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The disclosure pertains to compositions and methods for modifying or refining the surface of a wafer suited for semiconductor fabrication. The compositions include working liquids useful in modifying a surface of a wafer suited for fabrication of a semiconductor device. In some embodiments, the work

The disclosure pertains to compositions and methods for modifying or refining the surface of a wafer suited for semiconductor fabrication. The compositions include working liquids useful in modifying a surface of a wafer suited for fabrication of a semiconductor device. In some embodiments, the working liquids are aqueous solutions of initial components substantially free of loose abrasive particles, the components including water, a surfactant, and a pH buffer exhibiting at least one pKa greater than 7. In certain embodiments, the pH buffer includes a basic pH adjusting agent and an acidic complexing agent, and the working liquid exhibits a pH from about 7 to about 12. In further embodiments, the disclosure provides a fixed abrasive article comprising a surfactant suitable for modifying the surface of a wafer, and a method of making the fixed abrasive article. Additional embodiments describe methods that may be used to modify a wafer surface.

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1. A working liquid useful in modifying a surface of a wafer suited for fabrication of a semiconductor device, the liquid being an aqueous solution of initial components substantially free of loose abrasive particles, the components comprising: a. an aqueous solvent, wherein the aqueous solvent comp

1. A working liquid useful in modifying a surface of a wafer suited for fabrication of a semiconductor device, the liquid being an aqueous solution of initial components substantially free of loose abrasive particles, the components comprising: a. an aqueous solvent, wherein the aqueous solvent comprises water;b. a pH buffer exhibiting at least one pKa greater than 7, wherein the pH buffer comprises a basic pH adjusting agent and a multidentate acidic complexing agent, wherein the multidentate acidic complexing agent comprises at least one of an amino acid or a dipeptide formed from an amino acid; andc. a nonionic surfactant exhibiting a hydrophile-lipophile balance of at least about 4;d. wherein the working liquid exhibits a pH from about 7 to about 12. 2. A working liquid of claim 1, wherein the basic pH adjusting agent is selected from the group consisting of alkali metal hydroxides, alkaline earth metal hydroxides, ammonium hydroxide, and mixtures thereof. 3. The working liquid of claim 1, wherein the amino acid is selected from alanine, proline, glycine, histidine, lysine, arginine, ornithene, cysteine, tyrosine, and combinations thereof 4. The working liquid of claim 3, wherein the amino acid is L-proline. 5. The working liquid of claim 1, wherein the nonionic surfactant is selected from a linear primary alcohol ethoxylate, a secondary alcohol ethoxylate, a branched secondary alcohol ethoxylate, an octylphenol ethoxylate, an acetylenic primary alcohol ethoxylate, an acetylenic primary di-alcohol ethoxylate, an alkane di-alcohol, a hydroxyl-terminated ethylene oxide-propylene oxide random copolymer, a fluoroaliphatic polymeric ester, and mixtures thereof 6. The working liquid of claim 1, wherein the nonionic surfactant is present in an amount of at least about 0.025% and at most about 0.2% by weight of the working liquid. 7. The working liquid of claim 1, wherein the acidic complexing agent is present in an amount from about 0.1% by weight to about 5% by weight of the working liquid. 8. The working liquid of claim 1, wherein the basic pH adjusting agent is present in an amount sufficient to produce a pH from about 10 to about 11, the acidic complexing agent comprises L-proline in an amount from about 2% to about 4% by weight of the working liquid, and the surfactant comprises an ethoxylated alcohol in an amount from about 0.05% to about 0.5% by weight of the working liquid. 9. The working liquid of claim 1, wherein the working liquid exhibits a pH from about 9 to about 11.