System for removing unwanted contaminates from gases
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-053/14
B01D-047/02
B01D-047/00
B01D-047/14
F02M-017/28
F02M-029/04
C10J-001/10
F24F-003/14
출원번호
US-0191815
(2011-07-27)
등록번호
US-8337604
(2012-12-25)
발명자
/ 주소
St. Amant, Jefferey
Matheson, Kenneth R.
Nathan, Keith
출원인 / 주소
Vapor Point, LLC
대리인 / 주소
Buskop Law Group, PC
인용정보
피인용 횟수 :
3인용 특허 :
13
초록▼
A system for removing unwanted contaminates from gases using a scrubber, which comprises a housing, a reaction chamber having a liquid level, an inlet connected to a source containing gases to be scrubbed with a contamination concentration greater than zero ppb to saturation. A gas exit port connect
A system for removing unwanted contaminates from gases using a scrubber, which comprises a housing, a reaction chamber having a liquid level, an inlet connected to a source containing gases to be scrubbed with a contamination concentration greater than zero ppb to saturation. A gas exit port connected to the housing is used for evacuating scrubbed gas and a sintered permeable membrane is disposed across the reaction chamber, which provides a reaction zone in the plurality of pores when gases to be scrubbed are introduced to the membrane on a first side while the membrane is immersed in the lean liquid; and a cleaned gas on a second side wherein the clean gas initially has a drop in contamination concentration of at least 99 percent and gradually decreasing to 70 percent as additional gases to be scrubbed are introduced to the plurality of pores without replacing the lean liquid.
대표청구항▼
1. A system for removing unwanted contaminates from gases, wherein the system comprises: a. a source containing gases to be scrubbed, wherein the gases to be scrubbed have a contamination concentration greater than zero ppb to contamination saturation; andb. a scrubber comprising: (i) a housing with
1. A system for removing unwanted contaminates from gases, wherein the system comprises: a. a source containing gases to be scrubbed, wherein the gases to be scrubbed have a contamination concentration greater than zero ppb to contamination saturation; andb. a scrubber comprising: (i) a housing with a reaction chamber, wherein a portion of the reaction chamber contains a lean liquid, and wherein a reaction zone is formed below a liquid level of the lean liquid;(ii) an inlet in the housing connected to the source, and wherein the inlet is disposed below the liquid level of the lean liquid; and(iii) a gas exit port connected to the housing adapted for evacuating scrubbed gas; a sintered permeable membrane disposed in the reaction zone, wherein the sintered permeable membrane is configured to contact gases to be scrubbed that have been in prior contact with the lean liquid in a portion of the reaction chamber, and wherein the sintered permeable membrane provides an interface for enhanced contact of the gases to be scrubbed and the lean liquid, and wherein the sintered permeable membrane is sandwiched between two pad grids, wherein the pad grids secure the sintered permeable membrane in the housing, and wherein the sintered permeable membrane comprises open spaces that are from 40 percent to 50 percent, and wherein the sintered permeable comprises a member of the group consisting of: ceramic, carbon steel, other steel alloys, copper, copper alloys, carbide gel, other carbide materials, carbide films, polyamides, tungsten, polypropylene, carbon aerogels, ferrite magnets, silicon, polyethylene, polybutylene, homopolymers and copolymers thereof, acetates, glass, silica, and combinations of these materials. 2. The system of claim 1, wherein the sintered permeable membrane comprises pores with different pore sizes. 3. The system of claim 1, wherein the housing further comprises a drain port disposed through the housing communicating with the reaction zone. 4. The system of claim 3, further comprising a drain valve for controlling flow from the drain port disposed between the housing and a collection tank. 5. The system of claim 1, wherein the lean liquid comprises a liquid adsorbent, a liquid solubilizer, a liquid absorbent, a liquid reacting agent, water, surfactants, or combinations thereof. 6. The system of claim 1, wherein the contaminates comprise volatile organic compounds, hazardous air pollutants, hydrogen sulfides, ammonia, sulfur dioxide and combinations thereof. 7. The system of claim 1, wherein the housing further comprises a liner within the housing surrounding the reaction zone. 8. The system of claim 1, further comprising an exit conduit connected to the gas exit port. 9. The system of claim 8, further comprising a knock out canister disposed between the exit conduit and a vent. 10. The system of claim 1, further comprising a pedestal for supporting the scrubber, wherein the pedestal comprises a pedestal access port connecting to a drain port located on the housing. 11. The system of claim 1, further comprising a manway disposed in the housing for providing access to the reaction chamber. 12. The system of claim 1, further comprising an inlet check valve to control the flow of gases to be scrubbed through the inlet.
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이 특허에 인용된 특허 (13)
Miller,Charles K., Apparatus and method for removing volatile organics from vented gases.
Wintering Joseph G. (683 Clover Rd. Wauconda IL 60084) Werle William C. (342 N. Arsenal St. Indianapolis IN 46201), Effluent cleansing method and device.
Sanyal Sugata (Somerset NJ) Love Timothy P. (Flemington NJ) DeFilippi Louis J. (Mt. Prospect IL), Process and apparatus for removal of organic pollutants from waste water.
Alex Philip Vogel ZA; Andre Peter Steynberg ZA; Peter Jacobus Van Berge ZA, Process for producing liquid and, optionally, gaseous products from gaseous reactants.
Wang Lawrence K. (Latham NY) Hrycyk Orest (Syracuse NY) Kurylko Lubomyr (New Providence NJ), Removal of volatile compounds and surfactants from liquid.
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