초록 ▼

The present invention provides a method for creating a beveled needle or a blade. The method employs a side wall surface of an angled post as a base to control beveled tip geometry. The invention provides needles, microneedle arrays, blades and microblade arrays with sufficient sharpness and toughne

The present invention provides a method for creating a beveled needle or a blade. The method employs a side wall surface of an angled post as a base to control beveled tip geometry. The invention provides needles, microneedle arrays, blades and microblade arrays with sufficient sharpness and toughness.

대표청구항 ▼

1. A method for making at least one implement comprising at least one needle or at least one blade having an angled tip, the method comprising: creating at least one inclined structure which defines an angle of the angled tip of the at least one implement, the angle defining the implement's sharpnes

1. A method for making at least one implement comprising at least one needle or at least one blade having an angled tip, the method comprising: creating at least one inclined structure which defines an angle of the angled tip of the at least one implement, the angle defining the implement's sharpness; andbuilding at least one needle mold structure or at least one blade mold structure on the inclined structure. 2. The method according to claim 1, wherein the needle mold structure comprises a well with a post inside the well, which well defines a part of a needle wall of the at least one needle, and which post defines a part of a hollow section of the at least one needle. 3. The method according to claim 1, wherein the at least one needle comprises a needle without a hollow section, and wherein the needle mold structure comprises a well without a post inside the well, which well defines a part of a wall of the needle without a hollow section. 4. The method according to claim 1, wherein the blade mold structure comprises a well without a post inside the well, which well defines a part of a blade body of the at least one blade. 5. The method according to claim 1, wherein the at least one inclined structure is created by mechanical machining, laser ablation, lithography, abrasion, electric discharged machining (EDM), electric chemical machining (ECM), or etching. 6. The method according to claim 1, wherein the at least one inclined structure is created by one exposure, or more than one exposure to a light source. 7. The method according to claim 6, wherein the light source is UV, laser, or X-ray. 8. The method according to claim 1, wherein the mold structure is in a vertical or a horizontal position. 9. The method according to claim 1, further comprising depositing at least one layer of material to the at least one needle mold structure or the at least one blade mold structure, and removing the mold structure to obtain the at least one needle or at least one blade. 10. The method according to claim 9, wherein the material is metal, plastic, ceramic, or photoresist. 11. The method according to claim 1, wherein the implement forms a microneedle array or a microblade array. 12. A method for forming a beveled microneedle, characterized in that the method employs a separate side wall surface of an angled post as a base for a tip of the microneedle to form the beveled microneedle against the separate side wall surface. 13. The method of claim 12, wherein the beveled microneedle is metallic. 14. A method for making a microneedle or a microneedle array, the method comprising: coating a glass substrate with a layer of metal;depositing a layer of positive photoresist on the metal-coated glass substrate;patterning the positive photoresist for etching the metal layer;etching the metal layer;spin-coating a first layer of SU-8 photoresist on the etched metal-coated surface;exposing the substrate on the back-side of the SU-8 to UV at a defined angle to create at least one inclined post;spin-coating a second layer of SU-8 and patterning for a needle or needle array mold structure;developing the SU-8, but not post-exposure baking;coating a third layer of SU-8 for extending at least one post that defines a hollow section of the needle and creating at least one needle base;performing a post-exposure bake and developing the third layer of SU-8 to obtain a SU-8 needle or needle array mold structure;depositing a seed layer on the mold structure;nickel electroplating the mold structure;applying chemical mechanical polishing (CMP) to open an end of the needle base; andremoving the mold structure to obtain the microneedle or microneedle array. 15. The method according to claim 14, further comprising: depositing a seed layer onto the mold structure prior to electroplating. 16. The method according to claim 14, further comprising: depositing a seed layer upon the inclined post after the inclined post is created. 17. A method for making a needle or a needle array, the method comprising: spin-coating a substrate with a first photoresist;softbaking the first photoresist;exposing the first photoresist to a light source at a defined angle;post exposure baking the first photoresist if necessary;developing the first photoresist to obtain at least one inclined post that defines a needle tip;spin-coating a second photoresist;softbaking and exposing the second photoresist to create at least one base and at least one post that defines a hollow section of the needle;partially developing the second photoresist to obtain the base and the post that defines the hollow section of the needle;exposing the second photoresist to a light source to create boundaries of a needle or needle array mold structure;post exposure baking the second photoresist if necessary;developing the mold structure;electroplating a metal layer onto the mold structure;applying CMP to open the hollow section of the needle; andremoving the mold structure to obtain the needle or needle array. 18. A method for making a blade cutter of an arbitrary shape, the method comprising: spin-coating a first photoresist on a substrate;writing a point light source on the first photoresist at a defined angle;developing the first photoresist;spin-coating a second photoresist;patterning a top layout of the blade cutter using a mask or by direct writing of the light source;developing the second photoresist to obtain a cutter mold structure;applying a material to the mold structure; andremoving the mold structure to obtain the blade cutter. 19. The method of claim 18, wherein the point light source is a laser. 20. A method for making a needle or a needle array, the method comprising: coating a first negative photoresist on a substrate;softbaking the first photoresist;exposing the first photoresist under UV light with an inclined exposure;post exposure baking the first photoresist if necessary;developing the first photoresist to obtain at least one inclined post;coating the at least one inclined post with a mold release agent or a sacrificial layer;applying an elastomer upon the mold release agent or the sacrificial layer to obtain an elastomer structure;disassociating the elastomer structure from the mold release agent or the sacrificial layer so as to apply the elastomer structure as a base for further construction of the needle or needle array;coating the elastomer structure with a second negative photoresist for creating a needle or needle array mold structure;softbaking the second photoresist;exposing the second photoresist with a given photomask positioned on the second photoresist;spin-coating a third negative photoresist without developing the second photoresist;softbaking, exposing, and, if post exposure baking is required, post exposure baking the second and the third photoresist;developing the second and the third photoresist to obtain a needle or needle array mold structure;depositing a layer of material upon the mold structure; andremoving the mold structure to obtain the needle or needle array. 21. The method according to claim 20, wherein the photomask is a gray scale mask and wherein the needle or the needle array has a tapered structure. 22. The method according to claim 20, wherein the first, the second, and the third photoresist are SU-8.