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A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series

A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series comprising a plurality of gas processing units arranged in series on a gas flow channel; and a control section for controlling the operation of each unit of plasma equipment of the plasma equipment series. Each of the units of plasma equipment comprises a cavity composed of an electrical conductor and communicated with the gas flow channel; a plasma generator for generating plasma within the cavity; and microwave radiator for radiating microwaves to the plasma generated by the plasma starting section. The control section selects the number of units of plasma equipment to operate according to a component of the introduced gas.

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1. A gas processing apparatus using plasma; the gas processing apparatus comprising: a plasma equipment series having a plurality of units of plasma equipment arranged in series on a gas flow channel; anda controller that controls the plurality of controlling the operation of each of the units of pl

1. A gas processing apparatus using plasma; the gas processing apparatus comprising: a plasma equipment series having a plurality of units of plasma equipment arranged in series on a gas flow channel; anda controller that controls the plurality of controlling the operation of each of the units of plasma equipment of the plasma equipment series;wherein each of the plurality of units of plasma equipment has a plasma generator for generating plasma within a reaction chamber communicated with the gas flow channel; and an electromagnetic wave radiator for radiating electromagnetic waves to the plasma generated by the plasma generator;wherein the controller selects the number of the plurality of units of plasma equipment to operate according to a component of the introduced gas,wherein the reaction chamber is communicated with the gas flow channel via a bundled plurality of pipes made of an electrical conductor wherein the bundled plurality of pipes is supported by a support panel, and the bundled plurality of pipes on said support panel form a cavity in the reaction chamber, andwherein the inside diameter of each of the bundled plurality of pipes is less than about ¼ th the wavelength of the electromagnetic waves, and the length of each of the bundled plurality of pipes is about ¼ th or more of the wavelength, for preventing the electromagnetic waves from escaping from said cavity. 2. The gas treatment device according to claim 1, wherein the plasma generator breaks bonds between carbon atoms and other atoms. 3. The gas processing apparatus according to claim 1, wherein the plasma generator breaks the bond of a carbon compound having at least one carbon-to-carbon bond and causes oxygen to bond where the carbon-to-carbon bond was broken. 4. The gas treatment device according to claim 3, wherein a unit of plasma equipment positioned farthest upstream in the gas flow channel among operating ones of the plurality of units of plasma equipment modifies the component having an aromatic six-member ring into an oxygen-containing organic compound. 5. The gas processing apparatus according to claim 1, wherein the controller activates two or more of the plurality of units of plasma equipment of the plasma equipment series when gas comprising a component having an aromatic six-member ring is conducted through the flow channel. 6. The gas processing apparatus according to claim 1, wherein three or more of the plurality of units of plasma equipment in the plasma equipment series are activated when gas containing a dioxin is conducted through the flow channel. 7. The gas treatment device according to claim 1, further comprising: a cavity for surrounding the reaction chamber;wherein the cavity comprises a wire mesh, prevents the escape of electromagnetic waves radiated by the electromagnetic wave radiator, and forms a resonance cavity for the electromagnetic waves. 8. The gas processing apparatus according to claim 1, wherein the controller selects the radiation time for the electromagnetic waves radiated by the electromagnetic wave radiator according to a component of the introduced gas. 9. The gas processing apparatus according to claim 1, further comprising: a humidity adjuster adjusting the moisture content in a gas flow channel further upstream than the plasma equipment. 10. The as processing apparatus according to claim 1, further comprising: a moisture addition portion introducing moisture into a gas flow channel further upstream than the unit of plasma equipment that has the electromagnetic wave radiator when the controller selects a time of 1 microsecond or less for the radiation time of electromagnetic waves by the electromagnetic wave radiator. 11. The gas processing apparatus according to claim 1, further comprising: an air curtain forming portion forming an air curtain for surrounding the periphery of the region in which gas is present and extending to the region in which plasma is generated by the plasma equipment. 12. The gas treatment device according to claim 1, wherein the number of the plurality of units of plasma equipment activated is increased when the quantity of the component reaches a predetermined reference quantity; andwherein a decision as to whether the quantity of the component has reached the reference quantity is made based on the flow rate of the gas or based on the concentration of the gas. 13. The gas processing apparatus according to claim 1, wherein when two or more of the plurality of units of plasma equipment are activated, the timing at which each unit of plasma equipment is activated is determined based on the difference in the time at which the gas reaches each unit of plasma equipment. 14. The gas processing apparatus according to claim 1, wherein a multiphase flow in which solid or liquid particles are mixed occurs in the gas; andthe controller selects, according to the particles, the number of the plurality of units of plasma equipment activated. 15. The gas processing apparatus according to claim 1, wherein the gas flow channel is divided into another flow channel in between the plasma generators. 16. The gas processing apparatus according to claim 1, wherein the gas flow channel is merged with another flow channel in between the plasma generators. 17. The as processing apparatus according to claim 1, wherein the plasma equipment performs self cleaning of the inside of the reaction chamber by being activated. 18. A gas processing system comprising: a plurality of the gas processing apparatuses according to claim 1;wherein the plurality of units of the plasma equipment are arranged in a matrix or staggered lattice on the gas flow channel.