초록 ▼

Embodiments of the present invention generally provide an inductively coupled plasma (ICP) reactor having a substrate RF bias that is capable of control of the RF phase difference between the ICP source (a first RF source) and the substrate bias (a second RF source) for plasma processing reactors us

Embodiments of the present invention generally provide an inductively coupled plasma (ICP) reactor having a substrate RF bias that is capable of control of the RF phase difference between the ICP source (a first RF source) and the substrate bias (a second RF source) for plasma processing reactors used in the semiconductor industry. Control of the RF phase difference provides a powerful knob for fine process tuning. For example, control of the RF phase difference may be used to control one or more of average etch rate, etch rate uniformity, etch rate skew, critical dimension (CD) uniformity, and CD skew, CD range, self DC bias control, and chamber matching.

대표청구항 ▼

1. A matched plasma reactor, comprising: a vacuum chamber;a first RF source for providing a first radio frequency (RF) signal at a first frequency that is inductively coupled to the vacuum chamber; anda second RF source for providing a second RF signal at the first frequency to an electrode disposed

1. A matched plasma reactor, comprising: a vacuum chamber;a first RF source for providing a first radio frequency (RF) signal at a first frequency that is inductively coupled to the vacuum chamber; anda second RF source for providing a second RF signal at the first frequency to an electrode disposed proximate to and beneath a substrate to be biased;wherein the first and second RF sources provide respective signals having a first phase difference that is preset to match a second phase difference of a second plasma reactor to which the plasma reactor is matched. 2. A semiconductor processing system, comprising: a first plasma reactor having an inductively coupled source RF generator and a bias RF generator that provide respective signals at a common frequency offset by a first phase difference;a second plasma reactor having an inductively coupled source RF generator and a bias RF generator that provide respective signals at a common frequency offset by a second intrinsic phase difference different than a first intrinsic phase difference of the source and bias RF generators of the first plasma reactor, the second plasma reactor further having a phase adjustment circuit for altering the second intrinsic phase difference to a desired second phase difference; andwherein the second phase difference is set to a predetermined offset from the first phase difference. 3. The semiconductor processing system of claim 2, wherein the second phase difference is preconfigured via the phase adjustment circuit to correspond with the first phase difference. 4. The semiconductor processing system of claim 2, further comprising: a controller configured to receive a first input representing the first phase difference and a second input representing the second phase difference and to calculate a phase offset between the first phase difference and the second phase difference. 5. The semiconductor processing system of claim 2, further comprising: a controller configured to control the phase adjustment circuit to apply a phase offset to the second phase difference to cause the second phase difference to equal the first phase difference. 6. The semiconductor processing system of claim 5, wherein the first phase difference is equal to the first intrinsic phase difference. 7. The semiconductor processing system of claim 5, wherein the first phase difference is different than the first intrinsic phase difference. 8. A method of controlling the phase difference of inductively coupled plasma reactors, comprising: providing a first plasma reactor including a source and a bias RF generator coupled thereto that provide RF signals at a common frequency and that have a first phase difference between the source and the bias RF generators;providing a second plasma reactor including a source and a bias RF generator coupled thereto that provide RF signals at a common frequency and that have a second phase difference between the source and the bias RF generators;comparing the first and second phase differences to calculate a third phase difference therebetween; andadjusting the third phase difference to equal a desired third phase difference. 9. The method of claim 8, further comprising: determining a first intrinsic phase difference between the source and the bias RF generators of the first plasma reactor;determining a second intrinsic phase difference between the source and the bias RF generators of the second plasma reactor; andadjusting the second intrinsic phase difference of the second plasma reactor to obtain the desired third phase difference. 10. The method of claim 9, wherein the desired third phase difference is about zero. 11. The method of claim 10, further comprising: adjusting a phase difference of the first plasma reactor to a value different than the first intrinsic phase difference. 12. The method of claim 9, wherein the desired third phase difference is a non-zero value. 13. The method of claim 12, further comprising: adjusting a phase difference of the first plasma reactor to a value different than the first intrinsic phase difference. 14. The method of claim 9, wherein: determining the first intrinsic phase offset comprises measuring VDC of a substrate during a process in a first plasma reactor with a phase adjustment circuit at multiple positions between zero and 360 degrees of phase adjustment; anddetermining the second intrinsic phase offset comprises measuring VDC of a substrate during a process in a second plasma reactor with a phase adjustment circuit at multiple positions between zero and 360 degrees of phase adjustment; andcalculating the third phase difference comprises comparing resultant plots of VDC measurements to determine the third phase difference between the first and the second plasma reactors. 15. The method of claim 8, wherein the first plasma reactor is disposed in a location remote from the second plasma reactor. 16. A method of controlling a process in an inductively coupled plasma reactor, comprising: monitoring a parameter including at least one of VDC, voltage, current, and/or voltage/current phase as measured via the cathode, etch rate, etch rate uniformity, etch rate skew, critical dimension (CD) uniformity, CD skew, or CD range; andmodifying a first phase difference between a source RF generator and a bias RF generator that provide RF signals at a common frequency to the inductively coupled plasma reactor in response to the monitored parameter. 17. The method of claim 16, further comprising: modifying the first phase difference to equal a predetermined desired phase difference. 18. The method of claim 16, further comprising: modifying the first phase difference in accordance with a predetermined correlation between the phase difference between the source RF generator and the bias RF generator and the parameter being monitored. 19. The method of claim 18, wherein the parameter being monitored is VDC and wherein the predetermined correlation between the phase difference and the parameter being monitored is further correlated to a desired process result. 20. The method of claim 16, further comprising: continually or periodically monitoring the parameter over time and modifying the first phase difference in response to the monitored parameter to compensate for process drift.