IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0717664
(2010-03-04)
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등록번호 |
US-8123514
(2012-02-28)
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발명자
/ 주소 |
- Sreenivasan, Sidlgata V.
- Choi, Byung-Jin
- Voisin, Ronald D.
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
0 인용 특허 :
16 |
초록
▼
The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted
The present invention includes a template for patterning liquids disposed on a substrate. The template includes a body having opposed first and second surfaces with one surface having at least one recess and the other surface having a patterning region. In one embodiment, the template may be mounted to a fluid chamber having an inlet and a throughway. The template may be connected to the throughway and the inlet is connected to a fluid source.
대표청구항
▼
1. A system comprising: a substrate having a plurality of droplets positioned thereon;a mold assembly, spaced-apart from the substrate, for imprinting a pattern in a deformable material, the mold assembly having first and second surfaces, with the first surface including at least one recessed region
1. A system comprising: a substrate having a plurality of droplets positioned thereon;a mold assembly, spaced-apart from the substrate, for imprinting a pattern in a deformable material, the mold assembly having first and second surfaces, with the first surface including at least one recessed region and the second surface defining a patterning region configured to provide the pattern in the deformable material;a mold deformation enabling apparatus coupled to the mold assembly to facilitate deformation of the mold assembly to conform to a layer formed from the plurality of droplets, wherein the mold deformation enabling apparatus includes a chamber having an inlet and a throughway, with the mold assembly being connected to the throughway; and,a source of fluid in fluid communication with chamber through the inlet, varying pressure at the recessed region. 2. The system as recited in claim 1, wherein the chamber includes a plurality of walls, with the plurality of walls being more rigid than the mold assembly. 3. The system as recited in claim 1, wherein the patterning region has a profile selected from a set of profiles including smooth, planar, and patterned. 4. The system as recited in claim 1, wherein the patterning region covers an area of the second surface that has a polygonal shape. 5. The system as recited in claim 1, further including a plurality of the patterning regions arranged in a two-dimensional array. 6. The system as recited in claim 1, wherein the pattern includes a plurality of protrusions and recessions having submicron dimensions. 7. A system comprising: a mold assembly for imprinting a pattern in a deformable material, the mold assembly having first and second surfaces, with the first surface including at least one recessed region and the second surface defining a patterning region configured to provide the pattern in the deformable material;a mold deformation enabling apparatus coupled to the mold assembly to facilitate deformation of the mold assembly to conform to a profile of a surface adjacent to the mold assembly, wherein the mold deformation enabling apparatus includes a chamber having an inlet and a throughway, with the mold assembly being connected to the throughway; and,a source of fluid in fluid communication with chamber through the inlet, varying pressure at the recessed region. 8. The system as recited in claim 7, wherein the surface further includes a plurality of spaced-apart droplets positioned thereon. 9. The system as recited in claim 7, wherein the chamber includes a plurality of walls. 10. The system as recited in claim 9, wherein the plurality of walls is more rigid than the mold assembly. 11. The system as recited in claim 7, wherein the patterning region is patterned. 12. The system as recited in claim 7, wherein the patterning region is planar. 13. The system as recited in claim 7, wherein a portion of the patterning region is patterned and a portion of the patterning region is planar. 14. The system as recited in claim 7, wherein the patterning region covers an area of the second surface that has a polygonal shape. 15. The system as recited in claim 7, further including a plurality of the patterning regions arranged in a two-dimensional array. 16. The system as recited in claim 7, wherein the pattern includes a plurality of protrusions and recessions. 17. The system as recited in claim 16, wherein the plurality of protrusions and recessions have submicron dimensions. 18. A system comprising: a substrate having a plurality of droplets positioned thereon;a mold assembly, spaced-apart from the substrate, for imprinting a pattern in a deformable material, the mold assembly having first and second surfaces, with the first surface including at least one recessed region and the second surface defining a patterning region configured to provide the pattern in the deformable material;a chamber having an inlet and a throughway, with the template being connected to the throughway to facilitate deformation of the mold assembly to conform to a layer formed from the plurality of droplets;a source of fluid in fluid communication with the chamber through the inlet, varying pressure at the recessed region; anda source of radiation to impinge actinic radiation upon the layer. 19. The system as recited in claim 18, wherein the chamber includes a plurality of walls, with the plurality of walls being more rigid than the mold assembly. 20. The system as recited in claim 18, wherein the patterning region has a profile selected from a set of profiles including smooth, planar, and patterned.
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