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Kafe 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | US-0179701 (2008-07-25) |
등록번호 | US-8431264 (2013-04-30) |
발명자 / 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 | 피인용 횟수 : 11 인용 특허 : 599 |
An electrochemical device is claimed and disclosed wherein certain embodiments have a cathode greater than about 4 μm and less than about 200 μm thick; a thin electrolyte less than about 10 μm thick; and an anode less than about 30 μm thick. Another claimed and disclosed electrochemical device inclu
An electrochemical device is claimed and disclosed wherein certain embodiments have a cathode greater than about 4 μm and less than about 200 μm thick; a thin electrolyte less than about 10 μm thick; and an anode less than about 30 μm thick. Another claimed and disclosed electrochemical device includes a cathode greater than about 0.5 μm and less than about 200 μm thick; a thin electrolyte less than about 10 μm thick; and an anode less than about 30 μm thick, wherein the cathode is fabricated by a non-vapor phase deposition method. A non-vacuum deposited cathode may be rechargeable or non-rechargeable. The cathode may be made of CFx (carbon fluoride) material, wherein, for example, 0x4. The electrochemical device may also include a substrate, a current collector, an anode current collector, encapsulation and a moderating layer.
1. An electrochemical device comprising: a non-vapor phase deposited positive cathode greater than about 0.5 μm and less than about 200 μm thick;a layer on the positive cathode;a vapor phase deposited electrolyte less than about 10 μm thick over the layer on said positive cathode;a negative anode le
1. An electrochemical device comprising: a non-vapor phase deposited positive cathode greater than about 0.5 μm and less than about 200 μm thick;a layer on the positive cathode;a vapor phase deposited electrolyte less than about 10 μm thick over the layer on said positive cathode;a negative anode less than about 30 μm thick is positioned directly on the vapor phase deposited electrolyte; andwherein said electrochemical device is non-rechargeable. 2. An electrochemical device comprising: a positive cathode greater than about 4 μm and less than about 200 μm thick; an electrolyte less than about 10 μm thick; a negative anode less than about 30 μm thick; and wherein said cathode comprises CFX material. 3. The electrochemical device of claim 2 wherein x falls within the range of 0 to 4. 4. The electrochemical device of claim 1 comprising a non-rechargeable cathode consisting of CFX material. 5. The electrochemical device of claim 4, wherein x falls within the range of 0 to 4. 6. The electrochemical device of claim 1 further comprising: a positive cathode greater than about 4 μm and less than about 200 μm thick. 7. The electrochemical device of claim 3 comprising a non-rechargeable cathode consisting of CFX material. 8. An electrochemical device comprising: a non-vapor phase deposited cathode;an anode; anda vapor phase deposited electrolyte less than about 10 μm thick and positioned directly on the anode;a layer between the cathode and the electrolyte; andwherein said electrochemical device is non-rechargeable. 9. An electrochemical device comprising: a non-vapor phase deposited cathode;an anode; anda vapor phase deposited electrolyte less than about 10 μm thick and positioned directly on the anode;a layer between the cathode and the electrolyte; andwherein said cathode comprises CFX material, and wherein x falls within the range of 0 to 4. 10. The electrochemical device of claim 6 comprising a non-rechargeable cathode consisting of CFX material. 11. A method of manufacturing an electrochemical device comprising: depositing a positive cathode comprising CFX that is greater than about 0.5 μm and less than about 200 μm thick;depositing an electrolyte that is less than about 10 μm thick; depositing a negative anode that is less than about 30 μm thick; and depositing said positive cathode by a non-vapor phase deposition process. 12. The method of claim 11 wherein x falls within the range of 0 to 4. 13. A method of manufacturing an electrochemical device comprising: depositing a cathode comprising CFX using a non-vapor phase deposition process; depositing an electrolyte that is less than about 10 μm thick; and depositing an anode. 14. The electrochemical device of claim 1, wherein the layer is absorbed into the cathode. 15. The electrochemical device of claim 8, wherein the layer is absorbed into the cathode. 16. The electrochemical device of claim 9, wherein the layer is absorbed into the cathode.
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