초록 ▼

The invention is directed to a method for determining the image quality of an optical imaging system and to the use of the method according to the invention for determining the influence of samples on the amplitude distribution and phase front distribution of the illumination light, of which the amp

The invention is directed to a method for determining the image quality of an optical imaging system and to the use of the method according to the invention for determining the influence of samples on the amplitude distribution and phase front distribution of the illumination light, of which the amplitude distribution is known in particular. The invention comprises the following steps: adjusting the subassemblies relative to one another in such a way that it is possible to project images of a sample on the detection device; recording a plurality of images of the sample from different reference planes near the focus plane; improving the image quality by image processing, particularly to reduce noise, to compensate for local variations in sensitivity of the detection device, and to center the intensity centroids respectively on a predetermined location in the images; computational linking of the spatially resolved image information, of adjustment values and system variables relating to the optical imaging system, and of information concerning the sample with the aim of determining characteristic numbers that are characteristic of the wavefront deformation caused by the imaging system; and outputting the characteristic numbers and associating them with the imaging system for describing the image quality.

대표청구항 ▼

What is claimed is: 1. A method for determining image quality of an optical imaging system, said method comprising the following steps: recording an image stack which includes a plurality of individual images of a sample from different adjusting or reference planes near a focus plane; improving ima

What is claimed is: 1. A method for determining image quality of an optical imaging system, said method comprising the following steps: recording an image stack which includes a plurality of individual images of a sample from different adjusting or reference planes near a focus plane; improving image qualities of the individual images of the image stack by means of image processing; and evaluating the image stack with the aim of determining characteristic numbers that are characteristic of wavefront deformation caused by the imaging system; wherein the characteristic numbers are outputted and associated with the imaging system as equivalent for the image quality. 2. The method according to claim 1; wherein the characteristic numbers are determined in a first step initially by analytic evaluation and, in a subsequent second step, by further iterative processing of the results from the first step until a given termination criterion is reached. 3. The method according to claim 1; wherein a determination of Zernike polynomials up to a given order is carried out with the analytic evaluation of the image information. 4. The method according to claim 2; wherein a determination of Zernike coefficients is carried out with the iterative evaluation of the image information based on methods in which every wave surface from the image stack of the sample is considered as a unit, or a pixel-by-pixel evaluation is carried out; and wherein the determined Zernike coefficients correspond to the outputted characteristic numbers. 5. The method according to claim 1; wherein the change of reference plane always takes place in the object space, i.e., by changing the distance of the sample relative to the object plane. 6. The method according to claim 1; wherein the change of reference plane is carried out in predetermined increments. 7. The method according to claim 2; wherein a number of variables in the iterative step of the evaluation is increased, preferably doubled, in relation to the preceding, analytic step. 8. The method according to claim 1; wherein the influence of a pupil of the imaging system is taken into account in the evaluation of the image information, preferably by means of a pupil image that is obtained using a Bertrand system. 9. The method according to claim 1; wherein a pupil function is predetermined with respect to apodization. 10. The method according to claim 1; wherein a plurality of detection devices are arranged at different distances to the focus plane and the images are accordingly recorded from the different reference planes at the same time or also successively in time with a corresponding control. 11. The method according to claim 1; wherein a plurality of samples arranged adjacent to one another or a sample with a plurality of objects arranged adjacent to one another is positioned in the sample holder and information concerning the image qualities of the individual images are accordingly determined simultaneously in relation to the corresponding positions in the visual field of the imaging system, and/or simultaneous measurements are carried out with a plurality of different wavelengths in order to detect dispersive or wavelength-dependent effects. 12. The method according to claim 1; wherein samples with binary objects, i.e., pure amplitude objects, are provided. 13. The method according to claim 12; wherein each binary object is in the form of a round or square pinhole. 14. The method according to claim 1; wherein the image quality is determined in an automatic process beginning with the positioning of a sample until the output of the characteristic numbers. 15. The method according to claim 1; wherein an exposure device is provided which ensures an optimal illumination of the sample depending on the change of the reference plane, and the signal-to-noise ratio is accordingly optimized in the images. 16. The method according to claim 1; wherein a laser beam having a beam waist in the object plane is provided for illuminating the sample in order to achieve a low sigma value and a Gaussian intensity distribution in the pupil. 17. The method according to claim 1; wherein the characteristic numbers are outputted as Zernike coefficients. 18. The method according to claim 1; wherein improving the image quality of the individual images of the image stack is related to improving the signal to noise ratio. 19. The method according to claim 1; wherein an initially still unknown sample is recorded by the optical imaging system and the sample characteristics are separated from the characteristics of the imaging system. 20. The method according to claim 1; wherein the influence of a stepper in microlithography is factored into the characteristics of the initially still unknown sample image. 21. The method according to claim 13; wherein the pinhole has a diameter dPH=300 nm, illumination light with the wavelength of 248 nm is used, the pixel size at the sample is 45 nm, the numerical aperture of the imaging system is 0.2, the illumination aperture corresponds to the numerical aperture of the imaging system, the illumination of the sample is carried out with partially coherent light at a σ=0.8, the diameter of the Airy disk in the image is 1.512 μm, the depth of focus is 6.2 μm, the defocusing from image to image is carried out within the depth of focus range at ±1 RE (RE=Rayleigh unit), ±3 RE, and ±0.8 RE or ±6.2 μm, ±18.6 μm, and ±5 μm, and an odd-number quantity of images is predetermined, preferably a quantity of 7, 11, or 21 images. 22. The method according to claim 13; wherein a deconvolution of the image information is provided depending upon the size of the pinhole in the sample in order to exclude the influence of the pinhole size on the results. 23. A method for determining image quality of an optical imaging system, said method comprising the following steps: recording an image stack which includes a plurality of individual images of a sample from different adjusting or reference planes near a focus plane; improving image qualities of the individual images of the image stack by means of image processing; and evaluating the image stack with the aim of determining characteristic numbers that are characteristic of wavefront deformation caused by the imaging system; wherein samples with binary objects, i.e., pure amplitude objects, are provided. 24. A method for determining image quality of an optical imaging system, said method comprising the following steps: recording an image stack which includes a plurality of individual images of a sample from different adjusting or reference planes near a focus plane; improving image qualities of the individual images of the image stack by means of image processing; and evaluating the image stack with the aim of determining characteristic numbers that are characteristic of wavefront deformation caused by the imaging system; wherein an initially still unknown sample is recorded by the optical imaging system and the sample characteristics are separated from the characteristics of the imaging system.