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Pulsed plasma device and method for generating pulsed plasma 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H05B-031/26
출원번호 US-0557645 (2009-09-11)
등록번호 US8030849 (2011-09-19)
발명자 / 주소
  • Suslov, Nikolay
출원인 / 주소
  • Plasma Surgical Investments Limited
대리인 / 주소
    Jones, Day
인용정보 피인용 횟수 : 13  인용 특허 : 123

초록

A device and a method for generating a truly pulsed plasma flow are disclosed. The device includes a cathode assembly comprising a cathode and a cathode holder, an anode, and two or more intermediate electrodes, the anode and the intermediate electrodes forming a plasma channel expanding toward the

대표청구항

What is claimed: 1. A method of generating pulses of plasma using a device comprising a cathode and an anode, the method comprising:a. passing a plasma-generating gas between the cathode and the anode; and repeatedly:b. establishing an electric arc between the cathode and the anode;c. controlling an

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  2. Lotti, Riccardo; Nozar, Petr; Taliani, Carlo, Device for generating plasma and for directing an flow of electrons towards a target.
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  5. Suslov, Nikolay, Plasma-generating device having a plasma chamber.
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  7. Suslov, Nikolay; Rubiner, Igor, Plasma-generating device, plasma surgical device and use of a plasma surgical device.
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