초록 ▼

The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of

The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.

대표청구항 ▼

What is claimed is: 1. A charged particle multi-beam system comprising:a charged particle source configured to generate at least one beam of charged particles;a stage configured to hold a flat substrate to be inspected; anda particle-optical component disposed in a beam path of the at least one beam

What is claimed is: 1. A charged particle multi-beam system comprising:a charged particle source configured to generate at least one beam of charged particles;a stage configured to hold a flat substrate to be inspected; anda particle-optical component disposed in a beam path of the at least one beam of charged particles downstream of the charged particle source, the particle-optical component comprising:a first multi-aperture plate having a plurality of apertures and a second multi-aperture plate having a plurality of apertures, wherein the second multi-aperture plate is spaced apart from the first multi-aperture plate such that a gap is formed therebetween;wherein the plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of the plurality of apertures of the second multi-aperture plate; andwherein a first width of the gap at a location of a first aperture of the plurality of apertures of the first multi-aperture plate is by at least 5% greater than a second width of the gap at a location of a second aperture of the plurality of apertures of the first multi-aperture plate;wherein the system further comprises:a voltage supply system configured to apply different electric potentials to the first and second multi-aperture plates of the particle-optical component; andat least one focusing particle-optical lens disposed in the beam path of the at least one charged particle beam downstream of the particle-optical component and configured to focus charged particle beamlets having traversed the particle-optical component onto the flat substrate.