IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0482581
(2006-07-07)
|
등록번호 |
US-8109928
(2012-02-07)
|
우선권정보 |
SE-0501604 (2005-07-08) |
발명자
/ 주소 |
|
출원인 / 주소 |
- Plasma Surgical Investments Limited
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
3 인용 특허 :
124 |
초록
▼
The present invention relates to a plasma-generating device, comprising an anode, a cathode and a plasma channel which in its longitudinal direction extends at least partly between said cathode and said anode. The end of the cathode which is directed to the anode has a cathode tip tapering towards t
The present invention relates to a plasma-generating device, comprising an anode, a cathode and a plasma channel which in its longitudinal direction extends at least partly between said cathode and said anode. The end of the cathode which is directed to the anode has a cathode tip tapering towards the anode, a part of said cathode tip extending over a partial length of a plasma chamber connected to the plasma channel. The plasma chamber has a cross-sectional surface, transversely to the longitudinal direction of the plasma channel, which exceeds the cross-sectional surface, transversely to the longitudinal direction of the plasma channel, of an opening, positioned closest to the cathode, of the plasma channel. The invention also concerns a plasma surgical device and use of such a plasma surgical device.
대표청구항
▼
1. A plasma-generating device comprising: an anode;a cathode having a tapered portion narrowing toward the anode;a tubular insulator extending along and surrounding a portion of the cathode and having a distal end;one or more intermediate electrodes electrically insulated from each other and from th
1. A plasma-generating device comprising: an anode;a cathode having a tapered portion narrowing toward the anode;a tubular insulator extending along and surrounding a portion of the cathode and having a distal end;one or more intermediate electrodes electrically insulated from each other and from the anode, a plasma chamber having a substantially cylindrical portion, the cylindrical portion of the plasma chamber being formed by at least one of the intermediate electrodes;a plasma channel having an inlet at a distal end of the plasma chamber, the plasma channel extending longitudinally through a hole in the anode and having an outlet opening at a distal end of the anode, a part of the plasma channel being formed by at least one of the intermediate electrodes; wherein an end of the cathode extends longitudinally into the plasma chamber to some distance away from the inlet of the plasma channel, andwherein the tapered portion of the cathode projects only partially beyond the distal end of the insulator. 2. The plasma-generating device of claim 1, in which approximately half of the tapered portion of the cathode projects beyond the distal end of the insulator. 3. The plasma-generating device of claim 1, in which the length of the tapered portion of the cathode projecting beyond the distal end of the insulator is approximately equal to a width of the cathode at the widest transverse cross-section of the tapered portion of the cathode. 4. The plasma-generating device of claim 1, in which there is a gap between the insulator and the cathode and the area of the gap at the widest transverse cross-section of the tapered portion of the cathode is equal to or greater than a minimum transverse cross-sectional area of the plasma channel. 5. The plasma-generating device of claim 4, in which the insulator has an inner diameter between 0.35 mm and 0.80 mm. 6. The plasma-generating device of claim 1, in which there is a gap between the insulator and the cathode and the gap is capable of passing a plasma-generating gas. 7. The plasma-generating device of claim 3, in which a length of the tapered portion of the cathode is greater than the width of the cathode at the widest transverse cross-section of the tapered portion of the cathode. 8. The plasma-generating device of claim 7, in which the length of the tapered portion of the cathode is equal to or greater than 1.5 times the width of the cathode at the widest transverse cross-section of the tapered portion of the cathode. 9. The plasma-generating device of claim 3, in which at least a half of the length of the tapered portion of the cathode extends into the plasma chamber. 10. The plasma-generating device of claim 1, in which the cylindrical portion of the plasma chamber extends between the distal end of the insulator and the proximal end of the plasma channel. 11. The plasma-generating device of claim 1, in which a transverse cross-sectional area of the plasma chamber is greater than a transverse cross sectional area of the inlet of the plasma channel. 12. The plasma-generating device of claim 11, in which a transverse cross-sectional area of the plasma chamber is 4-16 times greater than a transverse cross-sectional area of the inlet of the plasma channel. 13. The plasma-generating device of claim 1, in which a transverse cross-sectional diameter of the plasma chamber is approximately equal to a length of the plasma chamber. 14. The plasma-generating device of claim 13, in which the transverse cross-sectional diameter of the plasma chamber is 2-2.5 times the width of the cathode at the widest transverse cross-section of the tapered portion of the cathode. 15. The plasma-generating device of claim 14, in which the length of the plasma chamber is 2-2.5 times the width of the cathode at the widest transverse cross-section of the tapered portion of the cathode. 16. The plasma-generating device of claim 1, in which the plasma chamber has a tapered portion narrowing toward the anode and connecting to the inlet of the plasma channel. 17. The plasma-generating device of claim 1, wherein a distance from the cathode at the widest transverse cross-section of the tapered portion of the cathode to the distal end of the insulator is greater than a distance from the cathode at the narrowest transverse cross-section of the tapered portion of the cathode to the inlet of the plasma channel. 18. The plasma-generating device of claim 17, in which the end of the cathode extends into the plasma chamber by a length approximately equal to the width of the cathode at the widest transverse cross-section of the tapered portion of the cathode. 19. The plasma-generating device of claim 1, in which the distance from the cathode at the narrowest transverse cross-section of the tapered portion of the cathode to the inlet of the plasma channel is approximately equal to the width of the cathode at the widest transverse cross-section of the tapered portion of the cathode. 20. The plasma-generating device of claim 1, in which the tapered portion of the cathode is a cone. 21. The plasma-generating device of claim 1, in which the plasma chamber and at least a part of the plasma channel are formed by at least one of the intermediate electrodes, the at least one intermediate electrode being the intermediate electrode closest to the cathode. 22. The plasma-generating device of claim 1, in which the plasma chamber is formed by at least one of the intermediate electrodes electrically insulated from the at least one of the intermediate electrodes forming the plasma channel. 23. The plasma-generating device of claim 1, in which a diameter of the plasma channel is 0.20-0.50 mm. 24. The plasma-generating device of claim 23, in which the diameter of the plasma channel is 0.30-0.40 mm. 25. The plasma-generating device of claim 1, in which the part of the plasma channel formed by the intermediate electrodes is formed by at least two of the intermediate electrodes. 26. The plasma-generating device of claim 1, in which the length of the part of the plasma channel formed by the intermediate electrodes is 4-10 times a diameter of the plasma channel. 27. The plasma-generating device of claim 1, in which a width of the cathode at the widest transverse cross-section of the tapered portion of the cathode is between 0.3 and 0.6 mm. 28. A plasma surgical device comprising the plasma-generating device of claim 1. 29. A method of using the plasma surgical device of claim 28 for destruction or coagulation of biological tissue comprising a step of discharging plasma from the outlet of the plasma channel on the biological tissue. 30. The plasma surgical device of claim 28 adapted for use in laparoscopic surgery. 31. The method of claim 29, wherein the biological tissue is one of liver, spleen, heart, brain, or kidney. 32. The plasma surgical device of claim 28 having an outer cross-sectional width of 10 mm or less.
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