Method of making sulfur-resistant composite metal membranes
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B05D-005/00
B05D-007/14
B05D-003/10
출원번호
US-0768188
(2007-06-25)
등록번호
US-8101243
(2012-01-24)
발명자
/ 주소
Way, J. Douglas
Lusk, Mark
Thoen, Paul
출원인 / 주소
Colorado School of Mines
대리인 / 주소
Sheridan Ross, P.C.
인용정보
피인용 횟수 :
5인용 특허 :
54
초록▼
The invention provides thin, hydrogen-permeable, sulfur-resistant membranes formed from palladium or palladium-alloy coatings on porous, ceramic or metal supports. Also disclosed are methods of making these membranes via sequential electroless plating techniques, wherein the method of making the mem
The invention provides thin, hydrogen-permeable, sulfur-resistant membranes formed from palladium or palladium-alloy coatings on porous, ceramic or metal supports. Also disclosed are methods of making these membranes via sequential electroless plating techniques, wherein the method of making the membrane includes decomposing any organic ligands present on the substrate, reducing the palladium crystallites on the substrate to reduced palladium crystallites, depositing a film of palladium metal on the substrate and then depositing a second, gold film on the palladium film. These two metal films are then annealed at a temperature between about 200° C. and about 1200° C. to form a sulfur-resistant, composite PdAu alloy membrane.
대표청구항▼
1. A method of fabricating a sulfur-resistant composite metal membrane comprising: seeding a surface of a substrate with palladium(II) crystallites deposited from a palladium(II)—containing salt solution;decomposing any organic ligand present on the substrate;reducing the palladium(II) crystallites
1. A method of fabricating a sulfur-resistant composite metal membrane comprising: seeding a surface of a substrate with palladium(II) crystallites deposited from a palladium(II)—containing salt solution;decomposing any organic ligand present on the substrate;reducing the palladium(II) crystallites to metallic palladium;depositing a first film of palladium metal on the substrate;depositing a second film of gold on the first film; andannealing the metal films at a temperature between about 200° C. and about 1200° C. to form a sulfur-resistant composite PdAu membrane. 2. The fabrication method of claim 1, wherein a combined thickness of the first film and the second film is between about 2μm and about 10μm. 3. The fabrication method of claim 1, wherein the substrate is a stainless steel support having a porous ZrO2 coating. 4. The fabrication method of claim 1, wherein at least a portion of the substrate has been sealed with a low temperature glaze. 5. The fabrication method of claim 1, wherein the seeding step comprises airbrushing the palladium(II) salt containing solution onto the surface of the substrate. 6. The fabrication method of claim 5, wherein the palladium(II) salt containing solution is a solution consisting of Palladium (II) Acetate and chloroform. 7. The fabrication method of claim 1, wherein the decomposing step comprises firing the substrate comprising the palladium(II) crystallites at an elevated temperature sufficient to eliminate the any organic ligand present on the substrate. 8. The fabrication method of claim 1, wherein the reducing step comprises immersing the substrate in a reducing solution. 9. The fabrication method of claim 8, wherein the reducing solution is a solution consisting of water, NH3OH and hydrazine. 10. The fabrication method of claim 1, wherein the depositing the first film of palladium metal step comprises pumping a palladium plating bath over the surface of the substrate. 11. The fabrication method of claim 10, wherein the palladium plating bath is a solution consisting of water, NH3OH, HCl, Palladium (II) chloride and hydrazine. 12. The fabrication method of claim 10, wherein the pumping continues until a palladium layer having a thickness of between about 1 μm and about 7 μm is formed. 13. The fabrication method of claim 1, wherein the depositing the second film of gold step comprises pumping a gold plating bath over the surface of the substrate. 14. The fabrication method of claim 13, wherein the gold plating bath is a solution consisting of water, NaOH and gold (III) chloride. 15. The fabrication method of claim 14, wherein the pumping continues until a gold layer having a thickness of between about 1 μm and about 7 μm is formed. 16. The fabrication method of claim 1, further comprising depositing a third film of silver on the second film of gold. 17. The fabrication method of claim 16, wherein the step of depositing a third film of silver comprises pumping a silver plating bath consisting of silver nitrate, NH3OH and water over the surface of the substrate.
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