$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method of manufacturing semiconductor device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/00
출원번호 US-0881285 (2007-07-25)
등록번호 US7994021 (2011-07-27)
우선권정보 JP-2006-006-206505(2006-07-28)
발명자 / 주소
  • Miyairi, Hidekazu
  • Shoji, Hironobu
  • Shimomura, Akihisa
  • Higa, Eiji
  • Moriwaka, Tomoaki
  • Yamazaki, Shunpei
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
    Hush Blackwell LLP
인용정보 피인용 횟수 : 9  인용 특허 : 63

초록 ▼

A method of forming a semiconductor device is provided, including a step of forming a layer which absorbs light over one face of a first substrate, a step of providing a second substrate over the layer which absorbs light, a step of providing a mask to oppose the other face of the first substrate, a

대표청구항 ▼

What is claimed is: 1. A method of manufacturing a semiconductor device, comprising the steps of:forming a first layer which absorbs light over one face of a first substrate;forming a second layer over the first layer;providing a second substrate over the second layer;providing a mask in contact wit

이 특허에 인용된 특허 (63)

  1. Ellis Ernest W. (Leverett MA) Foley Diane M. (Northampton MA) Arnold Dana R. (Northampton MA), Ablation-transfer imaging/recording.
    상세보기
  2. Ellis Ernest W. (Leverett MA) Foley Diane M. (Northampton MA) Arnold Dana R. (Northampton MA), Ablation-transfer imaging/recording.
    상세보기
  3. Yamada, Yuka; Yoshida, Takehito; Suzuki, Nobuyasu; Makino, Toshiharu; Hori, Yoshikazu, Cold cathode forming process.
    상세보기
  4. Yamazaki,Shunpei; Koyama,Jun; Nakajima,Setsuo; Sakamoto,Naoya, Display device.
    상세보기
  5. Seo,Satoshi; Yamazaki,Shunpei, Display device and method for manufacturing thereof.
    상세보기
  6. Shunpei Yamazaki JP; Mayumi Mizukami JP; Toshimitsu Konuma JP, EL display device.
    상세보기
  7. Yamazaki, Shunpei; Mizukami, Mayumi; Konuma, Toshimitsu, EL display device.
    상세보기
  8. Yamazaki,Shunpei; Konuma,Toshimitsu; Mizukami,Mayumi, EL display device utilizing light-emitting organic compounds and method for forming the same.
    상세보기
  9. Yamazaki Shunpei (Tokyo JPX) Mase Akira (Aichi JPX) Hiroki Masaaki (Kanagawa JPX), Electro-optical device.
    상세보기
  10. Yamazaki, Shunpei; Konuma, Toshimitsu; Koyama, Jun; Inukai, Kazutaka; Mizukami, Mayumi, Electronic device.
    상세보기
  11. Shimoda, Tatsuya; Kawai, Hideyuki; Inoue, Satoshi, Electrophoretic device, electronic sheet including the same, electronic book including the electronic sheet, and manufacturing method thereof.
    상세보기
  12. Shinohara Hisato,JPX ; Sugawara Akira,JPX, Excimer laser scanning system.
    상세보기
  13. Shimoda, Tatsuya; Inoue, Satoshi; Miyazawa, Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device and liquid crystal display device produced by the same.
    상세보기
  14. Shimoda, Tatsuya; Inoue, Satoshi; Miyazawa, Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same.
    상세보기
  15. Shimoda,Tatsuya; Inoue,Satoshi; Miyazawa,Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same.
    상세보기
  16. Nishikawa, Yukio; Uesugi, Yuji, Frequency fine-adjusting apparatus for a piezo-electric oscillator.
    상세보기
  17. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Konuma Toshimitsu,JPX ; Teramoto Satoshi,JPX, Integrated circuit and method of fabricating the same.
    상세보기
  18. Yu Chang (Boise ID) Doan Trung T. (Boise ID), Laser ablation deposition process for semiconductor manufacture.
    상세보기
  19. Tatah Abdelkrim (Arlington MA), Laser ablation forward metal deposition with electrostatic assisted bonding.
    상세보기
  20. Tatah Abdelkrim (Arlington MA), Laser ablation forward metal deposition with electrostatic assisted bonding.
    상세보기
  21. Yamazaki Shunpei (Tokyo JPX) Itoh Kenji (Tokyo JPX) Nagayama Susumu (Tokyo JPX), Laser scribing method.
    상세보기
  22. Sinohara Hisato (Sagamihara JPX), Laser scriving system and method.
    상세보기
  23. Williams Richard T. (Winston-Salem NC) Wrisley ; Jr. David B. (Greensboro NC) Wu Jeff C. (Clemmons NC), Laser transfer deposition.
    상세보기
  24. Joyce ; Jr. James L. (Winston-Salem NC) McCleaf Marlin R. (Colfax NC), Laser transfer process.
    상세보기
  25. Yamazaki,Shunpei; Konuma,Toshimitsu; Nishi,Takeshi, Light emitting device and method of manufacturing the same.
    상세보기
  26. Yamazaki, Shunpei; Konuma, Toshimitsu; Mizukami, Mayumi, Light-emitting EL display device.
    상세보기
  27. Lee Jae-won (Seoul KRX), Liquid crystal orientation control layer method and apparatus for manufacturing the same and mask for use in the manufac.
    상세보기
  28. Yamazaki,Shunpei; Arai,Yasuyuki, Manufacture method of display device.
    상세보기
  29. Chrisey Douglas B. ; McGill R. Andrew ; Pique Alberto, Matrix assisted pulsed laser evaporation direct write.
    상세보기
  30. Yamagishi Yasuo (Kawasaki JPX), Method and apparatus for laser machining.
    상세보기
  31. Kim Boris F. (Laurel MD) Bohandy Joseph (Columbia MD) Adrian Frank J. (Olney MD), Method and apparatus for the thin film deposition of materials with a high power pulsed laser.
