IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0947296
(2010-11-16)
|
등록번호 |
US-8409999
(2013-04-02)
|
우선권정보 |
KR-10-2010-0007068 (2010-01-26) |
발명자
/ 주소 |
- Lee, Byeong-Jin
- Park, Hong-Sick
- Kim, Sang-Tae
- Lee, Joon-Woo
- Park, Young-Chul
- Jin, Young-Jun
- Lee, Suck-Jun
- Yang, Seung-Jae
- Kwon, O-Byoung
- Yu, In-Ho
- Jang, Sang-Hoon
- Lim, Min-Ki
- Shin, Hye-Ra
- Lee, Yu-Jin
|
출원인 / 주소 |
- Samsung Display Co., Ltd.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
6 |
초록
An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.
대표청구항
▼
1. A method of etching a transparent electrode layer comprising: forming the transparent electrode layer on a substrate;forming a photo resist pattern on the transparent electrode layer; andetching the transparent electrode layer by using an etchant,wherein the etchant comprises an inorganic acid, a
1. A method of etching a transparent electrode layer comprising: forming the transparent electrode layer on a substrate;forming a photo resist pattern on the transparent electrode layer; andetching the transparent electrode layer by using an etchant,wherein the etchant comprises an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and water,wherein the inorganic acid comprises H2SO4 and another inorganic acid, and a concentration of H2SO4 is less than half of a concentration of the another inorganic acid. 2. The method of claim 1, wherein a concentration of the inorganic acid is from 1 to 20 wt % of the entire etchant composition, a concentration of the ammonium containing compound is from 0.1 to 5.0 wt % of the entire etchant composition, and a concentration of the cyclic amine compound is from 0.1 to 5.0 wt % of the entire etchant composition. 3. The method of claim 2, wherein the cyclic amine compound comprises at least one of aminotetrazole, benzotriazole, imidazole, indol, phulin, pyrazolel, pyridine, pyrimidine, pyrrol, pyrrolidine, and pyrroline. 4. The method of claim 3, wherein the ammonium (NH4+)-containing compound comprises at least one of CH3COONH4, NH4SO3NH2, NH4C6H5O2, NH4COONH4, NH4Cl, NH4H2PO4, NH4OOCH, NH4HCO3, H4NO2CCH2C(OH)(CO2NH4)CH2CO2NH4, NH4PF6, HOC(CO2H)(CH2CO2NH4)2, NH4NO3, (NH4)2S2O8, H2NSO3NH4, and (NH4)2SO4. 5. The method of claim 4, wherein the transparent electrode layer comprises indium zinc oxide (IZO) or indium tin oxide (ITO). 6. The method of claim 1, wherein the etchant composition further comprises at least one of a surfactant, a metal ion sequestering agent, and a corrosion inhibitor. 7. The method of claim 1, further comprising forming an element for a liquid crystal display on the substrate. 8. The method of claim 1, wherein the concentration of the inorganic acid is from 7 to 20 wt % of the etchant composition, the concentration of the ammonium containing compound is from 0.1 to 5.0 wt % of the etchant composition, and the concentration of the cyclic amine compound is from 0.1 to 5.0 wt % of the etchant composition.
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