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Forming method for polymeric laminated wafers comprising different film materials 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C30B-023/00
출원번호 US-0368929 (2006-03-06)
등록번호 US8002935 (2011-08-08)
발명자 / 주소
  • Sugimura, Hideyo
출원인 / 주소
  • Insight Equity A.P.X., L.P.
대리인 / 주소
    Inskeep IP Group, Inc.
인용정보 피인용 횟수 : 1  인용 특허 : 172

초록

A method of making a polymeric laminated wafer comprising different film materials that are softenable and formable at different softening temperatures corresponding with the film materials. Also disclosed is a laminated wafer wherein a first layer has different thermal properties than a second laye

대표청구항

What is claimed is: 1. A method for forming a laminated wafer comprising the following steps in the sequence set forth:(a) placing the laminated wafer having at least a cellulose resin protective layer and a polycarbonate base layer in a heated environment having a first temperature capable of softe

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이 특허를 인용한 특허 (1)

  1. Sugimura, Hideyo, Forming method for polymeric laminated wafers comprising different film materials.
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