Method and apparatus for compensation of mechanical disturbances in optical interferometers
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G02B-005/08
G02B-007/182
G02B-027/00
G01B-009/02
출원번호
US-0080355
(2008-04-01)
등록번호
US-8213084
(2012-07-03)
발명자
/ 주소
Kimble, H. Jeff
출원인 / 주소
California Institute of Technology
대리인 / 주소
Christie, Parker & Hale, LLP
인용정보
피인용 횟수 :
0인용 특허 :
8
초록▼
A fundamental limit to the sensitivity of optical interferometry is thermal noise that drives fluctuations in the positions of the surfaces of the interferometer's mirrors, and thereby in the phase of the intracavity field. A scheme for substantially reducing this thermally driven phase noise is pro
A fundamental limit to the sensitivity of optical interferometry is thermal noise that drives fluctuations in the positions of the surfaces of the interferometer's mirrors, and thereby in the phase of the intracavity field. A scheme for substantially reducing this thermally driven phase noise is provided in which the strain-induced phase shift from a mirror's optical coating cancels that due to the concomitant motion of the substrate's surface. As such, although the position of the physical surface may fluctuate, the optical phase upon reflection can be largely insensitive to this motion.
대표청구항▼
1. A mirror of an optical interferometer, the mirror comprising: a mirror substrate; andan optical coating on the mirror substrate, wherein a mechanical disturbance of the mirror substrate and the optical coating leads to a reflective surface displacement noise of the mirror, the reflective surface
1. A mirror of an optical interferometer, the mirror comprising: a mirror substrate; andan optical coating on the mirror substrate, wherein a mechanical disturbance of the mirror substrate and the optical coating leads to a reflective surface displacement noise of the mirror, the reflective surface displacement noise producing a first phase shift of a given wavevector reflected from the mirror, andthe optical coating comprising an optical layer configured to produce a second phase shift of the given wavevector, the second phase shift substantially compensating for the first phase shift, andwherein the optical coating comprises a plurality of first layers and a plurality of second layers, the optical layer being positioned between the plurality of first layers and the plurality of second layers. 2. The mirror of claim 1, wherein the second phase shift is produced from a strain of the optical coating, the strain resulting from the mechanical disturbance. 3. The mirror of claim 1, wherein the first phase shift and the second phase shift are substantially equal to a total phase shift of the mechanical disturbance, and wherein the optical layer of the optical coating is configured such that the total phase shift is substantially equal to zero. 4. The mirror of claim 1, wherein the mechanical disturbance is a thermal fluctuation of the mirror substrate and the optical coating. 5. The mirror of claim 4, wherein the thermal fluctuation is function of a Boltzmann constant and a given temperature. 6. The mirror of claim 1, wherein the plurality of first layers is smaller in number than the plurality of second layers, and wherein the plurality of second layers is between the optical layer and the mirror substrate. 7. A mirror of an optical interferometer, the mirror comprising: a mirror substrate; andan optical coating on the mirror substrate,wherein a mechanical disturbance of the mirror substrate and the optical coating leads to a reflective surface displacement noise of the mirror, the reflective surface displacement noise producing a first phase shift of a given wavevector reflected from the mirror, andthe optical coating comprising an optical layer configured to produce a second phase shift of the given wavevector, the second phase shift substantially compensating for the first phase shift, andwherein a thickness of the optical layer is a multiple of a half of a wavelength of the given wavevector. 8. The mirror of claim 7, wherein the second phase shift is produced from a strain of the optical coating, the strain resulting from the mechanical disturbance. 9. The mirror of claim 7, wherein the first phase shift and the second phase shift are substantially equal to a total phase shift of the mechanical disturbance, and wherein the optical layer of the optical coating is configured such that the total phase shift is substantially equal to zero. 10. The mirror of claim 7, wherein the mechanical disturbance is a thermal fluctuation of the mirror substrate and the optical coating. 11. The mirror of claim 10, wherein the thermal fluctuation is function of a Boltzmann constant and a given temperature. 12. A mirror of an optical interferometer, the mirror comprising: a first region of a first mirror substrate;a first optical coating on the first region of the first mirror substrate;a second region of a second mirror substrate; anda second optical coating between the first region of the first mirror substrate and the second region of the second mirror substrate;wherein a mechanical disturbance of the first and second regions of the mirror substrates and the first and second optical coatings leads to a reflective surface displacement noise of the mirror, the reflective surface displacement noise producing a first phase shift of a given wavevector reflected from the mirror, andwherein the first region of the first mirror substrate has a thickness configured to produce a second phase shift of the given wavevector, the second phase shift substantially compensating for the first phase shift. 13. The mirror of claim 12, wherein the mechanical disturbance is a thermal fluctuation of the first and second regions of the mirror substrates and the first and second optical coatings. 14. The mirror of claim 13, wherein the thermal fluctuation is function of a Boltzmann constant and a given temperature. 15. The mirror of claim 12, wherein the first optical coating comprises a plurality of first layers, and the second optical coating comprises a plurality of second layers.
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이 특허에 인용된 특허 (8)
Davis William J., Compensating layer to reduce wavefront errors in coatings on mirrors for optical systems.
Spiller Eberhard A. ; Mirkarimi Paul B. ; Montcalm Claude ; Bajt Sasa ; Folta James A., Method to adjust multilayer film stress induced deformation of optics.
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