$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Method for the removal of airborne molecular contaminants using oxygen and/or water gas mixtures 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/00
출원번호 US-0523371 (2004-06-01)
등록번호 US8075704 (2011-11-29)
국제출원번호 PCT/US2004/017251 (2004-06-01)
§371/§102 date 20050621 (20050621)
국제공개번호 WO04/112117 (2004-12-23)
발명자 / 주소
  • Spiegelman, Jeffrey J.
  • Alvarez, Jr., Daniel
  • Holmes, Russell J.
  • Tram, Allan
출원인 / 주소
  • Entegris, Inc.
대리인 / 주소
    Hamilton, Brook, Smith & Reynolds, P.C.
인용정보 피인용 횟수 : 1  인용 특허 : 68

초록 ▼

The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is

대표청구항 ▼

What is claimed is: 1. A method for the removal of airborne molecular contaminants (AMC) from a substrate, comprising:outgassing the AMC from a surface of the substrate under conditions that do not chemically change or alter the AMC, by contacting at least a portion of the substrate with a purified

이 특허에 인용된 특허 (68)

  1. Kinkead Devon A. (Cumberland RI), Air filtering within clean environments.
    상세보기
  2. Kisakibaru,Toshirou; Okada,Makoto; Horibe,Yasunori, Air-purifying device for a front-opening unified pod.
    상세보기
  3. Chu Yao-Chang,TWX ; Paung Chi-Kaung,TWX ; Shyr Jerry,TWX, Apparatus and method for removing fine particles.
    상세보기
  4. Ohmi Tadahiyo (1-17-301 Komegabukuro 2-chome Sendai-shi ; Miyagi-ken 980 JPX), Apparatus for supplying ultrahigh purity gas.
    상세보기
  5. Miyajima Toshihiko,JPX, Clean box, clean transfer method and apparatus therefor.
    상세보기
  6. Butterbaugh Jeffery W. ; Gray David C. ; Fayfield Robert T., Cleaning method.
    상세보기
  7. Mori Kazuhiro (Katano JPX) Kubota Yoshiyuki (Katano JPX) Hashimoto Naoyuki (Hirakata JPX) Nogiwa Tatsuki (Hirakata JPX), Coupling-type clean space apparatus.
    상세보기
  8. McDermott Wayne Thomas (Allentown PA) Ockovic Richard Carl (Northampton PA) Wimmer ; II Robert William (Allentown PA), Cryogenically purged mini environment.
    상세보기
  9. Ridgeway Robert Gordon (Quakertown PA) Pearce Richard Vincent (Kempton PA) Maroulis Peter James (Mertztown PA) Dheandhanoo Seksan (Quakertown PA) Ketkar Suhas Narayan (Allentown PA), Dynamic dilution system.
    상세보기
  10. Fosnight William J. ; Bonora Anthony C. ; Martin Raymond S. ; Tatro Jay, Evacuation-driven SMIF pod purge system.
    상세보기
  11. Wu, Han-Ming; Dao, Giang, Filtered mask enclosure.
    상세보기
  12. Aggarwal, Ravinder, Front opening unified pod.
    상세보기
  13. Talu Orhan (Richmond Heights OH), Gas separation process.
    상세보기
  14. Cherry Roger L. (2636 Maria Ct. West Linn OR 97068), High-purity cleaning system, method, and apparatus.
    상세보기
  15. Lazzari Jean-Pierre (Corenc FRX) Cortial Henri (Sassenage FRX), Installation for the storage and transfer of objects in a very clean atmosphere.
    상세보기
  16. Narabayashi Tadashi,JPX, Jet finishing machine, jet finishing system using two-phase jet finishing method.
    상세보기
  17. Fosnight William J. ; Shenk Joshua W. ; Peterson Perry, Kinematic coupling compatible passive interface seal.
    상세보기
  18. Straaijer Alexander (Eindhoven NLX) Martens Jan W. D. (Veldhoven NLX), Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system.
    상세보기
  19. Pril, Wouter Onno; Henshaw, Philip Dennis; Van De Pasch, Engelbertus Antonius Fransiscus; Beems, Marcel Hendrikus Maria, Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition.
