Purge apparatus
IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0497019
(2009-07-02)
|
등록번호 |
US-8240346
(2012-08-14)
|
우선권정보 |
JP-2008-175105 (2008-07-03) |
발명자
/ 주소 |
- Goto, Fumiki
- Adachi, Naruto
|
출원인 / 주소 |
|
대리인 / 주소 |
Wenderoth, Lind & Ponack, LLP
|
인용정보 |
피인용 횟수 :
5 인용 특허 :
7 |
초록
▼
A purge apparatus is provided which can purge with clean gas even in a case where an in-use state is selected after a long period of a non-use state. The purge apparatus includes a nozzle which is connectable to a container and through which gas passes, a detection unit which detects a connection st
A purge apparatus is provided which can purge with clean gas even in a case where an in-use state is selected after a long period of a non-use state. The purge apparatus includes a nozzle which is connectable to a container and through which gas passes, a detection unit which detects a connection state between the container and the nozzle, and a flow rate adjustment unit which allows the gas to flow at a first flow rate when the container and the nozzle are in a connected state, and allows the gas to flow at a second flow rate, which is lower than the first flow rate, when the container and the nozzle are in a disconnected state.
대표청구항
▼
1. A purge apparatus for purging an inside of a container by introducing clean gas into the inside of the container, said purge apparatus comprising: a nozzle adapted to be connected to the container, and through which the gas passes;a detection unit configured to detect a connection state between t
1. A purge apparatus for purging an inside of a container by introducing clean gas into the inside of the container, said purge apparatus comprising: a nozzle adapted to be connected to the container, and through which the gas passes;a detection unit configured to detect a connection state between the container and said nozzle; anda flow rate adjustment unit configured to: allow the gas to flow into said nozzle at a first flow rate when said detection unit detects that the container and said nozzle are in a connected state; and allow the gas to flow into said nozzle at a second flow rate when said detection unit detects that the container and said nozzle are in a disconnected state,the second flow rate being lower than the first flow rate and higher than zero, wherein said first and second flow rates are determined as average flow rates over the time in which said first and second flow rates are adopted, respectively. 2. The purge apparatus according to claim 1, wherein said flow rate adjustment unit includes:a switch valve for switching between a non-flow state and a flow state, the non-flow state being a state where the gas is not allowed to flow into said nozzle, the flow state being a state where the gas is allowed to flow into said nozzle; anda control unit configured to control a total time-duration, per certain time-period, during which said switch valve is switched to the non-flow state,wherein, when said detection unit detects that the container and said nozzle are in the connected state, said control unit is configured to select a first mode, andwhen said detection unit detects that the container and said nozzle are in the disconnected state, said control unit is configured to select a second mode,wherein the total time-duration of the non-flow state included in a certain time-period is shorter in said first mode than in said second mode, thereby allowing the gas to flow into said nozzle at said first and second flow rates in said first and second modes, respectively. 3. The purge apparatus according to claim 1, wherein said flow rate adjustment unit includes:a switch valve for switching between a high flow state and a low flow state, the high flow state being a state where the gas is allowed to flow into said nozzle at a high flow rate, the low flow state being a state where the gas is allowed to flow into said nozzle at a lower flow rate than the high flow rate; anda control unit configured to control said switch valve so that the high flow state is when the gas is allowed to flow into said nozzle at said first flow rate, and the low flow state is when the gas is allowed to flow into said nozzle at said second flow rate. 4. A purge method for use with a purge apparatus to purge an inside of a container by introducing clean gas into the inside of the container, the purge apparatus including a nozzle which is connected to the container and through which the gas passes, and a detection unit which detects a connection state between the container and the nozzle, said purge method comprising: allowing the gas to flow into the nozzle at a first flow rate when the detection unit detects that the container and the nozzle are in a connected state; and allowing the gas to flow into the nozzle at a second flow rate when the detection unit detects that the container and the nozzle are in a disconnected state, the second flow rate being lower than the first flow rate,wherein the second flow rate is lower than the first flow rate and higher than zero, and said first and second flow rates are determined as average flow rates over the time in which said first and second flow rates are adopted, respectively.
이 특허에 인용된 특허 (7)
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Yotsumoto Tadashi,JPX ; Muguruma Terumi,JPX ; Yoshikawa Noriaki,JPX ; Kuroda Yuichi,JPX, Clean storage equipment for substrates and method of storing substrates.
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Fosnight William J. ; Bonora Anthony C. ; Martin Raymond S. ; Tatro Jay, Evacuation-driven SMIF pod purge system.
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Paul E. Lewis ; Adel George Tannous ; Karl A. Davlin, Method and apparatus for processing tool interface in a manufacturing environment.
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Fosnight William J. ; Shenk Joshua W., Passively activated valve for carrier purging.
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Yang Tung-Fang,TWX ; Wu Tzong-Ming,TWX, Standard mechanical interface wafer pod gas filling system.
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Ahn,Yo Han; Kim,Ki Doo; Lee,Soo Woong; Hwang,Jung Sung; Kim,Hyeog Ki, Substrate processing apparatus and method of processing substrate while controlling for contamination in substrate transfer module.
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Bonora Anthony C. ; Wartenbergh Robert P. ; Gomes Christopher, Two stage valve for charging and/or vacuum relief of pods.
이 특허를 인용한 특허 (5)
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Naylor, Stuart, Apparatus for purging containers for storing sensitive materials.
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Otsuka, Hiroshi; Takahara, Masahiro; Ueda, Toshihito, Article storage facility and article storage method.
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Takahara, Masahiro; Ueda, Toshihito, Article storage facility and article storage method.
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Takahara, Masahiro; Ueda, Toshihito, Inactive gas introducing facility and inactive gas introducing method.
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Murata, Masanao; Yamaji, Takashi; Onishi, Shinji, Purge device, purge system, purge method, and control method in purge system.
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