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Provided are a source gas supply unit capable of supplying a constant amount of source gas to a deposition chamber to deposit a uniform layer, and a deposition apparatus and method using the same. The source gas supply unit includes a canister in which a source is stored, a heater heating the canist

Provided are a source gas supply unit capable of supplying a constant amount of source gas to a deposition chamber to deposit a uniform layer, and a deposition apparatus and method using the same. The source gas supply unit includes a canister in which a source is stored, a heater heating the canister, a source gas supply pipe provided on one side of the canister, a measuring unit installed on the source gas supply pipe and measuring an amount of source gas passing through the source gas supply pipe, and a temperature controller connected to the heater and the measuring unit. The temperature controller controls the heater based on the amount of the source gas measured by the measuring unit.

대표청구항 ▼

1. A source gas supply unit comprising: a canister in which a source is stored in liquid form;a heater which heats the canister to produce a source gas from the source stored in the canister;a source gas supply pipe to receive the source gas from the canister;a measuring unit installed on the source

1. A source gas supply unit comprising: a canister in which a source is stored in liquid form;a heater which heats the canister to produce a source gas from the source stored in the canister;a source gas supply pipe to receive the source gas from the canister;a measuring unit installed on the source gas supply pipe and which directly measures the flow rate of the source gas through the source gas supply pipe;a temperature controller which controls the heater based on the amount of the source gas measured by the measuring unit such that the pressure in the canister is sufficient to force the source gas into the source gas supply pipe without injecting a carrier gas into the canister; anda source supply connected to the canister and configured to maintain a substantially constant amount of the source in the canister. 2. The source gas supply unit according to claim 1, further comprising: a valve which selectively opens and closes the source gas supply pipe. 3. The source gas supply unit according to claim 1, wherein the heater is integrally installed on the canister. 4. The source gas supply unit according to claim 1, wherein the heater is installed on at least a portion of the canister. 5. The source gas supply unit according to claim 4, wherein the heater is installed on the entire surface of the canister. 6. The source gas supply unit according to claim 1, wherein the heater is installed on a lower and/or lateral surface of the canister. 7. The source gas supply unit according to claim 1, wherein the heater includes at least one of a lamp heater and a coil heater. 8. The source gas supply unit according to claim 1, wherein the source gas supply pipe extends from a part of the canister. 9. The source gas supply unit according to claim 1, wherein the heater is detachably connected to the canister. 10. A deposition apparatus comprising: a source gas supply unit which supplies a source gas, the source gas supply unit comprising:a canister in which a source is stored in liquid form,a source supply connected with the canister and configured to maintain a substantially constant amount of the source in the canister,a heater which heats the canister to produce a source gas from the source stored in the canister,a source gas supply pipe to receive the source gas from the canister,a measuring unit installed on the source gas supply pipe and which directly measures the flow rate of the source gas through the source gas supply pipe, anda temperature controller which controls the heater based on the amount of the source gas measured by the measuring unit such that the pressure in the canister is sufficient to force the source gas into the source gas supply pipe without injecting a carrier gas into the canister;a carrier gas supply which supplies a carrier gas; anda deposition chamber which receives the supplied source and carrier gases to perform a deposition process. 11. The deposition apparatus according to claim 10, further comprising: a first pipe which connects the carrier gas supply with the source gas supply unit and through which the carrier gas is supplied; anda second pipe connecting the deposition chamber with the source gas supply unit and through which a mixture of the supplied carrier gas and the supplied source gas is supplied to the deposition chamber. 12. The deposition apparatus according to claim 11, wherein the first pipe connects the carrier gas supply with the source gas supply pipe of the source gas supply unit, and the second pipe connects the deposition chamber with the source gas supply pipe of the source gas supply unit. 13. The deposition apparatus according to claim 12, further comprising a joint which connects the first pipe, the source gas supply pipe, and the second pipe, the joint having a shape of a venturi tube to prevent the carrier gas from flowing into the source gas supply pipe. 14. The deposition apparatus according to claim 11, further comprising a first valve which selectively opens and closes the first pipe, and a second valve which selectively opens and closes the second pipe. 15. The deposition apparatus according to claim 11, wherein: the deposition chamber includes:a chamber body providing a space where a deposition process is carried out,a susceptor disposed at an inner lower portion of the chamber body and which supports a substrate on which the source is deposited during the deposition process, anda shower head disposed at an inner upper portion of the chamber body opposite to the susceptor, and which is connected to the second pipe so as to introduce the mixture of the supplied carrier gas and the supplied source gas into the chamber body. 16. The deposition apparatus according to claim 10, wherein the source gas supply unit further includes:a valve which selectively opens and closes the source gas supply pipe. 17. The deposition apparatus according to claim 10, wherein the heater is integrally installed on the canister. 18. The deposition apparatus according to claim 10, wherein the heater is installed on a part of the canister. 19. The deposition apparatus according to claim 18, wherein the heater is installed on the entire surface of the canister. 20. The deposition apparatus according to claim 10, wherein the heater is installed on a lower and/or lateral surface of the canister. 21. The deposition apparatus according to claim 10, wherein the heater includes at least one of a lamp heater and a coil heater. 22. The deposition apparatus according to claim 10, wherein the source gas supply pipe extends from a part of the canister. 23. The deposition apparatus according to claim 10, wherein the heater is detachably installed on the canister. 24. A source gas supply control system for use in a deposition processes performed in a deposition chamber, the control system comprising: a canister to house a source in liquid form;a heater disposed on the canister to heat the source to produce a source gas;a source supply connected to the canister to maintain a substantially constant amount of the source in the canister;a source gas supply pipe to receive the source gas from the canister;a measuring unit installed on the source gas supply pipe and which directly measures the flow rate of the source gas produced by the heater and which will be mixed with a carrier gas for use in deposition of the source gas in the deposition chamber; anda temperature controller which controls the heater based on the amount of the source gas measured by the measuring unit such that the pressure in the canister is sufficient to ensure a predetermined amount of the source gas is forced out of the canister without injecting a carrier gas into the canister. 25. The source gas supply control system according to claim 24, wherein: if the measured amount is below a predetermined level, the temperature controller controls the heater to increase the heat heating the source, andif the measured amount is above the predetermined level, the temperature controller controls the heater to decrease the heat heating the source.