초록 ▼

A gas-generating apparatus includes a reaction chamber having a first reactant, a reservoir having an optional second reactant, and a self-regulated flow control device. The self-regulated flow control device stops the flow of reactant from the reservoir to the reaction chamber when the pressure of

A gas-generating apparatus includes a reaction chamber having a first reactant, a reservoir having an optional second reactant, and a self-regulated flow control device. The self-regulated flow control device stops the flow of reactant from the reservoir to the reaction chamber when the pressure of the reaction chamber reaches a predetermined level. Methods of operating the gas-generated apparatus and the self-regulated flow control device, including the cycling of a shut-off valve of the gas-generated apparatus and the cycling of the self-regulated flow control device are also described.

대표청구항 ▼

1. A gas-generating apparatus comprising: a reaction chamber;a reservoir comprising at least one reactant; anda flow control device comprising a first valve and a second valve and the flow control valve connects the reservoir to the reaction chamber, wherein said at least one reactant is transportab

1. A gas-generating apparatus comprising: a reaction chamber;a reservoir comprising at least one reactant; anda flow control device comprising a first valve and a second valve and the flow control valve connects the reservoir to the reaction chamber, wherein said at least one reactant is transportable from the reservoir to the reaction chamber through said first valve to react to form a gas, and when the pressure of the reaction chamber exceeds a predetermined stopping pressure the first valve closes to prevent the transport of said at least one reactant;wherein the reaction chamber is connected to the reservoir by the second valve that selectively opens to communicate pressure from the reaction chamber to the reservoir when the pressure of the reaction chamber is within a predetermined difference from the predetermined stopping pressure. 2. The gas-generating apparatus of claim 1, wherein said second valve closes when the pressure of the reaction chamber is more than the predetermined difference less than the predetermined stopping pressure. 3. The gas-generating apparatus of claim 1, wherein the predetermined difference is less than about 2 psi. 4. The gas-generating apparatus of claim 1, wherein the predetermined difference is less than about 5 psi. 5. The gas-generating apparatus of claim 1, wherein the first valve is a one-way valve that only transfers the at least one reactant from the reservoir to the reaction chamber. 6. The gas-generating apparatus of claim 1, wherein the second valve is a one-way valve that only transfers the gas from the reaction chamber to the reservoir. 7. The gas-generating apparatus of claim 1, wherein the at least one reactant is stored in a bladder within the reservoir. 8. The gas-generating apparatus of claim 7, wherein the reservoir is pressurized. 9. The gas-generating apparatus of claim 1, wherein the first valve is connected to a sprayer. 10. A gas-generating apparatus comprising: a reaction chamber comprising a first reactant, wherein said first reactant is comprised within at least one wafer;a reservoir comprising at least one other reactant, wherein said at least one other reactant is stored in a bladder; anda flow control device connecting the reservoir to the reaction chamber, wherein said at least one other reactant is transportable from the reservoir to the reaction chamber through said flow control device to react to form gas, and when the pressure of the reaction chamber exceeds a predetermined stopping pressure the flow control device prevents the transport of said at least one other reactant. 11. The gas-generating apparatus of claim 10, wherein the at least one wafer is selected from the group consisting of zig zag-shaped wafers, linear wafers, and grid-shaped wafers. 12. The gas-generating apparatus of claim 10 further comprising a spray attachment.