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특허 상세정보

Photocurable perfluoropolyethers for use as novel materials in microfluidic devices

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C28J-005/20    H01M-004/88    H01M-008/10    B05D-005/12   
미국특허분류(USC) 428/421; 210/600; 427/002.11; 427/008; 427/508; 427/240; 427/271; 427/272; 427/282; 427/331; 427/384; 427/385.5; 427/333; 427/407.1; 430/270.1; 977/840; 977/904; 977/888; 977/702
출원번호 US-0572764 (2004-09-23)
등록번호 US-8268446 (2012-09-18)
국제출원번호 PCT/US2004/031274 (2004-09-23)
§371/§102 date 20070516 (20070516)
국제공개번호 WO2005/030822 (2005-04-07)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Alston & Bird LLP
인용정보 피인용 횟수 : 7  인용 특허 : 99
초록

The use of a photocurable perfluoropolyether (PFPE) material for fabricating a solvent-resistant PFPE-based microfluidic device, methods of flowing a material and performing a chemical reaction in a solvent-resistant PFPE-based microfluidic device, and the solvent-resistant PFPE-based microfluidic devices themselves are described. In an embodiment, a method is described for preparing a patterned layer of a photocured perfluoropolyether, the method comprising: (a) providing a substrate, wherein the substrate comprises a patterned surface; (b) contacting a...

대표
청구항

1. A method of forming a patterned layer of a photocured perfluoropolyether, the method comprising: (a) providing a substrate, wherein the substrate comprises a patterned surface;(b) contacting a perfluoropolyether precursor with the patterned surface of the substrate; and(c) photocuring the perfluoropolyether precursor to form a patterned layer of a photocured perfluoropolyether. 2. The method of claim 1, comprising: (a) coating the patterned surface of the substrate with a blend of a perfluoropolyether precursor and a photoinitiator to form a coated, p...

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