|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||073/031.05; 073/023.2; 073/031.01; 422/083; 422/098|
|발명자 / 주소|
|출원인 / 주소|
|대리인 / 주소||
|인용정보||피인용 횟수 : 3 인용 특허 : 101|
A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/dev...
1. A gas sensor device comprising: first and second metal-containing posts;at least one nickel-containing metal sensor wire supported between said first and second metal-containing posts to provide a gas sensing structure adapted for contacting gas susceptible to presence of one or more target species therein with which the at least one nickel-containing metal sensor wire is interactive to produce a response indicative of the presence of said one or more target species;a polymeric block element intermediately arranged between ends of the first metal-cont...