초록 ▼

A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sa

A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region.

대표청구항 ▼

1. A reflectometer system, comprising: a light source that is utilized to create a sample channel light path;a location in the reflectometer sample channel light path for placement of a standard sample;a location in the reflectometer for the placement of a reference sample;a spectrometer configured

1. A reflectometer system, comprising: a light source that is utilized to create a sample channel light path;a location in the reflectometer sample channel light path for placement of a standard sample;a location in the reflectometer for the placement of a reference sample;a spectrometer configured to collect reflectance data from the standard sample and the reference sample; anda processor, which is configured to calibrate the reflectometer by utilizing the presence of significant reflectance variations from the standard sample that result from variations of actual properties of the standard sample from the assumed properties of the standard sample. 2. The reflectometer system of claim 1, wherein the reference sample and the standard sample locations are the same. 3. The reflectometer system of claim 1, wherein the reference sample and standard sample locations are different. 4. The reflectometer system of claim 1, wherein the reference sample is at least one broadband mirror. 5. The reflectometer system of claim 1, wherein the reference sample is comprised of a plurality of optical elements. 6. The reflectometer system of claim 5, wherein the reference sample is comprised of a plurality of broadband mirrors. 7. The reflectometer of claim 1, wherein the reference sample is formed by the use of a reference channel light path that is separate at least in part from a sample channel light path. 8. A reflection measurement apparatus which operates below deep ultra-violet (DUV) wavelengths, the apparatus comprising: at least one light source, the at least one light source providing a source beam including wavelengths below DUV wavelengths;a sample channel light path;a reference channel light path, wherein the reference channel light path is configured to comprise a reference sample that is relatively spectrally featureless in at least some of the vacuum ultra-violet (VUV) wavelength region;a spectrometer that receives light from the sample channel light path and the reference channel light path; andat least one optical element selectively enabling or disabling at least one of the reference channel light path or the sample channel light path;wherein the reflection measurement apparatus is configured to be calibrated by utilizing in the sample channel light path a standard sample that has a significant calibration error function in at least a portion of the VUV wavelength region. 9. The reflection measurement apparatus of claim 8, wherein the reference sample comprises at least one mirror. 10. The reflection measurement apparatus of claim 9, wherein the reference sample comprises at least one broadband VUV mirror. 11. The reflection measurement apparatus of claim 9, wherein the reference sample comprises a plurality of optical elements. 12. The reflection measurement apparatus of claim 11, wherein the reference sample comprises a plurality of mirrors.