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Thermal structure for sample processing systems 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-035/00
출원번호 US-0491959 (2009-06-25)
등록번호 US8003051 (2011-08-08)
발명자 / 주소
  • Bedingham, William
  • Aysta, James E.
  • Robole, Barry W.
출원인 / 주소
  • 3M Innovative Properties Company
대리인 / 주소
    Nicole J., Einerson
인용정보 피인용 횟수 : 0  인용 특허 : 182

초록

Sample processing systems for processing sample materials located in sample processing devices that are separate from the system are disclosed. The sample processing systems include a rotating base plate with raised and/or non-planar thermal structures on which the sample processing devices are loca

대표청구항

The invention claimed is: 1. A sample processing system comprising:a base plate adapted to receive a sample processing device proximate a top surface of the base plate;a thermal structure exposed on the top surface of the base plate, wherein an upper surface of the thermal structure contacts a sampl

이 특허에 인용된 특허 (182)

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