Ultrathin porous nanoscale membranes, methods of making, and uses thereof
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-053/22
B01D-039/00
B01D-039/14
B01D-071/04
출원번호
US-0414991
(2006-05-01)
등록번호
US-8182590
(2012-05-22)
발명자
/ 주소
Striemer, Christopher C.
Fauchet, Philippe M.
Gaborski, Thomas R.
McGrath, James L.
출원인 / 주소
University of Rochester
대리인 / 주소
LeClairRyan, a Professional Corporation
인용정보
피인용 횟수 :
11인용 특허 :
36
초록▼
A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite
A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
대표청구항▼
1. A nanoporous membrane exposed on opposite sides thereof and having an average thickness of less than about 100 nm, wherein the membrane comprises nanocrystalline silicon and has a surface roughness of less than 1 nm on both sides thereof, wherein said nanoporous membrane is prepared according to
1. A nanoporous membrane exposed on opposite sides thereof and having an average thickness of less than about 100 nm, wherein the membrane comprises nanocrystalline silicon and has a surface roughness of less than 1 nm on both sides thereof, wherein said nanoporous membrane is prepared according to a process comprising: applying a nanoscale silicon film to one side of a substrate;forming a passage through the substrate, thereby exposing the film on both sides thereof to form a membrane; andannealing the silicon at a temperature effective to convert the silicon into a nanocrystalline form, thereby forming a plurality of randomly spaced pores in the nanoporous membrane. 2. The nanoscale membrane according to claim 1 wherein the process further comprises at least partially coating one side of the membrane with a metal. 3. The nanoscale membrane according to claim 2 wherein the metal is selected from the group of gold, silver, copper, platinum, aluminum, chromium, titanium, tungsten, lead, tin, palladium, and alloys thereof. 4. The nanoscale membrane according to claim 1 wherein the membrane is less than 50 nm thick. 5. The nanoscale membrane according to claim 1 wherein the membrane is less than about 10 nm thick. 6. The nanoscale membrane according to claim 1 wherein the membrane is characterized by a lateral length to thickness aspect ratio that is more than 10,000 to 1. 7. The nanoscale membrane according to claim 1 wherein the membrane is substantially planar. 8. The nanoscale membrane according to claim 1 wherein the average pore size is less than about 50 nm in diameter. 9. The nanoscale membrane according to claim 1 wherein the pore density is between 106-1012 cm−2. 10. A filter device comprising at least one nanoscale membrane according to claim 1. 11. The filter device according to claim 10 further comprising: a support having a passage extending between opposite surfaces of the support, wherein the at least one nanoscale membrane is bound to or positioned on the support, with the at least one nanoscale membrane confronting the passage. 12. The filter device according to claim 10 comprising two or more nanoscale membranes having different maximum pore sizes, wherein the two or more nanoscale membranes are serially positioned relative to the direction of fluid flow with a membrane having a smaller maximum pore size being downstream of a membrane having a larger maximum pore size. 13. The filter device according to claim 12 comprising three or more nanoscale membranes each having a different maximum pore size. 14. The filter device according to claim 10 wherein the support is formed of silicon. 15. The filter device according to claim 11 further comprising an adapter having an inlet and an outlet, with the support being secured to the adapter such that the passage is in fluid communication with the inlet and outlet. 16. The filter device according to claim 10 further comprising first and second conduits positioned in a substantially parallel arrangement, with the at least one nanoscale membrane positioned between the first and second conduits, whereby species smaller than a maximum pore size are capable of passing between the first and second conduits through the at least one nanoscale membrane. 17. The filter device according to claim 16 wherein the direction of fluid flow for the first and second conduits is in the same direction. 18. The filter device according to claim 16 wherein the direction of fluid flow for the first and second conduits is in the opposite direction. 19. The filter device according to claim 10 further comprising an electrode coupled to or positioned adjacent the at least one nanoscale membrane. 20. The filter device according to claim 19 wherein the electrode is an anode. 21. The filter device according to claim 19 wherein the electrode is a cathode. 