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특허 상세정보

Apparatus and process for sensing fluoro species in semiconductor processing systems

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) G01N-033/00   
미국특허분류(USC) 073/031.05; 073/023.2; 073/031.01; 422/083; 422/098
출원번호 US-0537910 (2009-08-07)
등록번호 US-8109130 (2012-02-07)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Hultquist, PLLC
인용정보 피인용 횟수 : 3  인용 특허 : 101
초록

A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/dev...

대표
청구항

1. A gas sensor device comprising: first and second metal-containing posts;at least one nickel-containing metal sensor wire supported between said first and second metal-containing posts to provide a gas sensing structure adapted for contacting gas susceptible to presence of one or more target species therein with which the at least one nickel-containing metal sensor wire is interactive to produce a response indicative of the presence of said one or more target species;a polymeric block element intermediately arranged between ends of the first metal-cont...

이 특허에 인용된 특허 (101)

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