    상세보기
  32. Shinohara Hisato,JPX ; Sugawara Akira,JPX, Method and system of laser processing.
    상세보기
  33. Shinohara Hisato,JPX ; Sugawara Akira,JPX, Method and system of laser processing.
    상세보기
  34. Engelsberg Audrey C., Method for enhancing chemisorption of material.
    상세보기
  35. Yamazaki Shunpei (Tokyo JPX) Fukada Takeshi (Ebina JPX) Sakama Mitsunori (Hiratsuka JPX) Amachi Nobumitsu (Atsugi JPX) Sakamoto Naoya (Atsugi JPX) Codama Mitsufumi (Atsugishi JPX) Fuki Takashi (Atsug, Method for making a high contrast liquid crystal display including laser scribing opaque and transparent conductive stri.
    상세보기
  36. Yamazaki Shunpei (Tokyo JPX) Suzuki Kunio (Tokyo JPX) Susukida Masato (Chiba JPX) Kinka Mikio (Ishikawa JPX) Fukada Takeshi (Kanagawa JPX) Abe Masayoshi (Tokyo JPX) Kobayashi Ippei (Hyougo JPX) Shiba, Method for manufacturing a semiconductor device free from electrical shortage due to pin-hole formation.
    상세보기
  37. Yamazaki Shunpei (Tokyo JPX) Mase Akira (Atsugi JPX) Sakayori Hiroyuki (Machida JPX), Method for manufacturing liquid crystal device having electrode strips of no use.
    상세보기
  38. Yamazaki Shunpei (Tokyo JPX) Mase Akira (Atsugi JPX) Sakayori Hiroyuki (Machida JPX), Method for manufacturing liquid crystal device having electrode strips of no use.
    상세보기
  39. Yamazaki Shunpei (Tokyo JPX) Mase Akira (Atsugi JPX) Sakayori Hiroyuki (Machida JPX), Method for manufacturing liquid crystal device having electrode strips of no use.
    상세보기
  40. Fukuchi,Kunihiko, Method for manufacturing wiring and method for manufacturing semiconductor device.
    상세보기
  41. Kian, Kouroche; Heydarpour, Ramin, Method for patterning a multilayered conductor/substrate structure.
    상세보기
  42. Yamazaki Shunpei (Tokyo JPX), Method of making plurality of series connected solar cells using multiple groove forming processes.
    상세보기
  43. Shimizu,Nobuo, Method of manufacturing a screen member for a transmission screen, a screen member for a transmission screen, a transmission screen and a rear projection.
    상세보기
  44. Inoue, Satoshi; Shimoda, Tatsuya, Method of separating thin film device, method of transferring thin film device, thin film device, active matrix substrate and liquid crystal display device.
    상세보기
  45. Inoue, Satoshi; Shimoda, Tatsuya, Method of separating thin-film device, method of transferring thin-film device, thin-film device, active matrix substrate, and liquid crystal display device.
    상세보기
  46. Maekawa,Shinji; Muranaka,Koji, Methods for forming wiring and manufacturing thin film transistor and droplet discharging method.
    상세보기
  47. Christopher P. Ausschnitt ; Nancy Greco ; Ernest N. Levine, Micro-surface fabrication process.
    상세보기
  48. Takakuwa, Atsushi; Tamura, Mutsumi, Microlens array, manufacturing method thereof, optical device and electronic device with reflective alignment mark in lens layer.
    상세보기
  49. Yamazaki Shunpei (Tokyo JPX), Photoelectric conversion device.
    상세보기
  50. Mayer Frederick J., Precision laser metallization.
    상세보기
  51. Nojima,Shigeo; Yonekubo,Masatoshi; Takeda,Takashi; Yamazaki,Tetsuro, Projector.
    상세보기
  52. Mayer Frederick J. (Ann Arbor MI), Pulsed laser microfabrication.
    상세보기
  53. Cook Eliot V. (Garland TX), Radiation induced pattern deposition.
    상세보기
  54. Engelsberg Audrey C. ; Parker William P., Removal of material by polarized radiation.
    상세보기
  55. Tatah Abdelkrim, Repair of metal lines by electrostatically assisted laser ablative deposition.
    상세보기
  56. Shimizu,Nobuo, Screen member for a transmission screen, a transmission screen and a rear projection.
    상세보기
  57. Yamazaki Shunpei (Tokyo JPX) Suzuki Kunio (Atsugi JPX) Kinka Mikio (Atsugi JPX) Fukada Takeshi (Ebina JPX) Abe Masayoshi (Tokyo JPX) Kobayashi Ippei (Atsugi JPX) Shibata Katsuhiko (Atsugi JPX) Susuki, Semiconductor defects curing method and apparatus.
    상세보기
  58. Shunpei Yamazaki JP; Jun Koyama JP; Setsuo Nakajima JP; Naoya Sakamoto JP, Semiconductor device and method for manufacturing the same.
    상세보기
  59. Yamazaki, Shunpei; Koyama, Jun; Nakajima, Setsuo; Sakamoto, Naoya, Semiconductor device and method for manufacturing the same.
    상세보기
  60. Yamazaki, Shunpei; Koyama, Jun; Nakajima, Setsuo; Sakamoto, Naoya, Semiconductor device and method for manufacturing the same.
    상세보기
  61. Nishi,Kazuo; Adachi,Hiroki; Kusumoto,Naoto; Sugawara,Yuusuke; Takahashi,Hidekazu; Yamada,Daiki; Hiura,Yoshikazu, Semiconductor device containing stacked semiconductor chips and manufacturing method thereof.
    상세보기
  62. Tatsuya Shimoda JP; Satoshi Inoue JP; Wakao Miyazawa JP, Separating method, method for transferring thin film device, thin film device, thin film integrated circuit device, and liquid crystal display device manufactured by using the transferring method.
    상세보기
  63. Yamazaki Shunpei (Tokyo JPX), Thin film pattern structure formed on a glass substrate.
    상세보기