22. The filter device according to claim 19, wherein the device comprises a first electrode positioned on one side of the nanoscale membrane and a second electrode positioned on an opposite side of the nanoscale membrane, whereby upon introduction of an electrolyte solution across the nanoscale membrane, the first and second electrodes are capable of applying a voltage across the electrolyte solution. 23. The filter device according to claim 22 further comprising a third electrode in contact with the nanoscale membrane. 24. The filter device according to claim 10 further comprising one or more capture molecules tethered to the membrane within the pores or on a surface of the membrane. 25. The filter device according to claim 10 further comprising one or more non-binding, screening, or repulsive molecules tethered to the membrane within the pores or on a surface of the membrane. 26. The nanoporous membrane according to claim 1, wherein the process further comprises: applying a sacrificial film either (i) to the one side of the substrate prior to said applying the nanoscale film, (ii) over the nanoscale film after said applying the nanoscale film, or (iii) both (i) and (ii). 27. The nanoporous membrane according to claim 26 wherein both (i) and (ii) are carried out. 28. The nanoporous membrane according to claim 27 wherein each sacrificial film is an oxide film. 29. The nanoporous membrane according to claim 28 wherein each oxide film comprises silicon dioxide. 30. The nanoporous membrane according to claim 26 wherein said forming comprises: masking a side of the substrate that is opposite the one side upon which the nanoscale silicon film is applied;etching the substrate, beginning from the masked side of the substrate, to form the passage. 31. The nanoporous membrane according to claim 30 wherein said masking comprises applying an incomplete silicon dioxide film on the opposite side of the substrate, said substrate being formed of silicon. 32. The nanoporous membrane according to claim 31 wherein said etching is carried out using an etchant that has a silicon/silicon dioxide selectivity that is greater than about 10,000. 33. The nanoporous membrane according to claim 32 wherein said etching is carried out using an etchant comprising ethylenediamine, pyrocatechol, pyrazine, and water. 34. The nanoporous membrane according to claim 26 further comprising: removing the sacrificial film or films after said etching. 35. The nanoporous membrane according to claim 34 wherein said removing is carried out after said annealing. 36. The nanoporous membrane according to claim 34 wherein said removing comprises exposing the sacrificial film or films to a buffered oxide etchant solution, or a hydrofluoric acid etchant solution. 37. The nanoporous membrane according to claim 30 wherein said etching is carried out in a container that exposes substrate to etchant solution only from the masked side thereof. 38. The nanoporous membrane according to claim 37 further comprising: heating and/or stirring etchant solution during said etching. 39. The nanoporous membrane according to claim 1 wherein said applying comprises radio-frequency magnetron sputtering, low pressure chemical vapor deposition, plasma enhanced chemical vapor deposition, thermal chemical growth, radio frequency sputtering, DC sputtering, thermal evaporation, electron beam evaporation, or electroplating. 40. The nanoporous membrane according to claim 1 wherein said applying further comprises changing conditions during silicon film deposition, the conditions being selected from the group of pressure changes, plasma density changes, plasma power changes, temperature changes, source material changes, and gas composition changes. 41. A nanoporous membrane comprising silicon nanocrystals, wherein the membrane is exposed on opposite sides thereof, has an average thickness of less than about 100 nm, and has a plurality of pores extending between the opposite sides thereof, wherein both of the opposite sides have a surface roughness of less than about 1 nm. 42. The nanoscale membrane according to claim 41 wherein the silicon is undoped silicon, p-doped silicon, or n-doped silicon. 43. The nanoscale membrane according to claim 42 wherein the silicon is doped with one or more of B, Al, Ga, In, P, As, Sb, and Ge. 44. The nanoscale membrane according to claim 41 wherein the membrane further comprises a coating of a metal at least partially covering one side of the membrane. 45. The nanoscale membrane according to claim 44 wherein the metal is selected from the group of gold, silver, copper, platinum, aluminum, chromium, titanium, tungsten, lead, tin, palladium, and alloys thereof. 46. The nanoscale membrane according to claim 41 wherein the membrane is less than 50 nm thick. 47. The nanoscale membrane according to claim 41 wherein the membrane is less than about 10 nm thick. 48. The nanoscale membrane according to claim 41 wherein the membrane is characterized by a lateral length to thickness aspect ratio that is more than 10,000 to 1. 