초록 ▼

The invention provides an infiltrant for dental application that comprises crosslinking monomers, having a penetration coefficient PC50 cm/s. In accordance with the invention the infiltrant comprises at least one nanoscale radiopaque filler and/or radiopaque organic compound, while ensuring sufficie

The invention provides an infiltrant for dental application that comprises crosslinking monomers, having a penetration coefficient PC50 cm/s. In accordance with the invention the infiltrant comprises at least one nanoscale radiopaque filler and/or radiopaque organic compound, while ensuring sufficient contrast to surrounding tooth and bone tissue in X-ray diagnostics.

대표청구항 ▼

1. An infiltrant for dental application that comprises crosslinking monomers and initiator and, under measurement of the dynamic viscosity at room temperature, has a penetration coefficient PC>50 cm/s, wherein the infiltrant comprises at least one nanoscale radiopaque filler and/or radiopaque organi

1. An infiltrant for dental application that comprises crosslinking monomers and initiator and, under measurement of the dynamic viscosity at room temperature, has a penetration coefficient PC>50 cm/s, wherein the infiltrant comprises at least one nanoscale radiopaque filler and/or radiopaque organic compound. 2. The infiltrant of claim 1, wherein said infiltrant has an ISO 4049 radio-opacity of at least 50% of aluminum. 3. The infiltrant of claim 1, wherein said at least one nanoscale radiopaque filler comprises metal, semimetal or mixed-metal oxides, silicates, nitrides, sulfates, titanates, zirconates, stannates, tungstates, phosphates, halides or a mixture thereof. 4. The infiltrant of claim 1, wherein the fillers are selected from the group consisting of aluminum oxide, zirconium dioxide, titanium dioxide, zinc oxide, tin dioxide, cerium oxide, aluminum silicon oxides, silicon zinc oxides, silicon zirconium oxides, iron oxides and mixtures thereof with silicon dioxide, indium oxides and mixtures thereof with silicon dioxide and/or tin dioxide, silicon dioxide, boron nitride, strontium sulfate, barium sulfate, strontium titanate, barium titanate, sodium zirconate, potassium zirconate, magnesium zirconate, calcium zirconate, strontium zirconate, barium zirconate, sodium tungstate, potassium tungstate, magnesium tungstate, calcium tungstate, strontium tungstate and/or barium tungstate. 5. The infiltrant of claim 1, wherein the nanoscale radiopaque fillers are salts. 6. The infiltrant of claim 5, wherein the salts are selected from the group consisting of sulfates, phosphates or fluorides of the rare earth metals. 7. The infiltrant of claim 6, wherein the rare earth metals are selected from the group consisting of the group consisting of lanthanum, cerium, samarium, gadolinium, dysprosium, erbium or ytterbium. 8. The infiltrant of claim 6, wherein the rare earth metals are selected from the group consisting of scandium, of yttrium, of barium, and strontium, tungstates, and orthotungstates. 9. The infiltrant of claim 6, wherein the nanoscale radiopaque filler salts are tungstates, and wherein said tungstates are doped with metal atoms of at least one metal, and wherein the host lattice metal of the filler salt is replaced by the dopant in an amount of up to 50 mol %. 10. The infiltrant of claim 9, wherein the host lattice metal of the filler salt is replaced by the dopant in an amount of 0.1 to 40 mol %. 11. The infiltrant of claim 9, wherein the host lattice metal of the filler salt is replaced by the dopant in an amount of 0.5 to 30 mol %. 12. The infiltrant of claim 9, wherein the host lattice metal of the filler salt is replaced by the dopant in an amount of 1 to 25 mol %. 13. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of less than 1000 nm. 14. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of less than 700 nm. 15. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of less than 500 nm. 16. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of less than 200 nm. 17. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of less than 100 nm. 18. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of between 0.5 nm and 80 nm. 19. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of between 0.5 nm and 60 nm. 20. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of between 0.5 nm and 50 nm. 21. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of between 0.5 nm and 22 nm. 22. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of between 1 nm and 20 nm. 23. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of between 1 nm and 10 nm. 24. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a particle size of between 1 nm and 5 nm. 25. The infiltrant of claim 1, wherein the radiopaque nanoscale filler comprises individual, unaggregated and unagglomerated nanoscale filler particles. 26. The infiltrant of claim 25, wherein the radiopaque nanoscale filler has a unimodal particle size distribution. 27. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a DIN 66131 or DIN ISO 9277 BET surface area of between 15 m2/g and 600 m2/g. 28. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a DIN 66131 or DIN ISO 9277 BET surface area of between 30 m2/g and 500 m2/g. 29. The infiltrant of claim 1, wherein the radiopaque nanoscale filler has a DIN 66131 or DIN ISO 9277 BET surface area of between 50 m2/g and 400 m2/g. 30. The infiltrant of claim 1, wherein the amount of the nanoscale radiopaque filler in the infiltrant, based on the total mass of the infiltrant with all ingredients, is 1% to 30% by weight. 31. The infiltrant of claim 1, wherein the amount of the nanoscale radiopaque filler in the infiltrant, based on the total mass of the infiltrant with all ingredients, is 5% to 25% by weight. 32. The infiltrant of claim 1, wherein the amount of the nanoscale radiopaque filler in the infiltrant, based on the total mass of the infiltrant with all ingredients, is 10% to 20% by weight. 33. The infiltrant of claim 1, wherein the amount of the nanoscale radiopaque filler in the infiltrant, based on the total mass of the infiltrant with all ingredients, is 1% to 5% by weight. 34. The infiltrant of claim 1, wherein the amount of the nanoscale radiopaque filler in the infiltrant, based on the total mass of the infiltrant with all ingredients, is 5% to 10% by weight. 35. The infiltrant of claim 1, wherein the amount of the nanoscale radiopaque filler in the infiltrant, based on the total mass of the infiltrant with all ingredients, is 10% to 15% by weight. 36. The infiltrant of claim 1, wherein the amount of the nanoscale radiopaque filler in the infiltrant, based on the total mass of the infiltrant with all ingredients, is 15% to 20% by weight. 37. The infiltrant of claim 1, wherein the radiopaque nanoscale filler is organically modified. 38. The infiltrant of claim 37, wherein the radiopaque nanoscale filler is organically modified by treatment with a siloxane, chlorosilane, silazane, titanate, zirconate, tungstate or with an organic acid, an organic acid chloride or acid anhydride. 39. The infiltrant of claim 38, wherein the siloxanes, chlorosilanes, silazanes, titanates, zirconates, and tungstates having the following general formulae: Si(OR′)nR4-n,SiClnR4-n,(RmR3-m′Si)2NH,Ti(OR′)nR4-n,Zr(OR′)nR4-n andW(OR′)nR6-n,where m is 1, 2 or 3,n is 1, 2 or 3,the group R′ attached via the oxygen, and the group R′, is an organic functional group, andthe functional group R is an organic group and is attached directly via a carbon atom to the silicon, titanium, zirconium or tungsten. 40. The infiltrant of claim 39, wherein R′ is an alkyl group. 41. The infiltrant of claim 40, wherein said alkyl group is selected from the group consisting of methyl, ethyl, propyl and isopropyl groups. 42. The infiltrant of claim 1, wherein the radiopaque organic compound is selected from the group consisting of organometallic compounds,aliphatic, cyclic or aromatic halides, more particularly bromine compounds,monomers comprising heavy metal ions and/or halogens. 43. The infiltrant of claim 42, wherein said monomers comprising halogens comprise one or more of (meth)acrylated triphenylbismuth derivatives, iodine-substituted benzoic esters and benzamides. 44. The infiltrant of claim 1, wherein said infiltrant has a penetration coefficient PC>100 cm/s. 45. The infiltrant of claim 1, wherein said infiltrant has a dynamic viscosity as measured at room temperature of 50 mPas or less. 46. The infiltrant of claim 1, wherein said infiltrant has a dynamic viscosity as measured at room temperature of 30 mPas or less. 47. The infiltrant of claim 1, wherein said infiltrant has a dynamic viscosity as measured at room temperature of 15 mPas or less. 48. Kit for preparing an infiltrant according to any of the preceding claims, wherein the kit comprises a first component with monomers and chemically activable initiators anda second component with activators. 49. The kit of claim 48, further comprising an etching and/or drying agent. 50. A method of treating and/or preventing carious enamel lesions and/or sealing dental fissures comprising treating a tooth surface with the infiltrant of claim 1.