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특허 상세정보

Ex-situ component recovery

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B05B-005/04   
미국특허분류(USC) 137/240; 137/266; 137/56523; 137/56529; 134/021
출원번호 US-0178097 (2008-07-23)
등록번호 US8042566 (2011-10-12)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 0  인용 특허 : 13
초록

Disclosed herein are devices, methods and systems for ex-situ component recovery. The ex-situ recovery can be performed by desorbing or outgassing components of a processing system in a recovery system, rather than in the processing system itself. The recovery system can include a docking station and/or a heated vacuum chamber. The heated vacuum chamber can be used to desorb or outgas components that will be located inside the processing system, while the docking station can be used to desorb or outgas components that will be connected to the processing ...

대표
청구항

What is claimed is: 1. An ex-situ recovery system, comprising:a component chamber to receive a component of a processing system, the component chamber having a first purge gas inlet to receive a purge gas source;a docking station to receive a connection to the component of the processing system, the docking station having a second purge gas inlet to receive the purge gas source; anda turbomolecular pump coupled to the component chamber and the docking station to apply a first vacuum pressure to the component chamber and the docking station.

이 특허에 인용된 특허 (13)

  1. Gebele Thomas,DEX ; Buschbeck Wolfgang,DEX. Apparatus for the rapid evacuation of a vacuum chamber. USP1999126004109.
  2. Turner Virgil O. ; Light William D. ; Trevino Hilario T.. Cleansing process for wafer handling implements. USP1998015711821.
  3. Zhou Jiaxiang ; Dasso Stephen D.. Cycle purging a vacuum chamber during bakeout process. USP1999035879467.
  4. Hughes Joel (Wilmington NC). Decontamination apparatus. USP1993015178823.
  5. Bardina Juan (Menlo Park CA) Gonzalez Mikel (San Jose CA). Decontamination apparatus for semiconductor wafer handling equipment. USP1984034437479.
  6. Banine,Vadim Yevgenyevich; Wildenberg,Lambertus Adrianus; Krivtsun,Vladimir Mihailovitch; Struycken,Alexander Matthijs; Ridder,Johannes Bernardus; Ivanov,Vladimir Vitalevitch; Smits,Josephus Jacobus. Ex-situ removal of deposition on an optical element. USP2008057372058.
  7. Gray, Donald; Fredrick, Charlotte. Method for removing particles and non-volatile residue from an object. USP2004086783601.
  8. Rao, Madhukar Bhaskara. Process for recovery, purification, and recycle of argon. USP2005016838066.
  9. Witherell Donald R. (Cedar Rapids IA). System for removing flux residues from printed wiring assemblies. USP1991095045117.
  10. Enicks,Darwin G.; Friedrichs,Carl E.; Brucher,Richard A.. System, apparatus and method for contaminant reduction in semiconductor device fabrication equipment components. USP2006057044147.
  11. Jain,Ravi; Dean,Julian Richard; Grant,Robert Bruce; Perelman,Naum; Stockman,Paul Alan; Condon,Neil; Harpham,Andrew John; Gerristead, Jr.,William R.. Treatment of effluent gases. USP2008057368000.
  12. Roberson ; Jr. Glenn A. (Hollister CA) Eglinton Robert B. (Montery CA). Vapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcohol. USP1994055315766.
  13. Enicks,Darwin G.. Very low moisture o-ring and method for preparing the same. USP2006077080440.