A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending through
A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending throughout entire circumference. When the cap is put on the container body, the elastic member is interposed at a joint portion between the cap and the container body to hermetically seal the container.
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What is claimed is: 1. A method of producing a mask blank with a resist film, wherein a thin film for forming a mask pattern is deposited on a substrate, an atmosphere from which an acid substance inhibiting a chemical amplification effect of a chemically amplified resist is removed is supplied int
What is claimed is: 1. A method of producing a mask blank with a resist film, wherein a thin film for forming a mask pattern is deposited on a substrate, an atmosphere from which an acid substance inhibiting a chemical amplification effect of a chemically amplified resist is removed is supplied into an environment for forming the resist film, and the chemically amplified resist film is thereafter formed on the thin film under an atmosphere from which at least the acidic substance is removed. 2. A method according to claim 1, wherein the acid substance is removed a chemical filter. 3. A method according to claim 2, wherein the chemical filter is a chemical filter with an acid-neutralizing substance mixed therewith. 4. A method according to claim 2, wherein the chemical filter is combination of at least one of an air filter made of a glass fiber material, an air filter made of a fluorine-based resin material and an activated carbon filter. 5. A method of producing a mask blank with a resist film, comprising a resist forming step of forming a chemically amplified resist film on a mask blank obtained by depositing on a substrate a thin film for forming a mask pattern, a post-treating step as an optional step for treating the mask blank with the resist film, an inspection step as an optional step for inspecting the mask blank with the resist film, and a housing step of housing the mask blank with the resist film in a container, wherein at least one of the steps is carried out under an atmosphere from which at least an acidic substance is removed by supplying, into an environment of said at least one of the steps, an atmosphere from which an acid substance inhibiting a chemical amplification effect of a chemically amplified resist is removed. 6. A method according to claim 5, wherein in a series of steps from the resist forming step to the housing step, the atmosphere from which the acid substance inhibiting the chemical amplification effect of a chemically amplified resist is removed is supplied into the environment of the step, and the step is carried out under the atmosphere from which the acidic substance is removed. 7. A method according to claim 5, wherein the acid substance is removed a chemical filter. 8. A method according to claim 7, wherein the chemical filter is a chemical filter with an acid-neutralizing substance mixed therewith. 9. A method according to claim 7, wherein the chemical filter is combination of at least one of an air filter made of a glass fiber material, an air filter made of a fluorine-based resin material and an activated carbon filter. 10. A method of treating a housing member for housing a mask blank having a chemically amplified resist film, wherein the method includes a heat treatment for removing from the housing member an acid substance inhibiting a chemically amplifying effect of the chemically amplified resist film. 11. A method according to claim 10, wherein a treatment of bringing the housing member into contact with heated pure water is carried out prior to the treatment for removing the acid substance. 12. A method according to claim 11, wherein the heated pure water is subjected to an ion exchanged water treatment after a reverse osmotic membrane water treatment. 13. A method according to claim 10, wherein the treatment for removing the acid substance is carried out upon a material to be formed into at least one of the housing member and the housing member after forming. 14. A method of producing a housing member for housing a mask blank, the method including a method of treating a housing member according to claim 10. 15. A mask blank package which is obtained by housing the mask blank with the chemically amplified resist film in the housing member subjected to the treatment for removing the acid substance inhibiting the chemically amplifying effect of the chemically amplified resist film by the method according to claim 10. 16. A method according to claim 10, wherein a temperature of the heat treatment falls within a range between 40° C. and 90° C. 17. A method according to claim 10, wherein a material of the housing member is one selected from the group consisting of polypropylene resin, acryl resin, polyethylene resin, polybutylene resin and polycarbonate resin. 18. A method according to claim 10, wherein the housing member is at least one of a container body of a container for housing the mask blank, an inner case of the container and a cap of the container. 19. A method of producing a transfer mask, comprising the steps of: preparing a mask blank having a thin film for forming a mask pattern on a substrate; supplying an atmosphere from which an acid substance inhibiting a chemical amplification effect of a chemically amplified resist is removed into an environment for forming a resist film; forming a chemically amplified resist film on the thin film under an atmosphere from which at least the acidic substance is removed, to thereby produce a mask blank with the resist film; and subjecting the mask blank with the resist film to writing, development and etching to thereby produce the mask pattern.
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