    상세보기
  20. Van Schaik, Willem; Duisterwinkel, Antonie Ellert; Mertens, Bastiaan Matthias; Meiling, Hans; Koster, Norbertus Benedictus, Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects.
    상세보기
  21. Van Der Net,Antonius Johannes; Spiegelman,Jeffrey J.; Van Bragt,Erik Johannus Josephus, Lithographic projection apparatus, gas purging method, device manufacturing method, and purge gas supply system.
    상세보기
  22. Jeong, Gyu-Chan; Kim, Ki-Sang, Load port of a semiconductor manufacturing apparatus having integrated kinematic coupling pins and sensors, and method of loading wafers using the same.
    상세보기
  23. Kenji Tokunaga JP, Load port system for substrate processing system, and method of processing substrate.
    상세보기
  24. Ivaldi, Jorge, Method and apparatus for a reticle with purged pellicle-to-reticle gap.
    상세보기
  25. Roth John Reece, Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure.
    상세보기
  26. Brooks Ray G. (Irving TX) Brooks Timothy W. (Irving TX) Corris C. James (Elkmont AL), Method and apparatus for maintaining clean articles.
    상세보기
  27. Sasson Somekh, Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system.
    상세보기
  28. Tetsuya Abe JP; Sadamitsu Tanzawa JP; Takayuki Masuda JP, Method and apparatus for separating, removing, and recovering gas components.
    상세보기
  29. Bonora Anthony C. (Menlo Park CA) Guerre Gilles (Les Loges en Josas CA FRX) Parikh Mihir (San Jose CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Santa Clara CA), Method and apparatus for transferring articles between two controlled environments.
    상세보기
  30. Hishiya,Shingo; Furusawa,Yoshikazu; Hayashi,Teruyuki; Saito,Misako; Umezawa,Kota; Sato,Syoichi, Method and apparatus for treating article to be treated.
    상세보기
  31. Whitlock David R., Method for ammonia production.
    상세보기
  32. Bonora Anthony C. ; Kedarnath N. ; Oen Joshua T., Method for dry cleaning clean room containers.
    상세보기
  33. Jordan ; Sr. John F. (Louisville KY), Method for preconditioning adsorbent.
    상세보기
  34. Daniel Alvarez, Jr. ; Jeffrey J. Spiegelman, Method for purification of lens gases used in photolithography.
    상세보기
  35. Spiegelman, Jeffrey J.; Alvarez, Jr., Daniel; Cook, Joshua T., Method for rapid activation or preconditioning of porous gas purification substrates.
    상세보기
  36. Ahmadi, Majid R.; Vaudrin, Damon C., Method for removing engine deposits in a gasoline internal combustion engine.
    상세보기
  37. Whitlock David R. (64 Royal Rd. Belmont MA 02198), Method for separating solutes in gaseous solvents.
    상세보기
  38. Spiegelman,Jeffrey J.; Alvarez, Jr.,Daniel; Tram,Allan; Holmes,Russell, Method for the removal of airborne molecular contaminants using oxygen gas mixtures.
    상세보기
  39. Alvarez, Jr., Daniel; Spiegelman, Jeffrey J., Method for the removal of airborne molecular contaminants using water gas mixtures.
    상세보기
  40. Alvarez, Jr.,Daniel; Spiegelman,Jeffrey J, Method for the removal of airborne molecular contaminants using water gas mixtures.
    상세보기
  41. Tokunaga, Kenji, Method of purging wafer receiving jig, wafer transfer device, and method of manufacturing semiconductor device.
    상세보기
  42. Chen, Ching-hua, Method of stabilizing material layer.
    상세보기
  43. Roland Bernard FR; Eric Chevalier FR, Mini-environment control system and method.
    상세보기
