$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Semiconductor device including magnet 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-029/772
출원번호 US-0759999 (2010-04-14)
등록번호 US-8237164 (2012-08-07)
우선권정보 JP-2002-320270 (2002-11-01)
발명자 / 주소
  • Takayama, Toru
  • Maruyama, Junya
  • Ohno, Yumiko
  • Murakami, Masakazu
  • Hamatani, Toshiji
  • Kuwabara, Hideaki
  • Yamazaki, Shunpei
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
    Robinson, Eric J.
인용정보 피인용 횟수 : 2  인용 특허 : 30

초록

(OBJECT) The object is to provide a lightened semiconductor device and a manufacturing method thereof by pasting a layer to be peeled to various base materials. (MEANS FOR SOLVING THE PROBLEM) In the present invention, a layer to be peeled is formed on a substrate, then a seal substrate provided wit

대표청구항

1. A display device comprising: a magnet;a layer over the magnet, the layer comprising a first material selected from the group consisting of strontium oxide, tin oxide and fluoropolymer;an adhesive material interposed between the magnet and the layer, wherein the adhesive material is in direct cont

이 특허에 인용된 특허 (30)

  1. Yamazaki,Shunpei; Nakajima,Setsuo, Display device and method of manufacturing the same.
  2. Yasui, Atsuhito, Electric optical apparatus using a composite substrate formed by bonding a semiconductor substrate and manufacturing method of the same, projection display, and electronic instrument.
  3. Pullen, Anthony Edward; Morrison, Ian D.; Pratt, Emily J., Electrophoretic displays containing magnetic particles.
  4. Shimoda, Tatsuya; Inoue, Satoshi; Miyazawa, Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device and liquid crystal display device produced by the same.
  5. Shimoda,Tatsuya; Inoue,Satoshi; Miyazawa,Wakao, Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same.
  6. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Hybrid circuit and electronic device using same.
  7. Yamazaki,Shunepi; Takayama,Toru, Light emitting device, electronic equipment, and organic polarizing film.
  8. Takahashi Kunihiro (Tokyo JPX) Kojima Yoshikazu (Tokyo JPX) Takasu Hiroaki (Tokyo JPX) Matsuyama Nobuyoshi (Tokyo JPX) Niwa Hitoshi (Tokyo JPX) Yoshino Tomoyuki (Tokyo JPX) Yamazaki Tsuneo (Tokyo JPX, Light valve device using semiconductive composite substrate.
  9. Takahashi Kunihiro (Tokyo JPX) Kojima Yoshikazu (Tokyo JPX) Takasu Hiroaki (Tokyo JPX) Matsuyama Nobuyoshi (Tokyo JPX) Niwa Hitoshi (Tokyo JPX) Yoshino Tomoyuki (Tokyo JPX) Yamazaki Tsuneo (Tokyo JPX, Light valve device using semiconductive composite substrate.
  10. Takahashi Kunihiro (Tokyo JPX) Kojima Yoshikazu (Tokyo JPX) Takasu Hiroaki (Tokyo JPX) Matsuyama Nobuyoshi (Tokyo JPX) Niwa Hitoshi (Tokyo JPX) Yoshino Tomoyuki (Tokyo JPX) Yamazaki Tsuneo (Tokyo JPX, Light valve device using semiconductive composite substrate.
  11. Kazumi Yamamoto JP, Magnetic display device.
  12. Yamamoto Kazumi,JPX, Magnetic sheet.
  13. Inoue Satoshi,JPX ; Shimoda Tatsuya,JPX, Manufacturing method of active matrix substrate, active matrix substrate and liquid crystal display device.
  14. Sugano, Yukiyasu, Method for manufacturing display panel having reduced wall thickness and display panel having reduced wall thickness.
  15. Miyazawa,Takashi, Method for manufacturing laminated film, electro-optical device, method for manufacturing electro-optical device, organic electroluminescence device, and electronic appliances.
  16. Asano, Akihiko; Kinoshita, Tomoatsu, Method for manufacturing thin film device and semiconductor device.
  17. Asano, Akihiko; Kinoshita, Tomoatsu, Method for manufacturing thin film device and semiconductor device using a third substrate.
  18. Asano,Akihiko; Kinoshita,Tomoatsu, Method for manufacturing thin film device that includes a chemical etchant process.
  19. Utsunomiya, Sumio, Method for transferring element, method for producing element, integrated circuit, circuit board, electro-optical device, IC card, and electronic appliance.
  20. Takahashi Kunihiro (Tokyo JPX) Kojima Yoshikazu (Tokyo JPX) Takasu Hiroaki (Tokyo JPX) Matsuyama Nobuyoshi (Tokyo JPX) Niwa Hitoshi (Tokyo JPX) Yoshino Tomoyuki (Tokyo JPX) Yamazaki Tsuneo (Tokyo JPX, Method of making light valve device using semiconductive composite substrate.
  21. Arai Michio (Tokyo JPX) Yamauchi Yukio (Kanagawa JPX) Sakamoto Naoya (Kanagawa JPX) Nagano Katsuto (Kanagawa JPX), Method of manufacturing a hybrid integrated circuit component having a laminated body.
  22. Arao, Tatsuya; Suzawa, Hideomi; Ono, Koji; Takayama, Toru, Method of manufacturing semiconductor device.
  23. Stephen J. Battersby GB, Method of manufacturing thin film transistors.
  24. Takayama, Toru; Maruyama, Junya; Yamazaki, Shunpei, Method of peeling off and method of manufacturing semiconductor device.
  25. Takahashi Kunihiro,JPX ; Kojima Yoshikazu,JPX ; Takasu Hiroaki,JPX ; Matsuyama Nobuyoshi,JPX ; Niwa Hitoshi,JPX ; Yoshino Tomoyuki,JPX ; Yamazaki Tsuneo,JPX, Process for manufacturing light valve device using semiconductive composite substrate.
  26. Nishida, Shoji; Yonehara, Takao; Sakaguchi, Kiyofumi; Ukiyo, Noritaka; Iwasaki, Yukiko, Process for producing semiconductor member, and process for producing solar cell.
  27. Ohtani Hisashi,JPX ; Nakazawa Misako,JPX, Semiconductor device and a method of manufacturing the same.
  28. Maruyama,Junya; Takayama,Toru; Goto,Yuugo, Semiconductor device and method of manufacturing the same.
  29. Tatsuya Shimoda JP; Satoshi Inoue JP; Wakao Miyazawa JP, Separating method, method for transferring thin film device, thin film device, thin film integrated circuit device, and liquid crystal display device manufactured by using the transferring method.
  30. Choi, Seung Kyu; Soh, Jae Moon; Kim, Jong Woo, Thin film transistor substrate and fabricating method thereof.

이 특허를 인용한 특허 (2)

  1. Yamazaki, Shunpei; Katayama, Masahiro; Eguchi, Shingo; Oikawa, Yoshiaki; Nakamura, Ami; Seo, Satoshi; Hatano, Kaoru, Light emitting device and electronic device.
  2. Yamazaki, Shunpei; Katayama, Masahiro; Eguchi, Shingo; Oikawa, Yoshiaki; Nakamura, Ami; Seo, Satoshi; Hatano, Kaoru, Light emitting device and electronic device.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로