초록 ▼

The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is l

The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.

대표청구항 ▼

1. A method comprising: (a) employing a desired target including a target material comprising a mixture of one metallic part, consisting essentially of one or more metals and/or one or more semiconducting materials, and one compound part, consisting essentially of one or more oxide materials, wherei

1. A method comprising: (a) employing a desired target including a target material comprising a mixture of one metallic part, consisting essentially of one or more metals and/or one or more semiconducting materials, and one compound part, consisting essentially of one or more oxide materials, wherein the relative amount of compound part is between 30% and 50% of the target material and is large enough to: i) eliminate or reduce a hysteresis behavior of the reactive sputtering process as compared to reactively sputtering a metal target completely made from said metallic part, andii) enable a stable deposition of a compound film at a rate higher than what is possible from a given target completely made from said compound part;wherein at least one of the metallic part and the compound part includes one or more elements selected from the group consisting of zinc, tin, titanium, niobium, zirconium, bismuth, and aluminum, the target material being substantially free of silicon; and(b) depositing a fully oxidized coating on a substrate. 2. The method according to claim 1, wherein the reactive sputtering process is a sputtering process selected from the group consisting of DC sputtering and mid-frequency sputtering. 3. The method according to claim 1, wherein said desired target has a composition selected to have an electrical conductivity that is at least twice that of said given target, which is completely made from said compound part. 4. The method according to claim 1, wherein the mixture for said desired target is selected so that the stable deposition of said compound film proceeds with the rate being at least 40% that achieved by reactively sputtering said metal target, which is completely made from said metallic part. 5. The method according to claim 4, wherein said rate is at least 50% that achieved by reactively sputtering said metal target, which is completely made from said metallic part. 6. The method according to claim 5, wherein said rate is at least 60% that achieved by reactively sputtering said metal target, which is completely made from said metallic part. 7. The method according to claim 1, wherein said desired target has a composition selected to have a thermal conductivity that is at least twice that of said given target, which is completely made from said compound part. 8. The method according to claim 1, wherein the method is performed such that after a disruption of the reactive sputtering process said process returns to a working point by which said stable deposition of said compound film was characterized prior to said disruption. 9. The method according to claim 1, wherein the reactive sputtering process involves: arranging a reduced erosion area on the desired target, the reduced erosion area having a size equal to or smaller than a critical size needed for the reactive sputtering process to proceed with an eliminated hysteresis behavior, andcausing movement of the reduced erosion area along the desired target at a constant or variable speed, the speed being selected so as to be above a minimum speed to avoid melting of the desired target's target material. 10. The method according to claim 9, characterized in that the step of arranging comprises arranging at least one magnet behind the target and imposing a relative movement between the magnet and the target. 11. The method according to claim 9, characterized in that the target has a cylindrical tube shape, and sputtering takes place as the target is being rotated. 12. The method according to claim 9, characterized in that the step of arranging comprises splitting up the target into electrically isolated parts and distributing power to one part at a time. 13. The method according to claim 1, wherein the method comprises performing said reactive sputtering process in a sputtering chamber that is provided with a shield, the chamber having inert gas inlets located so as to deliver inert gas into an upper region of the chamber, the chamber further including reactive gas inlets located so as to deliver reactive gas into a lower region of the chamber, wherein said shield is at a higher elevation than said reactive gas inlets, and wherein said inert gas inlets are at a higher elevation than said shield. 14. The method according to claim 13, wherein the chamber has a transport support that is adapted to support a sheet-like substrate in a horizontal position, and wherein the shield has a downwardly directed region that is not parallel to said horizontal substrate position but rather is oblique to said horizontal substrate position. 15. The method according to claim 14, wherein the downwardly directed region of the shield is that portion of the shield that is furthest from an adjacent sidewall of the chamber. 16. The method according to claim 14, wherein a first distance is defined as being the vertical distance between the desired target and said horizontal substrate position, a second distance is defined as being the vertical distance between the desired target and said shield, and wherein said second distance is greater than 40% of said first distance. 17. The method according to claim 1, wherein the method comprises performing said reactive sputtering process in a sputtering chamber that is provided with a shield, the chamber having inert gas inlets located so as to deliver inert gas into a first region of the chamber, the chamber further including reactive gas inlets located so as to deliver reactive gas into a second region of the chamber, wherein the shield is closer to the desired target than are the reactive gas inlets, and wherein the inert gas inlets are closer to the desired target than is the shield. 18. The method according to claim 1, wherein the reactive sputtering process achieves said deposition of said compound film while consuming a sputtering energy that is 50% or less of a sputtering energy that would be consumed in producing a film having the same composition and thickness when either sputtering said metal target, which is completely made from said metal part, or said given target, which is completely made from said compound part. 19. The method according to claim 1, wherein said compound part includes a first compound and a second compound. 20. The method according to claim 19, wherein during the reactive sputtering process said metallic part forms said first compound more readily than it forms said second compound. 21. The method according to claim 19, wherein the reactive sputtering process involves providing a gaseous sputtering atmosphere comprising two reactive gases of different chemical activities. 22. The method according to claim 21, wherein during said reactive sputtering process said deposition of the compound film results in said film containing a higher concentration of a desired one of the two reactive gases, said desired one of the two reactive gases having a higher chemical activity than the other of said two reactive gases. 23. The method according to claim 1, wherein the relative amount of compound part is large enough to eliminate the hysteresis behavior of the reactive sputtering process as compared to reactively sputtering the metal target completely made from the metallic part. 24. The method according to claim 1, wherein the target material is substantially free of silicon and boron. 25. The method according to claim 1, wherein the one or more oxide materials includes an oxide of a metal included in the metallic part and/or an oxide of a semiconducting material included in the metallic part.