IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0628576
(2005-06-07)
|
등록번호 |
US-8398753
(2013-03-19)
|
국제출원번호 |
PCT/US2005/020090
(2005-06-07)
|
§371/§102 date |
20070920
(20070920)
|
국제공개번호 |
WO2006/083290
(2006-08-10)
|
발명자
/ 주소 |
- Sergi, John E.
- Gaudreau, John
- Kishkovich, Oleg P.
- Goodwin, William
- Kinkead, Devon A.
|
출원인 / 주소 |
|
대리인 / 주소 |
Hamilton, Brook, Smith & Reynolds, P.C.
|
인용정보 |
피인용 횟수 :
3 인용 특허 :
18 |
초록
▼
The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the
The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.
대표청구항
▼
1. A method for removing contaminants from a gas in a semiconductor processing device, said method comprising the steps of: receiving an input gas in an apparatus comprising a plurality of parallel filter stages disposed within an enclosure, said enclosure including at least one inlet and at least o
1. A method for removing contaminants from a gas in a semiconductor processing device, said method comprising the steps of: receiving an input gas in an apparatus comprising a plurality of parallel filter stages disposed within an enclosure, said enclosure including at least one inlet and at least one outlet;passing said gas through a flow controller, disposed within the enclosure, before making said gas available to the plurality of filter stages, said flow controller including a first edge, and a second edge distal from the panel; andpassing a portion of said gas through each member of said plurality of parallel filter stages to remove at least a portion of said contaminants,the flow controller comprising gas flow channels, said gas flow channels distributed between the first edge and the second edge so that gas flow channel sizes vary between the first edge to the second edge,wherein said flow controller delivers substantially equal volumes of said gas to each member of said plurality of filter stages. 2. The method of claim 1, wherein said flow controller comprises a diffuser plate. 3. The method of claim 2, wherein said apparatus is located in a clean room. 4. The method of claim 3, wherein said plurality of filter stages are arranged in a matrix having at least two rows and two columns. 5. The method of claim 3, wherein each member of said plurality of filter stages is comprised of a plurality of filter modules. 6. The method of claim 5, wherein said apparatus further comprises a plurality of sampling ports for sampling a like plurality of filter stages. 7. The method of claim 6, wherein said apparatus further comprises a detector communicatively coupled to said sampling ports. 8. The method of claim 7, wherein said apparatus further comprises an input sampling port for sampling at least a portion of said gas prior to reaching said plurality of filter stages and an output sampling port for sampling at least a portion of said gas after passing through said plurality of filter stages, said input and output sampling ports further being communicatively coupled to said detector. 9. The method of claim 8, wherein said apparatus further comprises a controller for monitoring operation of said apparatus. 10. The method of claim 9, wherein at least one member of said plurality of filter modules includes a physisorptive filter media. 11. The method of claim 9, wherein at least one member of said plurality of filter modules includes a chemisorptive filter media. 12. The method of claim 1, further including the step of regulating the flow controller to control output of the gas. 13. The method of claim 1, wherein: the enclosure of the apparatus includes a panel comprising the at least one inlet and at least one outlet;the first edge of the flow controller of the apparatus is a top edge, proximal to the panel and the second edge of the flow controller is a bottom edge distal from the panel; andthe gas flow channels of the flow controller of the apparatus being distributed between the top edge and the bottom edge so that gas flow channel sizes increases from the top edge to the bottom edge. 14. An apparatus for removing contaminants from a gas in a semiconductor processing device, the apparatus comprising: an enclosure including at least one inlet and at least one outlet;a plurality of parallel filter stages located within said enclosure for removing at least a portion of said contaminants from said gas flowing therethrough; anda flow controller, disposed in the enclosure, for distributing said gas flow through said parallel filter stages, said flow controller having a first edge and a second edge;the flow controller comprising gas flow channels, said gas flow channels distributed between the first edge and the second edge so that gas flow channel sizes vary between the first edge and the second edge,said flow controller delivering substantially equal volumes of said gas to each member of said plurality of filter stages during a filtration process. 15. The apparatus of claim 14, wherein said flow controller is an active flow controller. 16. The apparatus of claim 14, wherein said flow controller comprises a diffuser plate. 17. The apparatus of claim 16, wherein said apparatus is an air filtration system. 18. The apparatus of claim 17, wherein each member of said plurality of filter stages is comprised of a plurality of filter modules. 19. The apparatus of claim 18, wherein said plurality of filter stages are arranged in a matrix having at least two rows and two columns. 20. The apparatus of claim 18, wherein said contaminants include amines. 21. The apparatus of claim 20, wherein each member of said plurality of filter stages contains a filter module having physisorptive filter media. 22. The apparatus of claim 20, wherein each member of said plurality of filter stages contains a filter module having chemisorptive filter media. 23. The apparatus of claim 22, wherein said chemisorptive filter media comprises an acidic material selected from the group consisting of sulfonated material and carboxylic functional group. 24. The apparatus of claim 14, wherein: the flow controller comprises a diffuser plate having an input face for receiving said gas and an output face for delivering said gas to said plurality of filter stages, andwherein the gas flow channels are a plurality of holes. 25. The apparatus of claim 24, wherein at least a subset of said holes may be operable to be opened for allowing said gas to pass therethrough or may alternatively be closed to prevent said gas from passing therethrough. 26. The apparatus of claim 25, wherein said opening and said closing of said at least a subset of said holes is controlled by a controller. 27. The apparatus of claim 14, wherein each member of said plurality of parallel filter stages includes a plurality of filter modules. 28. The apparatus of claim 27, the apparatus further comprising an input sampling port for sampling said gas prior to passing through said plurality of filter stages, and an output sampling port for sampling said gas after passing at least substantially through said plurality of filter stages. 29. The apparatus of claim 28, the apparatus further comprising a detector communicatively associated with said plurality of sampling ports, said input sampling port and said output sampling port, each sampling port optionally using an aperture with a diameter to provide an outflow of gas. 30. The apparatus of claim 29, the apparatus further comprising a controller for controlling operation of said detector. 31. The apparatus of claim 30, wherein said contaminants include amines. 32. The apparatus of claim 30, wherein at least one member of said plurality of filter modules includes a physisorptive filter media. 33. The apparatus of claim 32, wherein said physisorptive filter media comprises activated carbon. 34. The apparatus of claim 30, wherein at least one member of said plurality of filter modules includes a chemisorptive filter media. 35. The apparatus of claim 34, wherein said chemisorptive filter media comprises an acidic material. 36. The apparatus of claim 35, wherein said acidic material comprises a sulfonated material. 37. The apparatus of claim 36, wherein said acidic material comprises a carboxylic functional group. 38. The apparatus of claim 28, wherein at least one sampling port is coupled to a concentrator that accumulates a contaminant. 39. The apparatus of claim 14, wherein the flow controller is regulated to control output of the gas. 40. The apparatus of claim 14, wherein: the enclosure includes a panel, the panel including the at least one inlet and at least one outlet;the first edge of the flow controller is a top edge proximal to the panel and the second edge of the flow controller is a bottom edge, distal from the panel; andthe gas flow channels of the flow controller being distributed between the top edge and the bottom edge so that gas flow channel sizes increase from the top edge to the bottom edge.
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