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Additives to prevent degradation of cyclic alkene derivatives 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C09K-015/08
출원번호 US-0498726 (2009-07-07)
등록번호 US7871536 (2011-01-03)
발명자 / 주소
  • Teff, Daniel J.
  • Chagolla, John L.
출원인 / 주소
  • Fujifilm Electronic Materials U.S.A., Inc.
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 2  인용 특허 : 46

초록

This disclosure relates to compositions that includes (a) one or more substituted or unsubstituted cyclic alkenes, and (b) an antioxidant composition including at least one compound of Formula (I):R1 through R4 in Formula (I) are described in the specification.

대표청구항

What is claimed is: 1. A composition, comprising:(a) one or more substituted or unsubstituted cyclic alkenes, and(b) an antioxidant composition comprising at least one compound of Formula (I),

이 특허에 인용된 특허 (46)

  1. Teff, Daniel J.; Smith, Gregory B.; Chagolla, John L.; Andreyka, Tim S., Additives to prevent degradation of alkyl-hydrogen siloxanes.
  2. Teff,Daniel J.; Smith,Gregory B.; Chagolla,John L.; Andreyka,Tim S., Additives to prevent degradation of alkyl-hydrogen siloxanes.
  3. Malec Robert E. (Birmingham MI), Antioxidant.
  4. Malec Robert E. (Birmingham MI), Antioxidant.
  5. Wollensak ; John C. ; Ihrman ; Kryn G. ; Elsey ; Paul G., Antioxidant.
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  24. Grill, Alfred; Patel, Vishnubhai V., Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device.
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이 특허를 인용한 특허 (2)

  1. Teff, Daniel J.; Chagolla, John L., Additives to prevent degradation of cyclic alkene derivatives.
  2. Teff, Daniel J.; Chagolla, John L., Additives to prevent degradation of cyclic alkene derivatives.
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