49. The nanoscale membrane according to claim 41 wherein the average pore size is less than about 50 nm in diameter. 50. The nanoscale membrane according to claim 41 wherein the pore density is between 106-1012 cm−2. 51. The nanoscale membrane according to claim 41 wherein the membrane consists essentially of silicon nanocrystals. 52. The nanoscale membrane according to claim 41 wherein the silicon nanocrystals have a random nanocrystal orientation. 53. The nanoscale membrane according to claim 41 wherein the pores have a shape that is defined by in situ-formed silicon nanocrystals that form the membrane. 54. A filter device comprising at least one nanoscale membrane according to claim 41. 55. The filter device according to claim 54 further comprising: a support having a passage extending between opposite surfaces of the support, wherein the at least one nanoscale membrane is bound to or positioned on the support, with the at least one nanoscale membrane confronting the passage. 56. The filter device according to claim 54 comprising two or more nanoscale membranes having different maximum pore sizes, wherein the two or more nanoscale membranes are serially positioned relative to the direction of fluid flow with a membrane having a smaller maximum pore size being downstream of a membrane having a larger maximum pore size. 57. The filter device according to claim 54 comprising three or more nanoscale membranes each having a different maximum pore size. 58. The filter device according to claim 54 wherein the support is formed of silicon. 59. The filter device according to claim 55 further comprising an adapter having an inlet and an outlet, with the support being secured to the adapter such that the passage is in fluid communication with the inlet and outlet. 60. The filter device according to claim 54 further comprising first and second conduits positioned in a substantially parallel arrangement, with the at least one nanoscale membrane positioned between the first and second conduits, whereby species smaller than a maximum pore size are capable of passing between the first and second conduits through the at least one nanoscale membrane. 61. The filter device according to claim 60 wherein the direction of fluid flow for the first and second conduits is in the same direction. 62. The filter device according to claim 60 wherein the direction of fluid flow for the first and second conduits is in the opposite direction. 63. The filter device according to claim 54 further comprising an electrode coupled to or positioned adjacent the at least one nanoscale membrane. 64. The filter device according to claim 63 wherein the electrode is an anode. 65. The filter device according to claim 63 wherein the electrode is a cathode. 66. The filter device according to claim 63, wherein the device comprises a first electrode positioned on one side of the nanoscale membrane and a second electrode positioned on an opposite side of the nanoscale membrane, whereby upon introduction of an electrolyte solution across the nanoscale membrane, the first and second electrodes are capable of applying a voltage across the electrolyte solution. 67. The filter device according to claim 66 further comprising a third electrode in contact with the nanoscale membrane. 68. The filter device according to claim 54 further comprising one or more capture molecules tethered to the membrane within the pores or on a surface of the membrane. 69. The filter device according to claim 54 further comprising one or more non-binding, screening, or repulsive molecules tethered to the membrane within the pores or on a surface of the membrane. 70. A microfluidic device comprising the filter device according to claim 54. 71. A dialysis machine comprising a filter device according to claim 54. 72. A fuel cell comprising a nanoscale membrane according to claim 41, wherein the nanoscale membrane selectively passes positively charged species. 73. A method of filtering nanoscale products comprising: providing at least one nanoscale membrane according to claim 41; andpassing a fluid, containing one or more products to be filtered, through the membrane, whereby objects larger than a maximum pore size are effectively precluded from passing through the pores of the membrane. 74. The method according to claim 73 wherein said providing comprises two or more nanoscale membranes having different maximum pore sizes, wherein the two or more nanoscale membranes are serially positioned relative to the direction of fluid flow with a membrane having a smaller maximum pore size being downstream of a membrane having a larger maximum pore size. 75. The method according to claim 74 wherein said providing comprises three or more nanoscale membranes each having a different maximum pore size.
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