IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0764021
(2010-04-20)
|
등록번호 |
US-8383735
(2013-02-26)
|
발명자
/ 주소 |
- Willis, Carl Lesley
- Handlin, Jr., Dale Lee
- Trenor, Scott Russell
- Mather, Brian Douglas
|
출원인 / 주소 |
|
인용정보 |
피인용 횟수 :
4 인용 특허 :
47 |
초록
▼
A pre-cursor block copolymer for sulfonation which, prior to hydrogenation, has the general configuration A-B-A, A-B-A-B-A, (A-B-A)nX, (A-B)nX, A-D-B-D-A, A-B-D-B-A, (A-D-B)nX, (A-B-D)nX or mixtures thereof, wherein A, B and D blocks do not contain any significant levels of olefinic unsaturation. Ea
A pre-cursor block copolymer for sulfonation which, prior to hydrogenation, has the general configuration A-B-A, A-B-A-B-A, (A-B-A)nX, (A-B)nX, A-D-B-D-A, A-B-D-B-A, (A-D-B)nX, (A-B-D)nX or mixtures thereof, wherein A, B and D blocks do not contain any significant levels of olefinic unsaturation. Each A and D block is a polymer block resistant to sulfonation, and each B block is a polymer block susceptible to sulfonation. Each A block is a segment of one or more polymerized para-substituted styrene monomers, each B block contains segments of one or more vinyl aromatic monomers selected from polymerized (i) unsubstituted styrene monomers, (ii) ortho-substituted styrene monomers, (iii) meta-substituted styrene monomers, (iv) alpha-methylstyrene, (v) 1,1-diphenylethylene, (vi) 1,2-diphenylethylene and (vii) mixtures thereof, and each D block contains polymers having a glass transition temperature less than 20° C. and a number average molecular weight of between 1,000 and 50,000.
대표청구항
▼
1. A pre-cursor block copolymer for sulfonation which has the general configuration A-D-B-D-A, (A-D-B)nX, or mixtures thereof, where n is an integer from 2 to about 30, and X is a coupling agent residue and wherein: a. each A block is a polymer block resistant to sulfonation, each D block is a polym
1. A pre-cursor block copolymer for sulfonation which has the general configuration A-D-B-D-A, (A-D-B)nX, or mixtures thereof, where n is an integer from 2 to about 30, and X is a coupling agent residue and wherein: a. each A block is a polymer block resistant to sulfonation, each D block is a polymer block resistant to sulfonation, and each B block is a polymer block susceptible to sulfonation, said A, D and B blocks containing no significant levels of olefinic unsaturation;b. each A block independently having a number average molecular weight between 1,000 and 60,000, each D block independently having a number average molecular weight between 1,000 and 50,000, and each B block independently having a number average molecular weight between 10,000 and 300,000;c. each A block is a segment of one or more polymerized para-substituted styrene monomers;d. each B block comprises segments of one or more vinyl aromatic monomers selected from polymerized (i) unsubstituted styrene monomers, (ii) ortho-substituted styrene monomers, (iii) meta-substituted styrene monomers, (iv) alpha-methylstyrene, (v) 1,1-diphenylethylene, (vi) 1,2-diphenylethylene and (vii) mixtures thereof;e. each D block is selected from the group consisting of (i) a polymerized or copolymerized conjugated diene selected from isoprene, 1,3-butadiene having a vinyl content prior to hydrogenation of between 20 and 80 mol percent, (ii) a polymerized acrylate monomer, (iii) silicone polymer, (iv) polymerized isobutylene and (v) mixtures thereof, wherein the selected polymers have a glass transition temperature of less than 20° C. and a number average molecular weight of between 1000 and 50,000, wherein any segments containing polymerized 1,3-butadiene or isoprene are subsequently hydrogenated; andf. the mol percent of vinyl aromatic monomers which are unsubstituted styrene monomers, ortho-substituted styrene monomers, meta-substituted styrene monomers, alpha-methylstyrene, 1,1-diphenylethylene and 1,2-diphenylethylene in each B block is between 10 mol percent and 100 mol percent. 2. The block copolymer according to claim 1, wherein the polymer in said A block further comprises up to 15 mol percent of polymerized monomers selected from (i) unsubstituted styrene monomers, (ii) ortho-substituted styrene monomers, (iii) meta-substituted styrene monomers, (iv) alpha-methylstyrene, (v) 1,1-diphenylethylene, (vi) 1,2-diphenylethylene and (vii) mixtures thereof. 3. The block copolymer according to claim 1, wherein said A block is a segment of one or more polymerized para-substituted styrene monomers selected from para-methylstyrene, para-ethylstyrene, para-n-propylstyrene, para-iso-propylstyrene, para-n-butylstyrene, para-sec-butylstyrene, para-iso-butylstyrene, para-t-butylstyrene, isomers of para-decylstyrene, and isomers of para-dodecylstyrene. 4. The block copolymer according to claim 1, wherein said A block is a polymerized segment of para-t-butylstyrene and said B block is a polymerized segment of unsubstituted styrene. 5. The block copolymer according to claim 1, wherein said A block is a polymerized segment of para-methylstyrene and said B block is a polymerized segment of unsubstituted styrene. 6. The block copolymer according to claim 1, wherein the interior block B is a hydrogenated copolymer of one or more unsubstituted styrene monomers, and monomers of conjugated dienes having a vinyl content of 20 to 80 mol percent prior to hydrogenation. 7. The block copolymer according to claim 1, wherein said D block prior to hydrogenation is polymer block of 1,3-butadiene, and wherein 20 to 80 mol percent of the condensed butadiene units in block D have 1,2-configuration prior to hydrogenation.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.