IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0853776
(2010-08-10)
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등록번호 |
US-8110349
(2012-02-07)
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발명자
/ 주소 |
- Cohen, David
- Kaylor, Rosann
- Sayre, Curtis
|
출원인 / 주소 |
- Kimberly-Clark Worldwide, Inc.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
1 인용 특허 :
166 |
초록
▼
A biosensor includes a substrate member with a pattern of active areas of receptive material and a pattern of blocking material layers. The receptive material and blocking material are attached to the substrate member with a photo-reactive crosslinking agent activated in a masking process. The recep
A biosensor includes a substrate member with a pattern of active areas of receptive material and a pattern of blocking material layers. The receptive material and blocking material are attached to the substrate member with a photo-reactive crosslinking agent activated in a masking process. The receptive material is specific for an analyte of interest.
대표청구항
▼
1. A method of making a biosensor, comprising the steps of: applying a photo-reactive crosslinking agent directly to a surface of a substrate member;forming one of a receptive material layer and a blocking material layer over the crosslinking agent;placing a mask over the substrate member, the mask
1. A method of making a biosensor, comprising the steps of: applying a photo-reactive crosslinking agent directly to a surface of a substrate member;forming one of a receptive material layer and a blocking material layer over the crosslinking agent;placing a mask over the substrate member, the mask having a configuration so as to shield at least one underlying area of the substrate member while exposing at least one adjacent area, and irradiating the substrate member and mask combination with an energy source sufficient to activate the crosslinking agent in the areas exposed by the mask, the activated crosslinking agent crosslinking with the respective receptive material or blocking material in the exposed areas;cleaning the unreacted receptive material or blocking material from the shielded areas of the substrate member after removal of the mask;forming a layer of the respective other of the blocking material and receptive material over the surface of the substrate member, and irradiating the substrate member with the energy source so as to activate the remaining crosslinking agent in the previously shielded areas, the activated crosslinking agent crosslinking with the respective blocking material or receptive material; andwherein a resulting pattern of active receptive material areas and blocking material areas are defined according to the pattern of shielded and exposed areas of the mask. 2. The method as in claim 1, comprising forming the receptive material layer on the substrate before the blocking material layer such that the pattern of active areas of receptive material correspond to the exposed areas of the mask. 3. The method as in claim 1, comprising selecting the substrate member from the group of materials consisting of plastics, metal coated plastics and glass, functionalized plastics and glass, silicon wafers, glass, and foils. 4. The method as in claim 1, wherein the substrate member comprises a polymer film coated with a metal. 5. The method as in claim 4, comprising selecting the metal from the group consisting of gold, silver, chromium, nickel, platinum, aluminum, iron, copper, gold oxide, chromium oxide, titanium, titanium oxide, silicone, silicone oxide, silicone nitride, silver oxide, or zirconium. 6. The method as in claim 1, wherein the receptive material in the active areas facilitates diffraction of transmitted or reflected light in a diffraction pattern corresponding to the active receptive material areas, and further comprising viewing the diffraction pattern of active areas of receptive material with the naked eye. 7. The method as in claim 1, wherein the receptive material is protein based. 8. The method as in claim 6, wherein the receptive material is an antibody. 9. The method as in claim 1, comprising irradiating the substrate member with UV light at a wavelength sufficient for activating the photo-reactive crosslinking agent exposed through the mask. 10. The method as in claim 1, comprising selecting the receptive material from at least one of antigens, antibodies, nucleotides, chelators, enzymes, bacteria, yeasts, fungi, viruses, bacterial pill, bacterial flagellar materials, nucleic acids, polysaccharides, lipids, proteins, carbohydrates, metals, hormones, peptides, aptamers and respective receptors for said materials. 11. The method as in claim 1, wherein the analyte of interest is selected from at least one of a bacteria, yeast, fungus, virus, rheumatoid factor, IgG, IgM, IgA, IgD and IgE antibodies, carcinoembryonic antigen, streptococcus Group A antigen, viral antigens, antigens associated with autoimmune disease, allergens, tumor antigens, streptococcus group B antigen, HIV I or HIV II antigen, antibodies viruses, antigens specific to RSV, an antibody, antigen, enzyme, hormone, polysaccharide, protein, lipid, carbohydrate, drug, nucleic acid, Neisseria meningitides groups A, B, C, Y and W sub 135, Streptococcus pneumoniae, E. coli K1, Haemophilus influenza type A/B, an antigen derived from microorganisms, PSA and CRP antigens, a hapten, a drug of abuse, a therapeutic drug, an environmental agents, or antigens specific to Hepatitis. 12. The method as in claim 1, wherein the photo-reactive crosslinking agent is one of SANPAH (N-Succinimidyl 2-[p-azido-salicylamido]ethyl-1,3′-dithiiopropionate); SAND (Sulfosuccinimidyl 2-[m-azido-o-nitro-benzamido]ethyl-1,3′-dithiopropionate); and ANB-NOS (N-5-Azido-2-nitrobenzoyloxysuccinimide).
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