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System and method comprising same for measurement and/or analysis of particles in gas stream 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-001/22
출원번호 US-0340641 (2006-01-27)
등록번호 US7867779 (2010-12-28)
발명자 / 주소
  • McDermott, Wayne Thomas
  • Ockovic, Richard Carl
  • Roth, Dean Van-John
출원인 / 주소
  • Air Products and Chemicals, Inc.
대리인 / 주소
    Rosaleen P., Morris-Oskanian
인용정보 피인용 횟수 : 2  인용 특허 : 62

초록

A system and method for measuring and analyzing particles within a gas feed stream. In one aspect, the system includes a particle counter and a particle capture filter that are arranged in parallel. In another aspect, the system includes a purifying device to remove trace molecular impurities from a

대표청구항

The invention claimed is: 1. A system for measuring and/or analyzing particles within a gas feed stream, the system comprising:a purifying device to provide a purified gas feed stream wherein the purifying device removes substantially all of the molecular impurities in the purified gas feed stream b

이 특허에 인용된 특허 (62)

  1. Baldwin, Teresa; Richey, Mary; Drage, James S.; Wu, Hui-Jung; Spear, Richard, Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography.
  2. Teresa Baldwin ; Mary Richey ; James S. Drage ; Hui-Jung Wu ; Richard Spear, Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography.
  3. Sakamoto, Yoshinori; Omori, Katsumi; Hagiwara, Yoshio, Anti-reflective coating-forming composition.
  4. Wayne Thomas McDermott ; Richard Carl Ockovic, Apparatus and method for detecting particles in reactive and toxic gases.
  5. Park Sang-o,KRX ; Kim Jin-sung,KRX ; Kang Hee-se,KRX ; Moon Sang-young,KRX, Apparatus for measuring contamination particles during the manufacture of semiconductor devices.
  6. Thornton Joseph Scott (5902 W. Bee Caves Road Austin TX 78746) Golla Edward Dale (5112 N. Lamar Blvd. Austin TX 78751), Apparatus for sampling gas mixtures.
  7. Eichinger, Kurt, Applicator device.
  8. Christensen, Scott Patrick; Derstine, Christopher W.; Keen, Brian T., Aqueous cleaning compositions.
  9. McMillan, Brian; Klamm, Doug, Buried splice enclosure.
  10. Mandal Robert P. ; Cheung David ; Yau Wai-Fan, CVD nanoporous silica low dielectric constant films.
  11. Mountsier Thomas Weller, Chemical vapor deposition of low density silicon dioxide films.
  12. Meagley, Robert P.; Goodner, Michael D., Composite sacrificial material.
  13. Rovito, Roberto John; Rennie, David Barry; Durham, Dana L., Compositions for removing etching residue and use thereof.
  14. Schildmeyer Frederic C. ; Shahan Brian J., Condensation nucleus counter having vapor stabilization and working fluid recovery.
  15. Lee, Seung Woo, Control device for an infrared ray sauna facility.
  16. Yin, Zhiping; Chen, Gary, Dry low k film application for interlevel dielectric and method of cleaning etched features.
  17. Rey Louis (Epalinges CHX) Ottar Brynjulf (Kjeller NOX) Lafon Louis (Paris FRX), Filter comprising a material obtained by freeze-drying, method of preparation and use especially in pharmacy.
  18. Peters, Darryl W.; Ward, Irl E., Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature.
  19. Lee Sok-ho,KRX, Manifold systems and methods for delivering samples of microelectronic device processing gases to gas analyzers.
  20. Wang Hwa-Chi (Naperville IL) Udischas Richard J. (Chicago IL), Metal sampling method and system for non-hydrolyzable gases.
  21. Wang Hwa-Chi ; Udischas Richard J., Metal sampling method and system for non-hydrolyzable gases.
  22. Wang, Fei; Okada, Lynne A.; Subramanian, Ramkumar; Kai, James K.; Gabriel, Calvin T.; You, Lu, Method for forming an interconnect structure using a CVD organic BARC to mitigate via poisoning.
  23. Morrow, Patrick, Method for making a dual damascene interconnect using a dual hard mask.
  24. Ebrahim Andideh ; Alan M. Myers, Method for making a semiconductor device that has a dual damascene interconnect.
  25. Hussein Makarem A. ; Sivakumar Sam, Method for patterning dual damascene interconnects using a sacrificial light absorbing material.
  26. Makarem A. Hussein ; Sam Sivakumar, Method for patterning dual damascene interconnects using a sacrificial light absorbing material.
  27. Loboda Mark Jon ; Seifferly Jeffrey Alan, Method for producing hydrogenated silicon oxycarbide films having low dielectric constant.
  28. Kimura Masao,JPX ; Tarutani Kohei,JPX, Method for qualifying the cylinder valve on gas cylinders.
  29. Kasper Gerhard (Downers Grove IL) Wen Horng-Yuan (Brookfield IL) Nishikawa Yukinobu (Darien IL), Method for reducing pressure of highly compressed gases without generation of condensation droplets.
