초록

A lithography apparatus (10) is disclosed using extreme UV radiation and having a hydrocarbon sorbing member comprising a getter material arranged in the process chamber (13) of said apparatus.

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1. An extreme UV radiation lithography apparatus comprising a vacuum process chamber comprising a support on which a polymeric film is adapted to be located, anda Volatile Organic Compounds (VOCs) sorbing member comprising a getter material, the VOCs sorbing member sorbing, in use, organic molecules

1. An extreme UV radiation lithography apparatus comprising a vacuum process chamber comprising a support on which a polymeric film is adapted to be located, anda Volatile Organic Compounds (VOCs) sorbing member comprising a getter material, the VOCs sorbing member sorbing, in use, organic molecules from the polymeric film upon exposure of the polymeric film to radiation, wherein:the getter material is arranged in the vacuum process chamber or in a suitable space connected thereto by way of a suitable opening,the VOCs sorbing member is proximate to the support in the vacuum process chamber, and the support is arranged substantially perpendicular to a path of UV radiation impinging, during use, on the polymeric film to locally sensitize the polymeric film, and said VOCs sorbing member is a getter pump having the shape of a hollow container arranged in the vacuum process chamber coaxially to UV radiation and proximate to a polymeric film to be sensitized by the UV radiation. 2. The apparatus according to claim 1, wherein said hollow container is cylindrically shaped. 3. The apparatus according to claim 2, wherein said getter pump is comprised of a cylindrical frame inside which a plurality of perforated discs made of a getter material are present. 4. The apparatus according to claim 2, wherein said getter pump is comprised of a cylindrical frame inside which a plurality of radially arranged planar members made of a getter material are present. 5. The apparatus according to claim 1, wherein said VOCs sorbing member is a deposit of getter material on a metal surface. 6. The apparatus according to claim 1, wherein the getter material is chosen among titanium, zirconium, vanadium, niobium or hafnium, or alloys based on titanium and/or zirconium with at least another element chosen among transition elements, rare earths and aluminum. 7. The apparatus according to claim 6, wherein the alloy is selected from Zr—Fe, Zr—Ni, Zr—V—Fe, Zr—Ti—V, ZrAI, and Zr—Co-A alloys, wherein A is an element selected from the group consisting of yttrium, lanthanum and a rare earth element. 8. The apparatus according to claim 1, further comprising a sample holder configured to hold a mask, the mask having a design adapted to be reproduced on the polymeric film. 9. The apparatus according to claim 1, further comprising an X-Y table on which the support is arranged, the X-Y table being movable by a motorized member and configured to move in a controlled manner in a plane perpendicular to a direction incident to radiation. 10. An extreme UV radiation lithography apparatus comprising a vacuum process chamber comprising a support, anda Volatile Organic Compounds (VOCs) sorbing member comprising a getter material, wherein:the getter material is arranged in the vacuum process chamber or in a suitable space connected thereto by way of a suitable opening, andthe VOCs sorbing member is a getter pump having the shape of a hollow container arranged in the vacuum process chamber coaxially to a path of UV radiation adapted to impinge on the support. 11. The apparatus according to claim 10, wherein said VOCs sorbing member is proximate to a polymeric film to be sensitized by the UV radiation. 12. The apparatus according to claim 10, wherein the getter pump is comprised of a plurality of discs made of a getter material and fixed to a central getter pump support. 13. The apparatus according to claim 10 wherein the getter pump is comprised of i) a plurality of discs made of a getter material and ii) a heating element, wherein said getter discs are fixed to said heating element. 14. An extreme UV radiation lithography apparatus comprising a vacuum process chamber comprising a support, anda Volatile Organic Compounds (VOCs) sorbing member comprising a getter material, wherein:the getter material is arranged in the vacuum process chamber or in a suitable space connected thereto by way of a suitable opening,the VOCs sorbing member is proximate to the support in the vacuum process-chamber, andthe VOCs sorbing member is a getter pump having the shape of a hollow container arranged in the vacuum process chamber coaxially to UV radiation and proximate to a polymeric film to be sensitized by the UV radiation. 15. The apparatus according to claim 14, wherein said hollow container is cylindrically shaped. 16. The apparatus according to claim 14, wherein said getter pump is comprised of a cylindrical frame inside which a plurality of perforated discs made of a getter material are present. 17. The apparatus according to claim 14, wherein said getter pump is comprised of a cylindrical frame inside which a plurality of radially arranged planar members made of a getter material are present. 18. The apparatus according to claim 14, wherein said VOCs sorbing member is a getter pump comprised of a plurality of discs made of a getter material and fixed to a central getter pump support. 19. The apparatus according to claim 14, wherein said VOCs sorbing member is a getter pump comprised of i) a plurality of discs made of a getter material and ii) a heating element, wherein said getter discs are fixed to said heating element. 20. An extreme UV radiation lithography apparatus comprising a vacuum process chamber comprising a support, anda Volatile Organic Compounds (VOCs) sorbing member comprising a getter material, wherein:the getter material is arranged in the vacuum process chamber or in a suitable space connected thereto by way of a suitable opening, andthe VOCs sorbing member is proximate to the support in the vacuum process chamber,is a deposit of getter material on a metal surface, andis comprised of a getter material deposit on an inner wall of a hollow body arranged coaxially to UV radiation and proximate to a polymeric film to be sensitized by the UV radiation. 21. An extreme UV radiation lithography apparatus comprising a vacuum process chamber comprising a support on which a polymeric film is adapted to be located, anda Volatile Organic Compounds (VOCs) sorbing member comprising a getter material, the VOCs sorbing member sorbing, in use, organic molecules from the polymeric film upon exposure of the polymeric film to radiation, wherein:the getter material is arranged in the vacuum process chamber or in a suitable space connected thereto by way of a suitable opening,the VOCs sorbing member is proximate to the support in the vacuum process chamber, and the support is arranged substantially perpendicular to a path of UV radiation impinging, during use, on the polymeric film to locally sensitize the polymeric film, andsaid VOCs sorbing member is a deposit of getter material on a metal surface and is comprised of a getter material deposit on an inner wall of a hollow body arranged coaxially to UV radiation and proximate to a polymeric film to be sensitized by the UV radiation.