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Cyclic structure formation method and surface treatment method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-006/34
출원번호 US-0529376 (2003-09-25)
등록번호 US7875414 (2011-01-10)
우선권정보 JP-2002-002-283954(2002-09-27)
국제출원번호 PCT/JP03/12308 (2003-09-25)
§371/§102 date 20050920 (20050920)
국제공개번호 WO04/035255 (2004-04-29)
발명자 / 주소
  • Sawada, Hiroshi
  • Kurosawa, Kou
출원인 / 주소
  • Canon Machinery Inc.
대리인 / 주소
    J.C. Patents
인용정보 피인용 횟수 : 2  인용 특허 : 24

초록

A periodic structure is to be successively formed over an extensive area with a uniaxial laser beam. Such method includes irradiating a uniaxial laser beam near an ablation threshold to a surface of a material; and executing an overlapped scanning on the irradiated region, so as to cause an ablation

대표청구항

What is claimed is: 1. A method of forming a periodic structure, comprising:irradiating a surface of a material with a linearly polarized single laser beam of a femtosecond laser, of which a fluence is above but nearly as low as ablation threshold; andexecuting an overlapped scanning in which the la

이 특허에 인용된 특허 (24)

  1. Herman, Peter R.; Marjoribanks, Robin; Oettl, Anton, Burst-ultrafast laser machining method.
  2. Taylor,Rod; Corkum,Paul; Vedula,Ravi Bhardwaj; Simova,Eli; Rayner,David; Hnatovsky,Cyril, Fabrication of long range periodic nanostructures in transparent or semitransparent dielectrics.
  3. Aitken, Bruce G.; Borrelli, Nicholas F.; Morse, David L.; Streltsov, Alexander, Femtosecond laser writing of glass, including borosilicate, sulfide, and lead glasses.
  4. Fainman,Yeshaiahu; Nakagawa,Wataru; Chen,Chyong Hua; Sun,Pang Chen; Pang,Lin, Holographically defined surface mask etching method and etched optical structures.
  5. Byron Kevin C. (Bishop\s Stortford GB3), Induced grating devices and method of making same.
  6. Asano, Akihiko, Laser irradiation apparatus and method of treating semiconductor thin film.
  7. Jun Amako JP; Masami Murai JP; Tsutomu Ota JP; Tomio Sonehara JP, Laser machining apparatus with a rotatable phase grating.
  8. Amako Jun,JPX ; Murai Masami,JPX ; Ota Tsutomu,JPX ; Sonehara Tomio,JPX, Laser machining apparatus with rotatable phase grating.
  9. Koyama Tadashi,JPX ; Tsunetomo Keiji,JPX, Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device.
  10. Hackel, Lloyd A.; Halpin, John M.; Harris, Jr., Fritz B., Laser peening of components of thin cross-section.
  11. Nagata Itsuo (Minou JPX) Miyamoto Hiroki (Nara JPX) Moriwaki Kosuke (Sakai JPX) Oshima Ichiro (Amagasaki JPX) Oshima Tokihiko (Amagasaki JPX) Hirata Shigekazu (Amagasaki JPX) Okano Yoshikazu (Amagasa, Method and apparatus for metal surface process by laser beam.
  12. Werner,Humbs; Thomas,Schrader, Method and apparatus for structuring electrodes for organic light-emitting display and organic light-emitting display manufactured using the method and apparatus.
  13. Mossberg, Thomas W., Method for forming a holographic spectral filter.
  14. Sasaki Hideyuki,JPX ; Oose Michihiro,JPX ; Suzuki Isao,JPX ; Takeno Shiro,JPX ; Tomita Mitsuhiro,JPX ; Kawakyu Yoshito,JPX ; Matsuura Yuki,JPX ; Mitsuhashi Hiroshi,JPX, Method for manufacturing polycrystal semiconductor film.
  15. Shimomura,Akihisa; Koyama,Masaki; Shoji,Hironobu, Method for manufacturing semiconductor device, and laser irradiation apparatus.
  16. Singh Rajiv K. (Gainesville FL), Method of applying a laser beam creating micro-scale surface structures prior to deposition of film for increased adhesi.
  17. Koyama Tadashi,JPX ; Tsunetomo Keiji,JPX ; Oikawa Masahiro,JPX ; Hamanaka Kenjiro,JPX, Method of changing the surface of a glass substrate containing silver, by using a laser beam.
  18. Epler John E. (Cupertino CA) Paoli Thomas L. (Los Altos CA), Method of fabricating semiconductor structures via photo induced evaporation enhancement during in situ epitaxial growth.
  19. Fischer Gerd (Bockenheim DEX) Hagemeyer Alfred (Ludwigshafen DEX) Hibst Hartmut (Schriesheim DEX) Richter Hans J. (Heidelberg DEX) Schildberg Hans-Peter (Mannheim DEX) Lazare Sylvain (Leognan FRX) Bo, Preparation of sheet-like polyethylene terephthalate materials having little surface roughness.
  20. Kouichi Ichimura JP; Toshiro Hiraoka JP, Process and device for producing photonic crystal, and optical element.
  21. Anderson, Mark T.; Leatherdale, Catherine A.; Thompson, D. Scott, Process for producing photonic crystals and controlled defects therein.
  22. Iwase, Hideo, Processing method and processing apparatus using interfered laser beams.
  23. Wagner, Alfred, System and method for eliminating the structure and edge roughness produced during laser ablation of a material.
  24. Clauser John F., Ultrahigh resolution interferometric x-ray imaging.

이 특허를 인용한 특허 (2)

  1. Lyon, Benjamin B.; O'Brien, Patrick E.; Myers, Scott A., Sensor stack having a graphical element formed by physical vapor deposition.
  2. Brickner, Michael T.; Davison, Ian; Cowan, Wayne; Fu, Naiming, Surface finishing.
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