초록 ▼

An arcless, atmospheric-pressure plasma generating apparatus capable of producing a large-area, temperature-controlled, stable discharge at power densities between about 0.1 W/cm3 and about 200 W/cm3, while having an operating gas temperature of less than 50° C., for processing materials outside of

An arcless, atmospheric-pressure plasma generating apparatus capable of producing a large-area, temperature-controlled, stable discharge at power densities between about 0.1 W/cm3 and about 200 W/cm3, while having an operating gas temperature of less than 50° C., for processing materials outside of the discharge, is described. The apparatus produces active chemical species, including gaseous metastables and radicals which may be used for polymerization (either free radical-induced or through dehydrogenation-based polymerization), surface cleaning and modification, etching, adhesion promotion, and sterilization, as examples. The invention may include either a cooled rf-driven electrode or a cooled ground electrode, or two cooled electrodes, wherein active components of the plasma may be directed out of the plasma and onto an external workpiece without simultaneously exposing a material to the electrical influence or ionic components of the plasma.

대표청구항 ▼

1. Apparatus for atmospheric-pressure plasma discharge processing of material, comprising in combination: a first electrode having a planar surface not covered with dielectric material;a plurality of spaced-apart parallel tubes not covered with dielectric material forming a second planar electrode,

1. Apparatus for atmospheric-pressure plasma discharge processing of material, comprising in combination: a first electrode having a planar surface not covered with dielectric material;a plurality of spaced-apart parallel tubes not covered with dielectric material forming a second planar electrode, each tube of said plurality of tubes having an outer surface spaced apart a first chosen distance from the surface of said first electrode, and a second chosen distance from the outer surface of an adjacent tube thereto;an rf power supply in electrical contact with either of said first electrode or each tube of said plurality of tubes for providing rf power to said first electrode or to each tube of said plurality of tubes, the unpowered electrode of said first electrode or each tube of said plurality of tubes being placed in electrical contact with a ground electrical potential;means for cooling each tube of said plurality of tubes to a chosen temperature;means for flowing a gas into the space between said first electrode and said second electrode and out of the space between said first electrode and said second electrode between the spaced-apart outer surfaces of each tube of said plurality of tubes; andmeans for moving said material at a third chosen distance from and parallel to said second electrode on the opposite side of said second electrode from the flat surface of said first electrode;whereby an atmospheric pressure plasma is generated between said first electrode and said second electrode. 2. The plasma discharge processing apparatus of claim 1, wherein a hollow cathode effect is produced between the spaced-apart outer surfaces of adjacent tubes of said plurality of tubes. 3. The plasma discharge processing apparatus of claim 1, wherein each of said plurality of tubes is placed in electrical contact with a ground electrical potential. 4. The plasma discharge processing apparatus of claim 1, wherein each tube of said plurality of tubes has a circular or oval cross section. 5. The plasma discharge processing apparatus of claim 1, wherein the gas flows through the flat surface of said first electrode before entering the space between said first electrode and said second electrode. 6. The plasma discharge processing apparatus of claim 5, wherein at least one open channel is provided in the surface of said first electrode out of which the gas exits the flat surface of said first electrode, dimensions of the at least one open channel being chosen such that no electric discharge takes place in the region of the at least one open channel and said second electrode. 7. The plasma processing discharge apparatus of claim 1, wherein means are provided for cooling said first electrode to a chosen temperature such that the gas temperature is less than 50° C. 8. The plasma discharge processing apparatus of claim 1, wherein the gas comprises between approximately 85% and approximately 100% of helium. 9. The plasma discharge processing apparatus of claim 8, wherein the gas further comprises selected quantities of NH3 or Ar. 10. The plasma discharge processing apparatus of claim 1, wherein plasma discharge processing comprises plasma polymerization of monomers condensed on said material. 11. A method for atmospheric-pressure plasma discharge processing of material, comprising the steps of: flowing a gas into the space between a first electrode having a planar surface not covered with dielectric material, and a plurality of parallel, spaced-apart tubes not covered with dielectric material, forming a second planar electrode, each tube in the plurality of tubes having an outer surface spaced apart a first chosen distance from the planar surface of the first electrode, the outer surface of each tube of the plurality of tubes further being spaced apart a second chosen distance from the outer surface of an adjacent tube thereto, and out of the space between the first electrode and the second electrode between the spaced-apart outer surfaces of each tube of the plurality of tubes;cooling each tube of the plurality of tubes;forming a plasma discharge between the first electrode and the second electrode, one of the first or the second electrodes being powered using an rf power supply, the unpowered electrode being placed in electrical connection with ground potential; andmoving the material at a third chosen distance from and parallel to the second electrode on the other side of said second electrode from the flat surface of the first electrode. 12. The method of claim 11, wherein a hollow cathode effect is produced between the spaced-apart outer surfaces adjacent tubes of the plurality of the tubes. 13. The method of claim 11, wherein each of the tubes of the plurality of tubes is placed in electrical contact with a ground electrical potential. 14. The method of claim 11, wherein each tube in the plurality of tubes has a circular or oval cross section. 15. The method of claim 11, wherein the gas flows through the flat surface of the first electrode before entering the space between the first electrode and the second electrode. 16. The method of claim 15, wherein at least one open channel is provided in the surface of the first electrode out of which the gas exits the flat surface of the first electrode, dimensions of the at least one open channel being chosen such that no electric discharge takes place in the region of the at least one open channel and the second electrode. 17. The method of claim 11, wherein the gas comprises between approximately 85% and approximately 100% of helium. 18. The method of claim 17, wherein the gas further comprises selected quantities of NH3 or Ar. 19. The method of claim 11, wherein the plasma discharge processing comprises plasma polymerization of monomers condensed on the laminar material. 20. The method of claim 11, further comprising the step of cooling the first electrode to a chosen temperature such that the gas temperature is less than 50° C.