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A method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow ra

A method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate is provided. The method includes delivering the process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one pressure sensor. The method also includes applying, using a programmed computing device, a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.

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1. A method for delivering a process gas to a reaction chamber of a plasma processing system, the method comprising: delivering said process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, said orifice being upstream from said reaction chamber, said proces

1. A method for delivering a process gas to a reaction chamber of a plasma processing system, the method comprising: delivering said process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, said orifice being upstream from said reaction chamber, said process gas being delivered at a predicted flow rate that is different from a recipe flow rate of a recipe, said predicted flow rate being previously computed by: pressurizing a gas, said gas being one of said process gas and a gas different from said process gas, to create a choked flow condition for said orifice,measuring a set of upstream pressure values of said gas via at least one pressure sensor, andapplying, using a programmed computing device, a calibration factor of a set of calibration factors to determine said predicted flow rate, said calibration factor being a ratio of an average of said set of upstream pressure values to an average of a set of golden upstream pressure values, said set of golden upstream pressure values representing pressure values associated with an indicated flow rate as indicated by said MFC that is equal to said recipe flow rate. 2. The method of claim 1 wherein each calibration factor of said set of calibration factors is associated with a respective specific orifice of a set of orifices, said each calibration factor being dependent upon at least one of diameter and geometry of said respective specific orifice. 3. The method of claim 1 wherein said calibration factor is applied to said set of upstream pressure values to determine a corrected pressure value. 4. The method of claim 3 wherein said predicted flow rate is determined by comparing said corrected pressure value to an accurate gas table, said accurate gas table representing a table of pressure values and flow rate values based on real gas properties and an accurate MFC and a precision orifice. 5. The method of claim 4 wherein said table of said pressure values being a table of said golden pressure values. 6. The method of claim 4 further including calculating a percentage of error for said MFC by dividing said indicated flow rate into a difference between said predicted flow rate and said indicated flow rate. 7. The method of claim 6 wherein said percentage of error is applied to adjust said IMFC. 8. The method of claim 7 wherein said at least one sensor is positioned upstream from said orifice. 9. The method of claim 1 wherein said at least one sensor is a manometer. 10. The method of claim 1 wherein said gas is different than said process gas. 11. The method of claim 1 wherein said gas is an inert gas that is different from said process gas. 12. The method of claim 1 wherein said gas is said process gas. 13. A method for delivering a process gas to a reaction chamber of a plasma processing system using a recipe having a recipe flow rate, the method comprising: delivering said process gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, said orifice being upstream from said reaction chamber, said process gas being delivered at an adjusted flow rate that is computed from an error factor and said recipe flow rate, said error factor being previously computed by: pressurizing a gas, said gas being one of said process gas and a gas different from said process gas, to create a choked flow condition for a given orifice,measuring multiple upstream pressure values of said gas via at least one pressure sensor during said choked flow condition,determining a predicted flow rate by applying an average of said multiple upstream pressure values against an accurate gas table, andcalculating, using a programmed computing device, said error factor, said error factor reflecting a difference between said predicted flow rate and an indicated flow rate as indicated by said MFC. 14. The method of claim 13 wherein said given orifice represents said orifice. 15. The method of claim 13 wherein said accurate gas table representing a table of pressure values and flow rate values based on real gas properties and an accurate MFC and a precision orifice. 16. The method of claim 15 wherein said table of said pressure values being a table of golden pressure values. 17. The method of claim 13 wherein said error factor is obtained by dividing a difference between said predicted flow rate and said indicated flow rate by said indicated flow rate. 18. The method of claim 13 wherein said at least one sensor is a manometer. 19. The method of claim 13 wherein said gas is an inert gas that is different from said process gas. 20. The method of claim 13 wherein said gas is said process gas.