  44. Fosnight William J., Modular SMIF pod breather, adsorbent, and purge cartridges.
    상세보기
  45. Fosnight William J. ; Shenk Joshua W., Passively activated valve for carrier purging.
    상세보기
  46. Heller Adam (Bridgewater NJ) Tai King L. (Berkeley Heights NJ) Vadimsky Richard G. (Somerville NJ), Photoinduced migration of silver into chalcogenide layer.
    상세보기
  47. Brunemeier Paul E. ; Miu Thomas, Plasma-enhanced flash process.
    상세보기
  48. Grundy David A., Portable cleanroom cabinet assembly.
    상세보기
  49. Yamashita Teppei,JPX ; Murata Masanao,JPX ; Tanaka Tsuyoshi,JPX ; Kawano Hitoshi,JPX ; Morita Teruya,JPX, Portable closed container.
    상세보기
  50. Matheson Mark A., Process and apparatus for biologically treating water.
    상세보기
  51. Lederer, Kay; Hornig, Steffen, Process facility having at least two physical units each having a reduced density of contaminating particles with respect to the surroundings.
    상세보기
  52. Marcus Bonita K. (Rye NY), Process for sequestering ammonia and the odor associated therewith.
    상세보기
  53. Wu, Han-Ming; Kuse, Ronald J., Purging gas from a photolithography enclosure between a mask protective device and a patterned mask.
    상세보기
  54. Inoue Keijiro,JPX ; Tomita Fumio,JPX ; Goto Tetsuya,JPX, Resin black matrix for liquid crystal display device.
    상세보기
  55. Carrea Giovanni ; Warrick Brian D. ; Wickman Lewis J., Specialty gas purification system.
    상세보기
  56. Kinkead Devon A. ; Joffe Michael A., Storing substrates between process steps within a processing facility.
    상세보기
  57. Shindo, Naoki; Iino, Tadashi, Substrate processing apparatus and substrate processing method.
    상세보기
  58. Suzuki, Yoko; Tanaka, Akira; Kishi, Takashi, Substrate transport apparatus, pod and method.
    상세보기
  59. Aggarwal, Ravinder; Kusbel, Jim; Alexander, Jim, System for the improved handling of wafers within a process tool.
    상세보기
  60. Shih, Hsin-Ching; Chou, Chun-Li; Hsieh, Ming-Hong; Tao, Hong-J., Tool for cleaning substrates.
    상세보기
  61. Ushikawa Harunori (Kofu JPX), Treating device.
    상세보기
  62. Hao, Fangli, Two position robot design for FOUP purge.
    상세보기
  63. Bonora Anthony C. ; Wartenbergh Robert P. ; Gomes Christopher, Two stage valve for charging and/or vacuum relief of pods.
    상세보기
  64. Dickinson, Colin John; Murphy, Daimhin Paul, Vacuum load lock, system including vacuum load lock, and associated methods.
    상세보기
  65. Dong Chun Christine ; Schwarz Alexander ; Roth Dean V. ; Christman Delbert D., Vacuum preparation of hydrogen halide drier.
    상세보기
  66. Hitoshi Murayama JP; Tatsuyuki Aoike JP; Toshiyasu Shirasuna JP; Kazuyoshi Akiyama JP; Takashi Ohtsuka JP; Daisuke Tazawa JP; Kazuto Hosoi JP; Yukihiro Abe JP, Vacuum processing methods.
    상세보기
  67. Baseman Robert J. (Brewster NY) Brown Charles A. (Los Gatos CA) Eldridge Benjamin N. (Hopewell Junction NY) Rothman Laura B. (South Kent CT) Wendt Herman R. (San Jose CA) Yeh James T. (Katonah NY) Zi, Vapor drain system.
    상세보기
  68. Farro F. Kaveh ; David E. Jacob ; Dean Jay Larson ; Martin R. Maraschin, Wafer atmospheric transport module having a controlled mini-environment.
    상세보기

이 특허를 인용한 특허 (1)

  1. Delgado, Gildardo; Chilese, Frank; Brunner, Rudolf, Recirculation high purity system for protecting optical modules or inspection system during storage, transport and shipping.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로