초록 ▼

This invention relates to a kind of devices with trace emission resulted for treatment of exhaust gas. The device comprises a vessel having only one opening that serves as inlet. At least two gas exchange sections in sequence are provided inside the vessel after inlet of exhaust gas, between two gas

This invention relates to a kind of devices with trace emission resulted for treatment of exhaust gas. The device comprises a vessel having only one opening that serves as inlet. At least two gas exchange sections in sequence are provided inside the vessel after inlet of exhaust gas, between two gas exchange sections there is a gas mixture chamber at their connection part. The gas exchange chamber at first gas exchange section has a through opening leading to outside atmosphere area. With this configuration, on entering into the gas exchange section, exhaust gas will be ejected inwards and causes very strong entrainment, which makes the gas chamber become vacuum and sucks air with oxygen from atmosphere into gas chamber via the through opening to atmosphere. Formed high-pressure gas is burned furiously with combustible gas in the gas chamber at next stage, and the remaining exhaust gas is transferred into next gas exchange section with very high-speed revolution occurring on exhaust gas and momentum transfer. The higher negative pressure is, the more gas is consumed. In this way, the exhaust gas will be treated and only trace emission, even no emission, will be resulted.

대표청구항 ▼

What is claimed is: 1. A device with trace emission for treatment of exhaust gas comprising: a vessel having an inlet for receiving exhaust gas, a plurality of exchange sections located inside the vessel after the inlet for receiving exhaust gas; each exchange section including a means with jet hol

What is claimed is: 1. A device with trace emission for treatment of exhaust gas comprising: a vessel having an inlet for receiving exhaust gas, a plurality of exchange sections located inside the vessel after the inlet for receiving exhaust gas; each exchange section including a means with jet holes, a gas exchange chamber, a means with diffusion holes, and a gas mixture chamber; the gas exchange chamber being located between the means with jet holes and the means with diffusion holes to connect the means with jet holes and the means with diffusion holes together; a through opening leading to the atmosphere provided at the first gas exchange chamber; the gas mixture chamber being located between two sequential exchange sections after the means with diffusion holes; an exhaust pipe provided with a last gas mixture chamber; wherein from a third gas exchange section to a last gas exchange section at least one of the gas exchange chambers being connected with another one of the gas exchange chambers by a pipe of negative pressure, or at least one of the gas exchange chambers being connected with one of the gas mixture chambers by a pipe of negative pressure. 2. The device with trace emission for treatment of exhaust gas of claim 1, wherein the device has 13 exchange sections, each exchange section includes the means with jet holes, the gas exchange chamber, the means with diffusion hole, the gas mixture chamber, the exhaust pipe is provided with the gas mixture chamber of the last exchange section, the through opening is provided at the gas exchange chamber of first gas exchange section. 3. The device with trace emission for treatment of exhaust gas of claim 2, wherein the pipe of negative pressure connects the gas exchange chamber of third gas exchange section with the gas mixture chamber of the eleventh gas exchange section. 4. The device with trace emission for treatment of exhaust gas of claim 2, wherein the pipe of negative pressure connects the gas exchange chamber of eight gas exchange section with the gas mixture chamber of the ninth gas exchange section. 5. The device with trace emission for treatment of exhaust gas of claim 2, wherein the pipe of negative pressure connects the gas exchange chamber with the gas mixture chamber in each gas exchange section from the third to twelfth gas exchange section. 6. The device with trace emission for treatment of exhaust gas of claim 2, wherein the pipe of negative pressure connects the gas exchange chamber of third gas exchange section with the gas mixture chamber of the eleventh gas exchange section; the pipe of negative pressure connects the gas exchange chamber of eight gas exchange section with the gas mixture chamber of the ninth gas exchange section. 7. The device with trace emission for treatment of exhaust gas of claim 2, wherein the jet holes can be replaced by laminar flow holes. 8. The device with trace emission for treatment of exhaust gas of claim 2, wherein the means with jet holes and the means with diffusion holes of the first gas exchange section have 50 jet holes and 50 diffusion holes respectively. 9. The device with trace emission for treatment of exhaust gas of claim 2, wherein the means with jet holes and the means with diffusion holes of the second gas exchange section have 100 jet holes and 100 diffusion holes respectively. 10. The device with trace emission for treatment of exhaust gas of claim 2, wherein the means with jet holes and the means with diffusion holes of the third, fourth, fifth, sixth and seventh gas exchange sections have 150 jet holes and 150 diffusion holes respectively. 11. The device with trace emission for treatment of exhaust gas of claim 2, wherein the means with jet holes and the means with diffusion holes of the ninth, tenth and eleventh gas exchange sections have 300 jet holes and 300 diffusion holes respectively. 12. The device with trace emission for treatment of exhaust gas of claim 2, wherein the device can be in parallel connection, a first series connection of the first gas exchange section, second gas exchange section, to an nth gas exchange section connects with the second series connection of the first gas exchange section, second gas exchange section to an nth gas exchange section in parallel, wherein n<13, two last gas mixture chambers of the first and second connections are combined as one combining gas mixture chamber, and a exhaust pipe is connected with the combining gas mixture chamber. 13. The device with trace emission for treatment of exhaust gas of claim 12, wherein the two last gas mixture chambers of the first and second connections keep independent, two exhaust pipes are connected with the two last gas mixture chambers respectively.