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Formation of CIGS absorber layer materials using atomic layer deposition and high throughput surface treatment

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 UP-0943658 (2004-09-18)
등록번호 US-7858151 (2011-02-24)
발명자 / 주소
  • Sager, Brian M.
  • Roscheisen, Martin R.
  • Leidholm, Craig
출원인 / 주소
  • Nanosolar, Inc.
인용정보 피인용 횟수 : 7  인용 특허 : 33

초록

An absorber layer may be formed on a substrate using atomic layer deposition reactions. An absorber layer containing elements of groups IB, IIIA and VIA may be formed by placing a substrate in a treatment chamber and performing atomic layer deposition of a group IB element and/or one or more group I

대표청구항

What is claimed is: 1. A method for forming an absorber layer containing elements of groups IB, IIIA and VIA, comprising the steps of: atomic monolayer resolution tuning of a bandgap grading of a precursor layer on a substrate, wherein the tuning occurs with spatial uniformity and resolution throug

이 특허에 인용된 특허 (33)

  1. Motohiro Tomoyoshi (Aichi JPX) Takeda Yasuhiko (Aichi JPX) Noda Shoji (Aichi JPX) Watanabe Yoshihide (Aichi JPX), Anisotropic nanophase composite material and method of producing same.
  2. Ovshinsky Herbert C. (Oak Park MI) Izu Masatsugu (Birmingham MI), Apparatus for continuously producing tandem amorphous photovoltaic cells.
  3. Dotter ; II Buddy R. ; Doehler Joachim ; Ellison Timothy ; Izu Masatsugo ; Ovshinsky Herbert C., Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor.
  4. Onabe Kazunori,JPX ; Sadakata Nobuyuki,JPX ; Saito Takashi,JPX ; Kohno Osamu,JPX ; Yamaguchi Taichi,JPX ; Iijima Yasuhiro,JPX ; Nagaya Shigeo,JPX ; Hirano Naoki,JPX, Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same.
  5. Sager,Brian M., Device based on coated nanoporous structure.
  6. Bache Roger J. (Reading GB2), Formation of coatings on cutting edges.
  7. Roscheisen,Martin R.; Pichler,Karl, High throughput surface treatment on coiled flexible substrates.
  8. Sugihara Hideki,JPX ; Arakawa Hironori,JPX ; Sayama Kazuhiro,JPX ; Singh Lok Pratap,JPX ; Nazeeruddin Mohammad Khaja,CHX ; Graetzel Michael,CHX, Metal complex useful as sensitizer, dye-sensitized oxide semiconductor electrode and solar cell using same.
  9. Iizuka, Toshihiro; Yamamoto, Tomoe, Method for forming capacitor.
  10. Brinker C. Jeffrey ; Lu Yunfeng ; Fan Hongyou, Method for making surfactant-templated, high-porosity thin films.
  11. Suntola Tuomo (Riihikallio 02610 Espoo 61 SF) Antson Jorma (Urheilutie 22 ; 01350 Vantaa 35 SF), Method for producing compound thin films.
  12. Kay Andreas G. (Lausanne CHX) Graetzel Michael (St. Sulpice WA CHX) O\Regan Brian (Seattle WA), Method for the manufacture of a photo-electrochemical cell and a cell made by this method.
  13. Chan, Lap; Chu, Sanford; Ng, Chit Hwei; Pradeep, Yelehanka Ramachandramurthy; Zheng, Jia Zhen, Method of forming a surface coating layer within an opening within a body by atomic layer deposition.
  14. Marsh, Eugene P., Method of making an oxygen diffusion barrier for semiconductor devices using platinum, rhodium, or iridium stuffed with silicon oxide.
  15. Sasaki Hajime (Itami JPX) Morikawa Hiroaki (Itami JPX) Satoh Kazuhiko (Itami JPX) Deguchi Mikio (Itami JPX), Method of producing a thin-film solar cell.
  16. Carpenter, Craig M.; Dando, Ross S.; Mardian, Allen P., Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.
