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The subject of the invention is a transparent substrate (6) having at least one antireflection coating, made from a film (A) comprising multiple thin layers of alternately high and low refractive indexes. The multilayer film comprises, in succession, a high-index first layer (1), having a refractive

The subject of the invention is a transparent substrate (6) having at least one antireflection coating, made from a film (A) comprising multiple thin layers of alternately high and low refractive indexes. The multilayer film comprises, in succession, a high-index first layer (1), having a refractive index n1 of between 1.8 and 2.3 and a geometrical thickness e1 of between 5 and 50 nm, a low-index second layer (2), having a refractive index n2 of between 1.30 and 1.70 and a geometrical thickness e2 of between 5 and 50 nm, a high-index third layer (3), having a refractive index n3 of between 1.8 and 2.3 and a geometrical thickness e3 of at least 100 nm, and a low-index fourth layer (4), having a refractive index n4 of between 1.30 and 1.70 and a geometrical thickness e4 of at least 80 nm. This antireflection coating can be used in solar modules.

대표청구항 ▼

1. A transparent glass substrate comprising a material having a surface coated with an antireflective coating, wherein the antireflective coating can undergo heat treatment, and wherein the antireflective coating comprises: (i) a high-index first layer comprising zinc-tin mixed oxide of the zinc sta

1. A transparent glass substrate comprising a material having a surface coated with an antireflective coating, wherein the antireflective coating can undergo heat treatment, and wherein the antireflective coating comprises: (i) a high-index first layer comprising zinc-tin mixed oxide of the zinc stannate type and having a first refractive index, n1, of between 1.8 and 2.3 and a first geometrical thickness, e1, of between 5and 50 nm;(ii) a low-index second layer comprising SiO2 and having a second refractive index, n2, of between 1.30 and 1.70 and a second geometrical thickness, e2, of between 5 and 50 nm;(iii) a high-index third layer comprising zinc-tin mixed oxide of the zinc stannate type and having a third refractive index, n3, of between 1.8 and 2.3 and a third geometrical thickness, e3, of at least 100 nm;(iv) a low-index fourth layer comprising SiO2 and having a fourth refractive index, n4, of between 1.30 and 1.70 and a fourth geometrical thickness, e4, of at least 80 nm. 2. The transparent substrate of claim 1, wherein at least one of the first refractive index, n1, or the third refractive index, n3, is between 1.85 and 2.15. 3. The transparent substrate of claim 1, wherein at least one of the second refractive index, n2, or the fourth refractive index, n4, is between 1.35and 1.55. 4. The transparent substrate of claim 1, wherein the first geometrical thickness, e1, is between 10 and 30 nm. 5. The substrate of claim 1, wherein the second geometrical thickness, e2, is between 15 and 45 nm. 6. The transparent substrate of claim 1, wherein at least one of the high-index first layer or the high-index third layer comprises a superposition of layers. 7. The transparent substrate of claim 1, wherein the transmission integrated over a wavelength range of between 400 and 1100 nm is at least 90%. 8. The transparent substrate of claim 1, wherein the antireflective coating is deposited on the surface of the material by sputtering. 9. The transparent substrate of claim 1, wherein at least one of the first refractive index, n1, or the third refractive index, n3, is between 1.9 and 2.1. 10. The transparent substrate of claim 1, wherein the third geometrical thickness, e3, is at least 130 nm and at least one of the first refractive index, n1, or the third refractive index, n3, is between 1.85 and 2.15. 11. The transparent substrate of claim 1, wherein the third geometrical thickness, e3, is at least 140 nm and at least one of the first refractive index, n1, or the third refractive index, n3, is between 1.9 and 2.1. 12. The transparent substrate of claim 1, wherein the antireflective coating comprises: (i) the high-index first layer overlaying the substrate;(ii) the low-index second layer overlaying the high-index first layer;(iii) the high-index third layer overlaying the low-index second layer;(iv) the low-index fourth layer overlaying the high-index third layer. 13. The transparent substrate of claim 1, wherein the antireflective coating comprises: (i) the high-index first layer in contact with the substrate;(ii) the low-index second layer in contact with the high-index first layer;(iii) the high-index third layer in contact with low-index second layer;(iv) the low-index fourth layer in contact with high-index third layer. 14. A solar module comprising a plurality of Si or CIS solar cells and the transparent substrate of claim 1. 15. A solar module comprising a plurality of Si, CIS, CdTe, a-Si, GaAs or GalnP solar cells and the transparent substrate of claim 1. 16. The solar module of claim 15, having an efficiency, expressed in terms of integrated current density, that is increased by at least 1 percent relative to a solar module that does not include the transparent substrate. 17. The solar module of claim 16, wherein the solar cells are disposed between two glass substrates separated by an interspace and the interspace is filled with a curable polymer. 18. The solar module of claim 15, wherein the solar cells are disposed between two glass substrates separated by an interspace and the interspace is filled with a curable polymer. 19. A solar module comprising a plurality of Si, CIS, CdTe, a-Si, GaAs or GalnP solar cells and a transparent glass substrate comprising a material having a surface coated with an antireflective coating, wherein the antireflective coating comprises: (i) a high-index first layer comprising zinc-tin mixed oxide and of the zinc stannate type having a first refractive index, n1, of between 1.8 and 2.3 and a first geometrical thickness, e1, of between 5 and 50 nm;(ii) a low-index second layer comprising SiO2, and having a second refractive index, n2, of between 1.30 and 1.70 and a second geometrical thickness, e2, of between 5 and 50 nm;(iii) a high-index third layer comprising zinc-tin mixed oxide of the zinc stannate type and having a third refractive index, n3, of between 1.8 and 2.3 and a third geometrical thickness, e3, of at least 100 nm;(iv) a low-index fourth layer comprising SiO2 and having a fourth refractive index, n4, of between 1.30 and 1.70 and a fourth geometrical thickness, e4, of at least 100 nm;wherein the antireflective coating can undergo heat treatment of from 400 to 600° C. and which permits transmission of near infrared radiation.