  30. Chu, Pei-Hung, Method of avoiding enlargement of top critical dimension in contact holes using spacers.
  31. Yau Wai-Fan ; Cheung David ; Jeng Shin-Puu ; Liu Kuowei ; Yu Yung-Cheng, Method of depositing a low k dielectric with organo silane.
  32. Goundar, Kamal Kishore, Method of forming low-k films.
  33. Wang Hwa-Chi (Downers Grove IL) Udischas Richard J. (Chicago IL), Method of introducing and controlling compressed gases for impurity analysis.
  34. Andideh, Ebrahim; Peterson, Kevin L., Method of making a semiconductor device by converting a hydrophobic surface of a dielectric layer to a hydrophilic surface.
  35. Park, Hyun-Mog, Method of making a semiconductor device by forming a masking layer with a tapered etch profile.
  36. Park, Hyun-Mog; Leu, Jihperng; Wu, Chih-I, Method of making a semiconductor device by forming a masking layer with a tapered etch profile.
  37. Andideh, Ebrahim, Method of making a semiconductor device using a silicon carbide hard mask.
  38. Wen Horng-Yuan (Brookfield IL) Wang Hwa-Chi (Downers Grove IL) Chesters Stephen (Chicago IL), Method of separating condensible vapors from particles in highly compressed gases.
  39. Wang Hwa-chi (Downers Grove IL) Udischas Richard J. (Chicago IL), Method to analyze particle contaminants in compressed gases.
  40. Wang Hwa-chi ; Udischas Richard J., Method to analyze particle contaminants in compressed gases.
  41. Andideh, Ebrahim, Method to avoid via poisoning in dual damascene process.
  42. Cabuz, Cleopatra; Glenn, Max C.; Erdmann, Francis M.; Horning, Robert D., Methods for reducing the curvature in boron-doped silicon micromachined structures.
  43. Vrtis, Raymond Nicholas; O'Neill, Mark Leonard; Vincent, Jean Louise; Lukas, Aaron Scott; Xiao, Manchao; Norman, John Anthony Thomas, Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants.
  44. Alfred Grill ; Vishnubhai Vitthalbhai Patel ; Stephen McConnell Gates, Multiphase low dielectric constant material and method of deposition.
  45. Vincent, Jean Louise; O'Neill, Mark Leonard; Withers, Jr., Howard Paul; Beck, Scott Edward; Vrtis, Raymond Nicholas, Organosilicon precursors for interlayer dielectric films with low dielectric constants.
  46. Malczewski Mark L. (North Tonawanda NY) Holmer Arthur E. (Lewiston NY) Demmin Hollis C. (Tonawanda NY), Particle sampling system for gas supply system.
  47. Crivello James V. (Clifton Park NY) Lee Julia L. (Schenectady NY), Photocurable compositions.
  48. Renner Carl A. (Wilmington DE), Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates.
  49. Crivello James V. (Clifton Park NY), Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials.
  50. Goodner, Michael D., Polymer sacrificial light absorbing structure and method.
  51. Ito Hiroshi (San Jose CA) Willson Carlton G. (San Jose CA) Frechet Jean M. J. (Ottawa CAX), Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile grou.
  52. Lee Chung J. ; Wang Hui ; Foggiato Giovanni Antonio, Precursors for making low dielectric constant materials with improved thermal stability.
  53. Wang Hwa-Chi (Downers Grove IL) Montgomery Donnel (Chicago IL) Wen Horng-Yuan (Brookfield IL) Kasper Gerhard (Downers Grove IL), Pressure reduction device for particle sampling from compressed gases.
  54. Tsukamoto Toshiyuki (Ushiku JPX) Fanjat Norbert (Tsukuba JPX) Friedt Jean (Tokyo JPX), Process for distributing ultra high purity gases with minimized contamination and particulates.
  55. Kneer, Emil Anton, Process for removing contaminant from a surface and composition useful therefor.
  56. Biswas Pratim ; Wu Chang-Yu, Process for the enhanced capture of heavy metal emissions.
  57. Smith George H. (Maplewood MN), Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems.
  58. Baldwin, Teresa; Kennedy, Joseph; Hacker, Nigel; Spear, Richard, Spin-on-glass anti-reflective coatings for photolithography.
  59. Kennedy, Joseph; Baldwin, Teresa; Hacker, Nigel P.; Spear, Richard, Spin-on-glass anti-reflective coatings for photolithography.
  60. Zweifel Hans (Basel CHX) Bauer Sigrid (Lutry CHX) Meier Kurt (Allschwil CHX), Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images.
  61. Alfred Grill ; David R. Medeiros ; Vishnubhai V. Patel, Ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device containing the same.
  62. Gutierrez, David; Luciani, Vincent K.; Burgess, Mary C., Use of an organic dielectric as a sacrificial layer.

이 특허를 인용한 특허 (2)

  1. Cheng, Meng-Dawn; Allman, Steve L., Membrane based apparatus for measurement of volatile particles.
  2. Stallinga, Sjoerd; Cattaneo, Stefano, Method and apparatus for rapid filter analysis of fluid samples.
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