatus and method for pressure fluctuation insensitive mass flow control.
  5. Ambrosina, Jesse; Suzuki, Isao; Shajii, Ali, Apparatus and method for thermal management of a mass flow controller.
  6. Simon Philippe (Montreal CAX) Farant Jean-Pierre (Verdun CAX), Capillary sampling flow controller.
  7. Luchner, Stefan, Flow pickup circuit.
  8. Wang, Chiun, Flow sensor.
  9. Surman James J. (Mt. Clemens MI), Hot film fluid flowmeter with auxiliary flow sensing.
  10. Anderson Richard L. (Austin TX), Intelligent mass flow controller.
  11. Doyle James H. (2003 Ivy Hill La. Orange CA 92667 4), Mass flow controller.
  12. Hsiao-Che Wu TW, Mass flow controller.
  13. Tinsley,Kenneth E.; Tariq,Faisal, Method and system for a mass flow controller with reduced pressure sensitivity.
  14. Lull,John Michael; Wang,Chiun; Saggio, Jr.,Joseph A., Methods and apparatus for pressure compensation in a mass flow controller.
  15. Moslehi Mehrdad M. (Dallas TX), Plasma density controller for semiconductor device processing equipment.
  16. Nishino Koji (Osaka JPX) Ikeda Nobukazu (Osaka JPX) Morimoto Akihiro (Osaka JPX) Minami Yukio (Osaka JPX) Kawada Koji (Osaka JPX) Dohi Ryosuke (Osaka JPX) Fukuda Hiroyuki (Osaka JPX), Pressure type flow rate control apparatus.
  17. Ohmi Tadahiro,JPX ; Nishino Koji,JPX ; Ikeda Nobukazu,JPX ; Morimoto Akihiro,JPX ; Minami Yukio,JPX ; Kawada Koji,JPX ; Dohi Ryosuke,JPX ; Fukuda Hiroyuki,JPX, Pressure type flow rate control apparatus.
  18. Shajii,Ali; Meneghini,Paul, Reynolds number correction function for mass flow rate sensor.
  19. Pascal Rudent FR; Andre Boyer FR; Alain Giani FR; Pierre Navratil FR, Sensor for a capillary tube of a mass flow meter.
  20. Kohmura, Yoshihiko; Maeda, Shunsuke; Kojima, Takio; Oshima, Takafumi, Split-flow flowmeter with a profusion facing the detection element.
  21. Masuichi,Mikio; Takamura,Yukihiro; Moriwaki,Sanzo; Adachi,Hideki, Substrate processing apparatus and thermal type flowmeter suitable to the same.
  22. Emmanuel Vyers, System and method for a digital mass flow controller.
  23. Kenneth E. Tinsley ; Faisal Tariq, System and method of operation of a digital mass flow controller.
  24. Tinsley, Kenneth E.; Tariq, Faisal, System and method of operation of a digital mass flow controller.
  25. Tinsley, Kenneth E.; Tariq, Faisal, System and method of operation of a digital mass flow controller.
  26. Doyle Michael J. ; LeMay Dan B. ; Vu Kim N., Thermal mass flow controller having orthogonal thermal mass flow sensor.
  27. Meneghini,Paul; Shajii,Ali, Thermal mass flow rate sensor including bypass passageways and a sensor passageway having similar entrance effects.
  28. Shajii, Ali; Meneghini, Paul; Myatt, Leonard, Thermal mass flow rate sensor providing increased rate of heat transfer to gas.
  29. Vavra Randall J. (Orange CA) Nguyen Lam T. (Garden Grove CA) Tran Erik Q. (Garden Grove CA), Thermal mass flow sensor.
  30. Renken Wayne G. (San Jose CA) LeMay Dan B. (Palos Verdes Estates CA) Takahashi Ricardo M. (Ben Lomand CA), Thermal mass flowmeter and controller.
  31. Fu Chien-Chung,TWX ; Lee Cheng-Kuo,TWX ; Wu Ching-Yi,TWX, Thermal pulsed micro flow sensor.
  32. Brown Timothy R. ; Judd Daniel R., Wide range gas flow system with real time flow measurement and correction.

이 특허를 인용한 특허 (12)

  1. Goto, Takao; Aono, Toshihiro; Kawai, Tetsuroh, Flow control device.
  2. Mudd, Daniel T.; Mudd, Patti J., Flow control system, method, and apparatus.
  3. Goto, Takao; Tanaka, Makoto, Flow rate control using mass flow rate control device.
  4. Goto, Takao; Tanaka, Makoto, Flow rate control using mass flow rate control device.
  5. Desilva, Adrian D.; Vu, Huy Thanh; Le, Richard; Miller, Jeffrey Harold; Gonzalez, Hector; Valdez, Raul; Wang, Chiun, Flow sensor.
  6. Miller, Jeffrey Harold, Fluid inlet adapter.
  7. Eto, Hideo; Saito, Makoto; Nishiyama, Nobuyasu, Mass flow controller, mass flow controller system, substrate processing device, and gas flow rate adjusting method.
  8. Isobe, Yasuhiro; Horinouchi, Osamu; Tanaka, Yuki; Yamaguchi, Masao; Furukawa, Yukimasa, Mass flow meter and mass flow controller.
  9. Desilva, Adrian D.; Vu, Huy Thanh; Le, Richard; Miller, Jeffrey Harold; Gonzalez, Hector; Valdez, Raul; Wang, Chiun, Modular flow cassette.
  10. Son, Joung-Ho; Seo, In-Seok; Kim, Ki-Chul, Valve control system, bidet using the same, and valve control method.
  11. Son, Joung-Ho; Seo, In-Seok; Kim, Ki-Chul, Valve control system, bidet using the same, and valve control method.
  12. Williams, Malcolm R.; DeSilva, Adrian D.; Vu, Huy Thanh, Ventilator flow valve.
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