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There is disclosed a semiconductor device and a method of fabricating the semiconductor device in which a heat treatment time required for crystal growth is shortened and a process is simplified. Two catalytic element introduction regions are arranged at both sides of one active layer and crystalliz

There is disclosed a semiconductor device and a method of fabricating the semiconductor device in which a heat treatment time required for crystal growth is shortened and a process is simplified. Two catalytic element introduction regions are arranged at both sides of one active layer and crystallization is made. A boundary portion where crystal growth from one catalytic element introduction region meets crystal growth from the other catalytic element introduction region is formed in a region which becomes a source region or drain region.

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1. A display device comprising: a thin film transistor comprising a gate electrode, wherein the gate electrode is formed on a first insulating film;a second insulating film over the thin film transistor;a current supply line over the second insulating film, wherein the current supply line is electri

1. A display device comprising: a thin film transistor comprising a gate electrode, wherein the gate electrode is formed on a first insulating film;a second insulating film over the thin film transistor;a current supply line over the second insulating film, wherein the current supply line is electrically connected to the thin film transistor;a third insulating film over the current supply line;a first electrode over the third insulating film, wherein the first electrode is configured to be supplied with a current from the current supply line through the thin film transistor;an organic light emitting layer over the first electrode; anda second electrode over the organic light emitting layer,wherein the gate electrode of the thin film transistor includes an extending portion which extends in parallel with and overlaps with the current supply line to form a capacitor. 2. The display device according to claim 1, wherein the second insulating film comprises silicon nitride. 3. The display device according to claim 1, wherein a channel forming region of the thin film transistor comprises silicon. 4. The display device according to claim 1, wherein the channel forming region comprises crystalline silicon. 5. The display device according to claim 1, wherein the thin film transistor has a top gate structure. 6. A display device comprising: a first thin film transistor comprising a gate electrode, wherein the gate electrode is formed on a first insulating film;a second thin film transistor comprising a gate electrode connected to a gate wiring line, wherein the gate electrode of the second thin film transistor and the gate wiring line are formed on the first insulating film;a second insulating film over the first thin film transistor and the second thin film transistor;a current supply line over the second insulating film, wherein the current supply line is electrically connected to the first thin film transistor;a source wiring line over the second insulating film, the source wiring line being electrically connected to one of a source and a drain of the second thin film transistor;a conductive layer over the second insulating film, wherein the gate electrode of the first thin film transistor is electrically connected to the other of the source and the drain of the second thin film transistor through the conductive layer;a third insulating film over the current supply line, the source wiring line, and the conductive layer;a first electrode over the third insulating film, wherein the first electrode is configured to be supplied with a current from the current supply line through the first thin film transistor;an organic light emitting layer over the first electrode; anda second electrode over the organic light emitting layer,wherein the gate electrode of the first thin film transistor includes an extending portion which extends in parallel with and overlaps with the current supply line to form a capacitor. 7. The display device according to claim 6, wherein the second insulating film comprises silicon nitride. 8. The display device according to claim 6, wherein a channel forming region of the first thin film transistor comprises silicon and a channel forming region of the second thin film transistor comprises silicon. 9. The display device according to claim 6, wherein a channel forming region of the first thin film transistor comprises crystalline silicon and a channel forming region of the second thin film transistor comprises crystalline silicon. 10. The display device according to claim 6, wherein each of the first thin film transistor and the second thin film transistor has a top gate structure. 11. The display device according to claim 6, wherein the second thin film transistor has a multi-gate structure. 12. A display device comprising: a thin film transistor comprising a gate electrode, wherein the gate electrode is formed on a first insulating film;a second insulating film over the thin film transistor;a current supply line over the second insulating film, wherein the current supply line is electrically connected to the thin film transistor;a third insulating film comprising resin over the current supply line;a first electrode over the third insulating film, wherein the first electrode is configured to be supplied with a current from the current supply line through the thin film transistor;an organic light emitting layer over the first electrode; anda second electrode over the organic light emitting layer,wherein the gate electrode of the thin film transistor includes an extending portion which extends in parallel with and overlaps with the current supply line to form a capacitor. 13. The display device according to claim 12, wherein the second insulating film comprises silicon nitride. 14. The display device according to claim 12, wherein a channel forming region of the thin film transistor comprises silicon. 15. The display device according to claim 12, wherein the channel forming region comprises crystalline silicon. 16. The display device according to claim 12, wherein the thin film transistor has a top gate structure. 17. A display device comprising: a substrate;a thin film transistor comprising a gate electrode, wherein the gate electrode is formed on a first insulating film;a second insulating film over the thin film transistor;a current supply line over the second insulating film, wherein the current supply line is electrically connected to the thin film transistor;a third insulating film over the current supply line;a first electrode over the third insulating film, wherein the first electrode is configured to be supplied with a current from the current supply line through the thin film transistor;an organic light emitting layer over the first electrode;a second electrode over the organic light emitting layer;a cover member over the second electrode and attached to the substrate with a sealing material interposed between the substrate and the cover member, the sealing material disposed to surround a pixel portion of the display device; anda filling material comprising a resin between the substrate and the cover member to cover at least the second electrode, the filling material including a drying agent. 18. The display device according to claim 17, wherein the cover member comprises plastic. 19. The display device according to claim 17, wherein the cover member comprises glass. 20. The display device according to claim 17, wherein the drying agent comprises barium oxide. 21. The display device according to claim 17, wherein the filling material comprises a cured resin. 22. The display device according to claim 17, wherein the second insulating film comprises silicon nitride. 23. The display device according to claim 17, wherein a channel forming region of the thin film transistor comprises silicon. 24. The display device according to claim 17, wherein the channel forming region comprises crystalline silicon. 25. The display device according to claim 17, wherein the thin film transistor has a top gate structure.