  17. Derderian, Garo J.; Sandhu, Gurtej, Methods for forming thin layers of materials on micro-device workpieces.
  18. Madan Arun (Golden CO) Von Roedern Bolko (Wheat Ridge CO), Modular continuous vapor deposition system.
  19. Klaus Petritsch GB; Magnus Granstrom SE, Multilayer photovoltaic or photoconductive devices.
  20. Green Martin Andrew,AUX ; Wenham Stuart Ross,AUX, Multilayer solar cells with bypass diode protection.
  21. Nakamura Shigeru,JPX, Photoelectric conversion device and photo cell.
  22. Saurer Eric (Bevaix CHX) Grtzel Michael (St-Sulpice CHX) Meyer Tobias (Fchy CHX), Photovoltaic cell.
  23. Wang Ying ; Harrison Larry Wayne, Photovoltaic cells.
  24. Nath Prem (Rochester Hills MI) Laarman Timothy (Almont MI), Photovoltaic roof and method of making same.
  25. Goedicke Klaus (Dresden DEX) Scheffel Bert (Dresden DEX) Reschke Jonathan (Dresden DEX) Schiller Siegfried (Dresden DEX) Kirchhoff Volker (Dresden DEX) Werner Torsten (Dresden DEX), Process and apparatus for plasma-activated electron beam vaporization.
  26. Skarp, Jarmo; Linnermo, Mervi; Asikainen, Timo, Process for producing aluminum oxide films at low temperatures.
  27. Wada Takahiro (Katano JPX) Nishitani Mikihiko (Nara JPX) Negami Takayuki (Katano JPX), Process for producing chalcopyrite type compound thin film.
  28. Karg Franz (Munchen DEX) Probst Volker (Munchen DEX), Rapid process for producing a chalcopyrite semiconductor on a substrate.
  29. Albin David S. (Denver CO) Carapella Jeffrey J. (Evergreen CO) Tuttle John R. (Denver CO) Contreras Miguel A. (Golden CO) Gabor Andrew M. (Boulder CO) Noufi Rommel (Golden CO) Tennant Andrew L. (Denv, Recrystallization method to selenization of thin-film Cu(In,Ga)Se2 for semiconductor device applications 상세보기
  • Hashimoto Yasuhiro,JPX ; Negami Takayuki,JPX ; Hayashi Shigeo,JPX ; Wada Takahiro,JPX, Semiconductor thin film, method for manufacturing the same, and solar cell using the same.
  • Kambe Nobuyuki ; Dardi Peter S., Solar cell.
  • Albright Scot P. (Lakewood CO) Chamberlin Rhodes (El Paso TX), Thin film photovoltaic device and process of manufacture.
  • Davey Keith S. A. (Royston GB2), Thin films of compounds and alloy compounds of Group III and Group V elements.
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    1. Agarwal, Mangilal; Varahramyan, Khodadad; Shrestha, Sudhir, Layer-by-layer nanoassembled nanoparticles based thin films for solar cell and other applications.
    2. Basol, Bulent M., Method and apparatus to form solar cell absorber layers with planar surface.
    3. Basol, Bulent M., Methods of forming thin layers of photovoltaic absorbers.
    4. Jackrel, David B.; Dickey, Katherine; Pollock, Kristin; Woodruff, Jacob; Stone, Peter; Brown, Gregory, Multi-nary group IB and VIA based semiconductor.
    5. Jackrel, David B.; Dickey, Katherine; Pollock, Kristin; Woodruff, Jacob; Stone, Peter; Brown, Gregory, Multi-nary group IB and VIA based semiconductor.
    6. Albin, David S.; Vora, Nirav; Jimenez, Sebastian Caparros; Gutierrez, Joaquin Murillo; Cortezon, Emilio Sanchez; Romero, Manuel, Systems and methods for forming solar cells with CuInSe2 and Cu(In,Ga)Se2 films.
    7. King, David M.; Lichty, Paul R., Vapor deposition process for the manufacture of coated particles.
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