Reactive gases with concentrations of increased stability and processes for manufacturing same
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C23C-016/00
B65D-085/00
출원번호
UP-0416556
(2009-04-01)
등록번호
US-7850790
(2011-02-10)
발명자
/ 주소
Jacksier, Tracey
Benesch, Robert
Haouchine, Malik
출원인 / 주소
American Air Liquide, Inc.
대리인 / 주소
Holguin, Donna Blalock
인용정보
피인용 횟수 :
1인용 특허 :
80
초록▼
Methods of passivating a metal surface are described, the methods comprising the steps of exposing the metal surface to a silicon-containing passivation material, evacuating the metal surface, exposing the treated surface to a gas composition, having a concentration of reactive gas that is greater t
Methods of passivating a metal surface are described, the methods comprising the steps of exposing the metal surface to a silicon-containing passivation material, evacuating the metal surface, exposing the treated surface to a gas composition, having a concentration of reactive gas that is greater than an intended reactive gas concentration of gas to be transported by the metal surface, evacuating the metal surface to remove substantially all of the gas composition to enable maintenance of an increased shelf-life, low concentration reactive gas at an intended concentration, and exposing the metal surface to the reactive gas at the intended reactive gas concentration. Manufactured products, high stability fluids, and methods of making same are also described.
대표청구항▼
What is claimed is: 1. A method of making a reactive gas product comprising the steps of: a) exposing an internal metal surface of a container to a first fluid composition, comprising a silicon-containing compound for a time sufficient to allow at least some of the silicon-containing compound to re
What is claimed is: 1. A method of making a reactive gas product comprising the steps of: a) exposing an internal metal surface of a container to a first fluid composition, comprising a silicon-containing compound for a time sufficient to allow at least some of the silicon-containing compound to react with an oxygen-containing compound present to form a silicon-treated surface on at least some of the internal metal surface, the silicon-containing compound selected from the group consisting of compounds within the general formula: SiR1R2R3R4 wherein R1, R2, R3, and R4 are the same or different and are independently selected from the group consisting of hydrogen, halogen, alkyl, aryl, amine, halogenated alkyl, and halogenated aryl; b) evacuating the container for a time sufficient to remove substantially all silicon-containing compound that has not reacted with the oxygen-containing compound to form the silicon-treated surface; c) exposing the silicon-treated surface to a second fluid composition, the second fluid composition comprising a reactive gas having a concentration that is at least 10 times greater than the intended reactive gas concentration of the reactive gas product; d) evacuating the container for a time sufficient to remove substantially all of the second fluid composition, thus forming a passivated internal metal surface in the container including the silicon treated surface and reactive gas adsorbed on the silicon treated surface; and e) filling the container with a third fluid composition having the intended reactive gas concentration for the reactive gas product. 2. The method of claim 1, wherein the silicon-containing compound is selected from the group consisting of silane and a methyl-containing silane. 3. The method of claim 2, wherein said methyl-containing silane is selected from the group consisting of methylsilane, dimethylsilane, trimethylsilane, and tetramethylsilane. 4. The method of claim 1, wherein steps i) and ii) are repeated prior to step iii). 5. The method of claim 1, wherein the composition of the silicon-containing gas used in step iii) ranges from about 100 ppm to 100%. 6. The method of claim 1, wherein during step i) the first fluid composition is heated to a temperature of not more than 74° C. 7. The method of claim 1, wherein during step iii) the second fluid composition is heated to a temperature of not more than 74° C. 8. The method of claim 1, wherein said reactive gas is selected from the group consisting of: a) nitrous oxide; b) nitric oxide; c) hydrogen chloride; d) chlorine; e) boron trichloride; f) ammonia; g) amines; h) amides; i) alcohols; j) ethers; k) carbonyl compounds; and 1) gases that will not react with a silicon-containing material. 9. The method of claim 1, wherein said reactive gas is selected from the group consisting of carbondisulfide, carbonylsulfide, and compounds within formula (I): Y—S—X (I) wherein S is sulfur, and X and Y are the same or different and are independently selected from the group consisting of hydrogen, alkyl, aryl, oxygen, hydroxyl, amino and aminosilane. 10. The method of claim 1, wherein said reactive gas includes a nitrogen-containing compound having the formula (II) comprising: wherein N is nitrogen, and X, Y and Z are the same or different and are independently selected from the group consisting of hydrogen, alkyl, aryl, hydroxyl and carbonyl.
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