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A cylindrical vessel made of carbon is used in the production of silicon. The inner surface of the vessel comes into contact with a silicon melt, wherein the permeation with silicon melt is reduced, formation of SiC is suppressed, and the vessel is resistant to deformation even when volumetric expan

A cylindrical vessel made of carbon is used in the production of silicon. The inner surface of the vessel comes into contact with a silicon melt, wherein the permeation with silicon melt is reduced, formation of SiC is suppressed, and the vessel is resistant to deformation even when volumetric expansion ascribable to silicon is brought about. The carbon-made cylindrical vessel is made of a carbon material having a bulk specific gravity of 1.8 or more. The thermal expansion coefficient of the carbon material at 350 to 450° C. is preferably 3.5×10−6/° C. to 6.0×10−6/° C. A process for producing silicon uses said vessel wherein a chlorosilane is reacted with hydrogen.

대표청구항 ▼

1. A cylindrical vessel consisting essentially of a carbon material and having an inner surface for contacting a silicon melt, the carbon material having a bulk specific gravity of 1.8 to 1.95, wherein the inner surface of the cylindrical vessel consists essentially of the carbon material, wherein t

1. A cylindrical vessel consisting essentially of a carbon material and having an inner surface for contacting a silicon melt, the carbon material having a bulk specific gravity of 1.8 to 1.95, wherein the inner surface of the cylindrical vessel consists essentially of the carbon material, wherein the carbon material suppresses the formation of silicon carbide, wherein said cylindrical vessel is a reaction vessel for generation of silicon used in a process in which silicon is generated by reaction of a chlorosilane with hydrogen, a part or all of the generated silicon is melted, and thereby the silicon is continuously or intermittently dropped and collected. 2. The cylindrical vessel according to claim 1, wherein the thermal expansion coefficient of the carbon material at 350 to 450° C. is in the range of 3.5×10−6/° C. to 6.0×10−6/° C. 3. The cylindrical vessel according to claim 1, wherein the thermal expansion coefficient of the carbon material at 350 to 450° C. is in the range of 4.0×10−6/° C. to 5.8×10−6/° C. 4. The cylindrical vessel according to claim 1, wherein the cylindrical vessel consists of a carbon material. 5. A production process of silicon comprising the steps of providing a cylindrical vessel made of a carbon material having a bulk specific gravity of 1.8 to 1.95, defining a reaction vessel, wherein the carbon material suppresses the formation of silicon carbide, wherein silicon is generated by reacting a chlorosilane with hydrogen, a part or all of the generated silicon is melted, and thereby the silicon is continuously or intermittently dropped and collected. 6. The production process of silicon according to claim 5, wherein the thermal expansion coefficient of the carbon material at 350 to 450° C. is in the range of 3.5×10−6/° C. to 6.0×10−6/° C. 7. The production process of silicon according to claim 5, wherein the thermal expansion coefficient of the carbon material at 350 to 450° C. is in the range of 4.0×10−6/° C. to 5.8×10−6/° C.