이 특허를 인용한 특허 (9)

  1. Yamazaki, Shunpei; Aoyama, Tomoya; Tsurume, Takuya; Hamada, Takao, Deposition method and manufacturing method of light-emitting device.
    상세보기
  2. Yamazaki, Shunpei; Aoyama, Tomoya; Tsurume, Takuya; Hamada, Takao, Deposition method and manufacturing method of light-emitting device.
    상세보기
  3. Yamazaki, Shunpei, Deposition method and method for manufacturing light-emitting device.
    상세보기
  4. Yokoyama, Kohei; Sato, Yosuke; Aoyama, Tomoya; Takahashi, Rena, Evaporation donor substrate, method for manufacturing the same, and method for manufacturing light-emitting device.
    상세보기
  5. Komori, Shigeki; Komatsu, Ryu, Light-emitting device and manufacturing method thereof.
    상세보기
  6. Yamazaki, Shunpei; Seo, Satoshi, Method for forming film and method for manufacturing light emitting device.
    상세보기
  7. Yokoyama, Kohei; Sato, Yosuke, Method of manufacturing evaporation donor substrate and method of manufacturing light-emitting device.
    상세보기
  8. Miyairi, Hidekazu; Shoji, Hironobu; Shimomura, Akihisa; Higa, Eiji; Moriwaka, Tomoaki; Yamazaki, Shunpei, Method of manufacturing semiconductor device.
    상세보기
  9. Gelissen, Franciscus Wilhelmus Maria; Perez Graterol, Raul Marcelino, Process of depositing a metallic pattern on a medium.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로