[특허]Thin film deposition apparatus and method of maintaining the same

Thin film deposition apparatus and method of maintaining the same 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-016/44 C23F-001/00 H01L-021/306 C23C-016/06 C23C-016/22
출원번호	US-0393377 (2009-02-26)
등록번호	US-8273178 (2012-09-25)
우선권정보	KR-10-2008-0018234 (2008-02-28)
발명자 / 주소	Kim, Se Yong Kim, Woo Chan Jung, Dong Rak
출원인 / 주소	ASM Genitech Korea Ltd.
대리인 / 주소	Knobbe, Martens, Olson & Bear LLP
인용정보	피인용 횟수 : 0 인용 특허 : 137

초록 ▼

A thin film deposition apparatus and a method of maintaining the same are disclosed. In one embodiment, a thin film deposition apparatus includes: a chamber including a removable chamber cover; one or more reactors housed in the chamber; a chamber cover lifting device connected to the chamber cover. The chamber cover lifting device is configured to move the chamber cover vertically between a lower position and an upper position. The apparatus further includes a level sensing device configured to detect whether the chamber cover is level, and a level maintaining device configured to adjust the chamber cover if the chamber cover is not level. This configuration maintains the chamber cover to be level as a condition for further vertical movement of the chamber cover.

대표청구항 ▼

1. A thin film deposition system comprising: a chamber including a removable chamber cover;a chamber cover lifting device connected to the chamber cover, the chamber cover lifting device being configured to move the chamber cover vertically between a lower position and an upper position; anda level sensing device configured to detect whether the chamber cover is level. 2. The system of claim 1, wherein the level sensing device comprises: a sensor positioned above the chamber cover, the sensor including a light-emitting portion and a light-receiving portion, the light-emitting portion being configured to emit a light beam toward the chamber cover; anda reflector attached to a top surface of the chamber cover, the reflector being configured to reflect the light beam toward the light-receiving portion of the sensor only when the chamber cover is substantially level. 3. The system of claim 2, wherein the sensor provides a signal indicating that the chamber cover is level when the sensor receives a light beam reflected from the reflector. 4. The system of claim 3, further comprising a controller configured to receive the signal from the sensor and to control the chamber cover lifting device, based at least partly on the signal. 5. The system of claim 2, wherein the sensor is positioned vertically above the reflector. 6. The system of claim 5, further comprising a chamber frame including a portion above the chamber, wherein the sensor is fixed to the portion of the chamber frame. 7. The system of claim 1, wherein the chamber cover lifting device comprises a plurality of cylinders attached to different portions of the chamber cover, and wherein the chamber cover lifting device is configured to move the chamber cover vertically by movement of the cylinders. 8. The system of claim 7, wherein each of the cylinders comprises a fixed portion and a reciprocating portion that is vertically movable. 9. The system of claim 8, further comprising a level maintaining device configured to maintain the chamber cover to be level. 10. The system of claim 9, wherein the level maintaining device comprises a plurality of springs. 11. The system of claim 10, wherein each of the springs surrounds the reciprocating portion of a respective one of the cylinders and is located between the chamber cover and the fixed portion of the cylinder. 12. The system of claim 11, wherein the springs comprise extension springs, and wherein the springs are in an extended state when the chamber cover is between the lower position and the upper position. 13. The system of claim 7, wherein the cylinders are configured to receive air to move upward, and wherein substantially no air is supplied to the cylinders when the sensor does not receive a light beam reflected from the reflector. 14. The system of claim 1, further comprising a level maintaining device configured to maintain the chamber cover to be level. 15. The system of claim 14, wherein the level maintaining device comprises a plurality of springs. 16. The system of claim 15, wherein the springs comprise extension springs, and wherein the springs are in an extended state when the chamber cover is between the lower position and the upper position.

이 특허에 인용된 특허 (137)

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
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Thin film deposition apparatus and method of maintaining the same 원문보기

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Thin film deposition apparatus and method of maintaining the same 원문보기

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